Mark position detection device and mark position detection method, exposure apparatus using same, and device manufacturing method
The mark position detection device of the present invention, which detects a position of a mark provided on a substrate, includes an image sensor with changeable resolution and readout area, an optical system that directs light reflected from the mark to the image sensor, and a control unit configured to detect the position of the mark based on an output of the image sensor. The control unit performs a first position detection based on the output of the image sensor with a first resolution and a first readout area, and a second position detection based on the output of the image sensor with a second resolution, which has higher resolution than the first resolution, and a second readout area, which is determined to be narrower than the first readout area and lies within the first readout area based on the first position detection.
1. A mark position detection device that detects a position of a mark provided on a substrate, the mark position detection device comprising:
an image sensor with changeable resolution and readout area in an image pickup surface;
an optical system that directs light reflected from the mark to the image sensor; and
a control unit configured to detect the position of the mark based on an output of the image sensor,
wherein the control unit performs:
a first position detection based on the output of the image sensor with a first resolution and a first readout area; and
a second position detection based on the output of the image sensor with a second resolution, which has higher resolution than the first resolution, and a second readout area, which is determined to be narrower than the first readout area and lies within the first readout area based on the result of the first position detection.
2. The mark position detection device according to claim 1 , wherein the control unit does not perform subsampling on the image sensor in the second position detection, but performs subsampling on the image sensor in the first position detection.
3. The mark position detection device according to claim 1 , wherein the control unit determines the light intensity of the image sensor and determines the integration time of the image sensor in the first position detection and the second position detection, respectively.
4. The mark position detection device according to claim 1 , wherein the control unit determines light intensity of the image sensor and determines the integration time of the image sensor in the first position detection, and wherein the integration time determined by the first position detection is used as the integration time of the image sensor in the second position detection.
5. A mark position detection method that detects a position of a mark provided on a substrate, the mark position detection method comprising:
an image sensor with changeable resolution and readout area in an image pickup surface;
an optical system that directs light reflected from the mark to the image sensor; and
a control unit configured to detect the position of the mark based on an output of the image sensor,
wherein the control unit comprises the steps of:
performing a first position detection based on the output of the image sensor with a first resolution and a first readout area; and
performing a second position detection based on the output of the image sensor with a second resolution, which has a higher resolution than the first resolution, and a second readout area, which is determined to be narrower than the first readout area and lies within the first readout area based on the first position detection.
6. The mark position detection method according to claim 5 , wherein subsampling on the image sensor is not carried out in the second detection step, but subsampling on the image sensor is carried out in the first detection step.
7. The mark position detection method according to claim 5 , wherein the control unit determines the light intensity of the image sensor and determines the integration time of the image sensor in the first detection step and the second detection step, respectively.
8. The mark position detection method according to claim 5 , wherein the control unit determines the light intensity of the image sensor and determines the integration time of the image sensor in the first position detection and wherein the integration time in the first detection step is used as the integration time of the image sensor in the second detection step.
9. An exposure apparatus comprising:
an illumination optical system that illuminates a reticle with light from a light source section;
a projection optical system that directs light from the reticle to a substrate; and
a substrate stage system that is movable together with the substrate mounted thereon,
wherein the substrate stage system performs positioning of the substrate by using a mark position detection device that detects a position of a mark provided on the substrate, the mark position detection device comprises:
an image sensor with changeable resolution and readout area in an image pickup surface;
an optical system that directs light reflected from the mark to the image sensor; and
a control unit configured to detect the position of the mark based on an output of the image sensor,
wherein the control unit performs:
a first position detection based on the output of the image sensor with a first resolution and a first readout area; and
a second position detection based on the output of the image sensor with a second resolution, which has higher resolution than the first resolution, and a second readout area, which is determined to be narrower than the first readout area and lies within the first readout area based on the result of the first position detection.
10. A device manufacturing method comprising the steps of:
exposing a substrate using an exposure apparatus comprising:
an illumination optical system that illuminates a reticle with light from a light source section;
a projection optical system that directs light from the reticle to a substrate; and
a substrate stage system that is movable together with the substrate mounted thereon,
wherein the substrate stage system performs positioning of the substrate by using a mark position detection device that detects a position of a mark provided on the substrate, the mark position detection device comprising:
an image sensor with changeable resolution and readout area in an image pickup surface;
an optical system that directs light reflected from the mark to the image sensor; and
a control unit configured to detect the position of the mark based on an output of the image sensor,
wherein the control unit performs:
a first position detection based on the output of the image sensor with a first resolution and a first readout area; and
a second position detection based on the output of the image sensor with a second resolution, which has higher resolution than the first resolution, and a second readout area, which is determined to be narrower than the first readout area and lies within the first readout area based on the result of the first position detection, and developing the substrate.
11. An exposure apparatus comprising:
an illumination optical system that illuminates a reticle with light from a light source section;
a projection optical system that directs light from the reticle to a substrate; and
a substrate stage system that is movable together with the substrate mounted thereon,
wherein the substrate stage system performs positioning of the substrate by using a mark position detection method that detects a position of a mark provided on the substrate, the mark position detection method comprising the steps of:
performing a first position detection based on the output of the image sensor with a first resolution and a first readout area in an image pickup surface; and
performing a second position detection based on the output of the image sensor with a second resolution, which has higher resolution than the first resolution, and a second readout area in an image pickup surface, which is determined to be narrower than the first readout area and lies within the first readout area based on the first position detection.
12. A device manufacturing method comprising the steps of:
exposing a substrate using an exposure apparatus comprising:
an illumination optical system that illuminates a reticle with light from a light source section;
a projection optical system that directs light from the reticle to a substrate; and
a substrate stage system that is movable together with the substrate mounted thereon,
wherein the substrate stage system performs positioning of the substrate by using a mark position detection method that detects a position of a mark provided on the substrate, the mark position detection method comprising the steps of:
performing a first position detection based on the output of the image sensor with a first resolution and a first readout area in an image pickup surface; and
performing a second position detection based on the output of the image sensor with a second resolution, which has higher resolution than the first resolution, and a second readout area in an image pickup surface, which is determined to be narrower than the first readout area and lies within the first readout area based on the first position detection.