Methods of forming fin-on-nanosheet transistor stacks
Methods of forming a plurality of transistor stacks are provided. A method of forming a plurality of transistor stacks includes etching a plurality of nanosheets, using a plurality of spacers that are on sidewalls of a plurality of semiconductor fins as an etch mask, to provide a plurality of spaced-apart nanosheet stacks that each have at least one of the semiconductor fins thereon.
1. A method of forming a plurality of transistor stacks, the method comprising:
providing a stack comprising a plurality of nanosheets and a semiconductor layer that is on the nanosheets;
forming a mask on the stack, wherein the semiconductor layer is between the mask and the nanosheets;
forming an asymmetric layer on the mask, the asymmetric layer comprising a plurality of segments, at least some of which have different respective widths;
forming first spacers on sidewalls of the segments of the asymmetric layer;
etching the mask, while the first spacers are thereon, to form a plurality of mask segments between the first spacers, respectively, and the semiconductor layer;
etching the semiconductor layer to form a plurality of fins between the mask segments, respectively, and the nanosheets;
forming second spacers on sidewalls of the fins; and
etching the nanosheets, while the second spacers are on the sidewalls of the fins, to provide a plurality of spaced-apart nanosheet stacks that each have at least one of the fins thereon with a corresponding fin sidewall that is coplanar with a sidewall of an underlying one of the plurality of spaced-apart nanosheet stacks.
2. The method of claim 1 , wherein the nanosheet stacks comprise:
a first nanosheet stack having a first of the fins thereon;
a second nanosheet stack having a second and a third of the fins thereon; and
a third nanosheet stack having a fourth, a fifth, and a sixth of the fins thereon.
3. The method of claim 2 , wherein the first nanosheet stack is narrower than the second nanosheet stack.
4. The method of claim 3 , wherein the second nanosheet stack is narrower than the third nanosheet stack.
5. The method of claim 4 , wherein the nanosheet stacks further comprise a fourth nanosheet stack having a seventh, an eighth, and a ninth of the fins thereon.
6. The method of claim 5 , wherein the fourth nanosheet stack is narrower than the third nanosheet stack.
7. The method of claim 6 , wherein the fourth nanosheet stack has a width equal to that of the second nanosheet stack.
8. The method of claim 2 ,
wherein a sidewall of the first of the fins is aligned with a sidewall of the first nanosheet stack,
wherein a sidewall of the second of the fins is aligned with a sidewall of the second nanosheet stack, and
wherein a sidewall of the fourth of the fins is aligned with a sidewall of the third nanosheet stack.
9. The method of claim 1 , wherein the asymmetric layer comprises an organic planarization layer.
10. The method of claim 1 , wherein the stack further comprises a spacer layer that is between the nanosheets and the semiconductor layer.
11. The method of claim 1 , further comprising removing the first spacers before forming the second spacers.
12. A method of forming a plurality of transistor stacks, the method comprising:
providing a stack comprising a plurality of nanosheets and a semiconductor layer that is on the nanosheets;
forming a mask on the stack, wherein the semiconductor layer is between the mask and the nanosheets;
forming an asymmetric layer on the mask, the asymmetric layer comprising a plurality of segments, at least some of which have different respective widths;
forming first spacers on sidewalls of the segments of the asymmetric layer;
etching the mask, while the first spacers are thereon, to form a plurality of mask segments between the first spacers, respectively, and the semiconductor layer;
etching the semiconductor layer to form a plurality of fins between the mask segments, respectively, and the nanosheets;
forming second spacers on sidewalls of the fins; and
etching the nanosheets, while the second spacers are on the sidewalls of the fins, to provide a plurality of spaced-apart nanosheet stacks that each have at least one of the fins thereon;
wherein the asymmetric layer comprises a first asymmetric layer, and
wherein the forming the second spacers comprises:
forming a spacer layer between the sidewalls of the fins;
forming a second asymmetric layer on first portions of the spacer layer; and
etching second portions of the spacer layer, while the second asymmetric layer is on the first portions, to form the second spacers.
13. The method of claim 12 , wherein the first and second asymmetric layers comprise respective organic planarization layers.
14. A method of forming a plurality of transistor stacks, the method comprising etching a plurality of nanosheets, using a plurality of spacers that are on sidewalls of a plurality of semiconductor fins as an etch mask, to provide a plurality of spaced-apart nanosheet stacks that each have at least one of the semiconductor fins thereon with a corresponding fin sidewall that is coplanar and in vertical alignment with a sidewall of an underlying one of the plurality of spaced-apart nanosheet stacks.
15. The method of claim 14 , further comprising:
before etching the nanosheets, forming the semiconductor fins by etching a semiconductor layer.
16. The method of claim 15 , further comprising:
before forming the semiconductor fins, forming a mask on the semiconductor layer;
forming an asymmetric layer on the mask, the asymmetric layer comprising a plurality of segments, at least some of which have different respective widths;
forming first spacers on sidewalls of the segments of the asymmetric layer; and
etching the mask, while the first spacers are thereon, to form a plurality of mask segments between the first spacers, respectively, and the semiconductor layer,
wherein the semiconductor fins are formed between the mask segments, respectively, and the nanosheets, and
wherein the spacers that are on the sidewalls of the semiconductor fins comprise second spacers.
17. A method of forming a plurality of transistor stacks, the method comprising:
forming an asymmetric layer comprising a plurality of segments, at least some of which have different respective widths, on a mask that is on a plurality of nanosheets;
forming a plurality of spacers on sidewalls of the segments of the asymmetric layer;
etching the mask, while the spacers are thereon, to form a plurality of mask segments; and
etching a semiconductor layer that is between the mask segments and the nanosheets to form a plurality of fins between the mask segments, respectively, and the nanosheets;
wherein the spacers comprise first spacers, and
wherein the method further comprises:
forming second spacers on sidewalls of the fins; and
etching the nanosheets, using the second spacers as an etch mask, to provide a plurality of spaced-apart nanosheet stacks that each have at least one of the fins thereon with a corresponding fin sidewall that is coplanar and in vertical alignment with a sidewall of an underlying one of the plurality of spaced-apart nanosheet stacks.
18. The method of claim 17 , wherein the asymmetric layer comprises an organic planarization layer.
19. The method of claim 17 , further comprising removing the first spacers before forming the second spacers.