IP Library Granted Patent US 11,794,296
Granted Patent B2
US 11,794,296 · App. 17/592,400 · Granted Oct 24, 2023

Electrostatic chuck with porous plug

Inventors: Arvinder Chadha (San Jose, CA); Tomoaki Kohzu (Santa Clara, CA)
Assignee: Applied Materials, Inc.
B23Q3/15B23B31/28H01L21/6833
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Quick Facts
Patent No.
US 11,794,296
App. No.
17/592,400
Granted
Oct 24, 2023
Kind
B2
Abstract

Electrostatic chucks and method for forming the same are described herein. The electrostatic chucks include a backside gas passage having a ceramic porous plug secured therein by a ceramic body of the chuck with a ceramic-to-ceramic body. In one example, ceramic porous plug is sintered with the ceramic body.

Claims (31)

1. An electrostatic chuck comprising:

a ceramic body having a substrate support surface and a bottom surface, an electrode and a gas passage extending between the substrate support surface and the bottom surface; and

a ceramic porous plug secured in a portion of the gas passage disposed between the electrode and the bottom surface by a ceramic-to-ceramic bond.

2. The electrostatic chuck of claim 1 , wherein the ceramic porous plug is sintered to the ceramic body.

3. The electrostatic chuck of claim 1 , wherein the ceramic porous plug as a grain size similar to a grain size of a portion of the ceramic body contacting the ceramic porous plug.

4. The electrostatic chuck of claim 1 , wherein the ceramic porous plug as a grain size different than a grain size of a portion of the ceramic body contacting the ceramic porous plug.

5. The electrostatic chuck of claim 1 , wherein the ceramic porous plug as a grain size larger than a grain size of a portion of the ceramic body contacting the ceramic porous plug.

6. The electrostatic chuck of claim 1 , wherein a bottom surface of the ceramic porous plug is flush with the bottom surface of the ceramic body.

7. The electrostatic chuck of claim 1 , wherein a bottom surface of the ceramic porous plug is recessed from the bottom surface of the ceramic body.

8. The electrostatic chuck of claim 1 , wherein a bottom surface of the ceramic porous plug protrudes from the bottom surface of the ceramic body.

9. The electrostatic chuck of claim 8 further comprising:

a temperature control base having an upper surface secured to the bottom surface of the ceramic body by an adhesive layer, temperature control base having a gas delivery hole aligned with the gas passage formed in the ceramic body, the bottom surface of the ceramic porous plug extending into the gas delivery hole such that the ceramic porous plug shields the adhesive layer from the gas delivery hole and the gas passage.

10. The electrostatic chuck of claim 1 , wherein the ceramic porous plug further comprises:

regions of different porosity.

11. The electrostatic chuck of claim 1 , wherein the ceramic porous plug is formed from a composite material.

12. An electrostatic chuck comprising:

a ceramic body having a substrate support surface and a bottom surface, an electrode and a gas passage extending between the substrate support surface and the bottom surface;

a ceramic porous plug disposed in a portion of the gas passage located between the electrode and the bottom surface, the ceramic porous plug sintered to the ceramic body;

a temperature control base having a gas delivery hole aligned with the gas passage formed in the ceramic body and configured to flow backside gas to a support surface of the ceramic body; and

an adhesive layer securing the temperature control base to the bottom surface of the ceramic body.

13. The electrostatic chuck of claim 12 , wherein the ceramic porous plug as a grain size larger than a grain size of a portion of the ceramic body contacting the ceramic porous plug.

14. The electrostatic chuck of claim 12 , wherein a bottom surface of the ceramic porous plug is flush with the bottom surface of the ceramic body.

15. The electrostatic chuck of claim 12 , wherein a bottom surface of the ceramic porous plug is recessed from the bottom surface of the ceramic body.

16. The electrostatic chuck of claim 12 , wherein a bottom surface of the ceramic porous plug protrudes from the bottom surface of the ceramic body.

17. The electrostatic chuck of claim 16 , wherein the bottom surface of the ceramic porous plug extends into the gas delivery hole of the temperature control base such that the ceramic porous plug shields the adhesive layer from the gas delivery hole and the gas passage.

18. The electrostatic chuck of claim 12 , wherein the ceramic porous plug further comprises:

regions of different porosity.

19. The electrostatic chuck of claim 12 , wherein the ceramic body has stacked regions of different grain sizes.

20. A method for fabricating an electrostatic chuck, the method comprising:

disposing a ceramic porous plug at least partially in a hole formed in a sheet of ceramic material, the hole configured to become a fluid passage, the ceramic porous plug disposed in a portion of the hole located between an electrode and a bottom surface of the sheet of ceramic material; and

sintering the ceramic material and ceramic porous plug to form a ceramic-to-ceramic bond therebetween.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 6, 2022
From: CHADHA, ARVINDER; KOHZU, TOMOAKI
To: APPLIED MATERIALS, INC.
Reel/Frame 059839/0354 →
Continuity (1)
Related Publication 20230241731A1 · Aug 3, 2023
Cited By (2)
US 12,463,075 US 12,733,446