Granted Patent B2

US 12,451,367 · App. 17/613,933 · Granted Oct 21, 2025

Inventor: Tomohiro Nagoya (Tokyo, JP)

H01L21/568C09J7/25C09J7/30C09J179/08H01L21/6836H01L23/3107H01L23/495H01L24/48H01L2224/48175

Abstract

Claims (23)

1. A method for manufacturing a semiconductor device including an encapsulation molded body, wherein the encapsulation molded body comprises a lead frame including a die pad and an inner lead and adapted to be conveyed on a stage during the manufacture of the semiconductor device, a semiconductor element, a wire and an encapsulation layer, the method comprising:

providing a temporary protective film including:

a support film having a first surface and a second surface;

an adhesive layer provided on the first surface of the support film; and

a non-adhesive layer provided on the second surface of the support film;

attaching the temporary protective film to a surface of the lead frame in such a direction that the adhesive layer of the temporary protective film is in contact with the lead frame to obtain a temporary protective film-attached lead frame;

mounting the semiconductor element to a surface of the die pad on an opposite side from the temporary protective film;

providing a wire connecting the semiconductor element and the inner lead;

forming the encapsulation layer encapsulating the semiconductor element, the temporary protective film-attached lead frame, and the wire to obtain a temporary protective film-attached encapsulation molded body;

conveying the temporary protective film-attached lead frame by sliding the temporary protective film-attached encapsulation molded body on the stage, wherein the non-adhesive layer of the temporary protective film provides a contact surface with the stage during the conveyance; and

detaching the temporary protective film from the temporary protective film-attached encapsulation molded body to obtain the encapsulation molded body,

wherein the temporary protective film-attached lead frame is conveyed on the stage with conveyance failure being suppressed before detaching the temporary protective film from the temporary protective film-attached encapsulation molded body,

wherein the non-adhesive layer has a thickness of 10 μm or less, and

wherein the contact surface of the non-adhesive layer has a surface roughness of 0.1 μm or more, as measured by a laser microscope under such a condition that a magnification ratio of an object lens is 50 times, and is thereby configured to suppress the conveyance failure on the stage.

2. The method according to claim 1 , further comprising connecting the semiconductor element mounted on the die pad and the inner lead using an electroconductive material by reflow.

3. The method according to claim 1 , wherein the adhesive layer is configured to have a 90° peel strength, between the adhesive layer and the lead frame, of 5 N/m or more at 25° C. when the temporary protective film is attached to the lead frame so that the adhesive layer is in contact with the lead frame.

4. The method according to claim 1 , wherein the adhesive layer is configured to have a 90° peel strength, between the adhesive layer and the lead frame as well as the encapsulation layer, of 1000 N/m or less in at least a portion of a temperature range of 0° C. to 250° C. when the temporary protective film is attached to the lead frame so that the adhesive layer is in contact with the lead frame, the semiconductor element is mounted on a surface of the die pad on an opposite side from the temporary protective film, and the encapsulation layer encapsulating the semiconductor element is in contact with the adhesive layer.

5. The method according to claim 1 , wherein the adhesive layer comprises a thermoplastic resin having at least one functional group selected from the group consisting of an amide group, an ester group, an imide group, an ether group, and a sulfone group.

6. The method according to claim 1 , wherein the adhesive layer comprises a thermoplastic resin having at least one functional group selected from the group consisting of an amide group, an ester group, an imide group, and an ether group.

7. The method according to claim 1 , wherein the temporary protective film comprises a support film located between the adhesive layer and the non-adhesive layer, and

wherein a ratio of a thickness of the adhesive layer to a thickness of the support film is 0.5 or less.

8. The method according to claim 7 , wherein the support film is a film comprising a polymer selected from the group consisting of an aromatic polyimide, an aromatic polyamide, an aromatic polyamideimide, an aromatic polysulfone, an aromatic polyethersulfone, polyphenylene sulfide, an aromatic polyether ketone, a polyallylate, an aromatic polyether ether ketone, and polyethylene naphthalate.

9. The method according to claim 1 , wherein, when a standard attachment for a force gauge weighing 2.5 g and having a flat surface with a diameter of 13 mm is placed on the non-adhesive layer of the temporary protective film in a direction so that the flat surface of the standard attachment faces downward and is then caused to slide on the non-adhesive layer, a maximum value of stress as measured by using the force gauge is 1.8 gf or less.

Assignments (3)

Priority Claims (1)

Continuity (1)

References Cited (67)