Metal complexes containing cyclopentadienyl ligands
Metal complexes including cyclopentadienyl ligands and methods of using such metal complexes to prepare metal-containing films are provided.
1. A metal complex corresponding in structure to Formula I:
[(R 1 ) n C p] 2 M 1 L 1 (I)
wherein
when M 1 is lanthanum;
each R 1 is independently C 1 -C 5 -alkyl or silyl;
n is 1, 2, 3, 4, or 5;
Cp is cyclopentadienyl ring; and
L 1 is selected from the group consisting of: 3,5-R 7 R 8 -C 3 HN 2 ; 1-(R 32 ) C 3 H 4 ; 1-R 33 -3-R 34 -C 3 H 3 ; and R 35 ,R 36 —C 3 HO 2 ; wherein and R 8 are each independently hydrogen or C 1 -C 5 -alkyl; R 32 is ethyl, butyl, pentyl, or silyl; and R 33 , R 34 , R 35 , and R 36 are each independently alkyl or silyl; or
when M 1 is yttrium;
each R 1 is independently C 1 -C 5 -alkyl or silyl;
n is 1, 2, 3, 4, or 5;
Cp is cyclopentadienyl ring; and
L 1 is selected from the group consisting of: 3,5-R 7 R 8 -C 3 HN 2 ; 1-(R 32 ) C 3 H 4 ; 1-R 33 -3-R 34 -C 3 H 3 ; and R 35 ,R 36 -C 3 HO 2 ; wherein R 7 and R 8 are each independently hydrogen or C 1 -C 5 -alkyl; R 32 is methyl, propyl, butyl, pentyl, or silyl; and R 33 , R 34 , and R 35 are each independently alkyl or silyl; and R 36 is C 2 -C 8 -alkyl or silyl.
2. The metal complex of claim 1 , wherein each R 1 is independently C 1 -C 4 -alkyl or silyl, and R 8 are each independently hydrogen or C 1 -C 5 -alkyl, R 33 , R 34 , and R 35 are each independently C 1 -C 4 -alkyl or silyl, and R 36 is C 1 -C 4 -alkyl or silyl when M 1 is lanthanum, and R 36 is C 2 -C 4 -alkyl or silyl when M 1 is yttrium.
3. The metal complex of claim 1 , wherein each R 1 is independently C 1 -C 4 -alkyl or silyl; and L 1 is 3,5-R 7 R 8 -C 3 HN 2 or R 35 ,R 36 -C 3 HO 2 .
4. The metal complex of claim 1 , wherein the complex is:
Y(MeCp) 2 (3-methyl-5-pentyl-pyrazolate) or
Y(MeCp) 2 (6-methyl-2,4-heptanedionate).
5. A method of forming a metal-containing film by a vapor deposition process, the method comprising vaporizing at least one metal complex corresponding in structure to Formula I:
[(R 1 ) n C p] 2 M 1 L 1 (I)
wherein
M 1 is yttrium or lanthanum;
each R 1 is independently C 1 -C 5 -alkyl or silyl;
Cp is cyclopentadienyl ring; and
when M 1 is lanthanum:
n is 1, 2, 3, 4, or 5; and
L 1 is selected from the group consisting of: 3,5-R 7 R 8 -C 3 HN 2 ; 1-(R 32 ) C 3 H 4 ; 1-R 33 -3-R 34 -C 3 H 3 ; and R 35 , R 36 -C 3 HO 2 ; wherein and R 8 are each independently hydrogen or C 1 -C 5 -alkyl; and R 32 , R 33 , R 34 , R 35 , and R 36 are each independently alkyl or silyl; and
when M 1 is yttrium:
n is 1, 2, 3, 4, or 5; and
L 1 is selected from the group consisting of: 3,5-R 7 R 8 -C 3 HN 2 ; 1-(R 32 ) C 3 H 4 ; 1-R 33-3-R 34 -C 3 H 3 ; and R 35 ,R 36 -C 3 HO 2 ; wherein R 7 and R 8 are each independently hydrogen or C 1 -C 5 -alkyl; R 32 , R 33 , R 34 , and R 35 are each independently alkyl or silyl; and R 36 is C 2 -C 8 -alkyl or silyl; or
n is 1, 2, 3, or 4; and
L 1 is R 35 ,R 36 -C 3 HO 2 , wherein R 35 and R 36 are each independently alkyl or silyl.
6. The method of claim 5 , wherein each R 1 is independently C 1 -C 4 -alkyl or silyl; and R 8 are each independently hydrogen or C 1 -C 5 -alkyl; and R 32 , R 33 , R 34 , and R 35 are each independently C 1 -C 4 -alkyl or silyl, and R 36 is C 1 -C 4 -alkyl or silyl when M 1 is lanthanum, and R 36 is C 2 -C 4 -alkyl or silyl when M 1 is yttrium.
7. The method of claim 5 , wherein each R 1 is independently C 1 -C 4 -alkyl or silyl; and L 1 is 3,5-R 7 R 8 -C 3 HN 2 or R 35 ,R 36 -C 3 HO 2 .
8. The method of claim 5 , wherein the complex is:
Y(MeCp) 2 (3,5-methyl-5-pentyl-pyrazolate) or
Y(MeCp) 2 (6-methyl-2,4-heptanedionate).
9. The method of claim 5 , wherein the vapor deposition process is chemical vapor deposition or the vapor deposition process is atomic layer deposition.
10. The method of claim 5 , wherein the metal complex is delivered to a substrate in pulses alternating with pulses of an oxygen source, wherein the oxygen source is selected from the group consisting of H 2 O, H 2 O 2 , O 2 , ozone, air, i-PrOH, t-BuOH, and N 2 O.
11. The method of claim 5 , further comprising vaporizing at least one co-reactant selected from the group consisting of hydrogen, hydrogen plasma, oxygen, air, water, ammonia, a hydrazine, a borane, a silane, ozone, and a combination of any two or more thereof, wherein the hydrazine is hydrazine (N 2 H 4 ) or N,N-dimethylhydrazine.
12. A metal complex corresponding in structure to Formula I:
[(R 1 ) n C p] 2 M 1 L 1 (I)
wherein
M 1 is yttrium or lanthanum;
each R 1 is independently C 1 -C 5 -alkyl or silyl;
n is 1, 2, 3, or 4;
Cp is cyclopentadienyl ring; and
L 1 is R 35 ,R 36 -C 3 HO 2 ; wherein R 35 and R 36 are each independently alkyl or silyl.