IP Library › Granted Patent US 12,340,980
Granted Patent B2
US 12,340,980 · App. 17/712,046 · Granted Jun 24, 2025

Plasma showerhead with improved uniformity

Inventors: Chaowei Wang (San Diego, CA); Kenneth Brian Doering (San Jose, CA); Hanhong Chen (Milpitas, CA); Kartik Shah (Saratoga, CA); Kevin Griffin (Livermore, CA); Hao Zhang (Newark, CA)
Assignee: Applied Materials, Inc.
H01J37/3244H01J37/3222
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Quick Facts
Patent No.
US 12,340,980
App. No.
17/712,046
Granted
Jun 24, 2025
Kind
B2
Abstract

Plasma showerheads with improved gas uniformity, and a plasma showerhead with angled gas nozzles are disclosed. Also disclosed are gas nozzles having a vertical offset angle and/or a directional offset angle. None of the gas channels and/or the gas nozzles intersect with the plasma regions of the showerhead.

Claims (26)

1. A plasma showerhead comprising:

a plurality of plasma regions, each plasma region spaced apart from every adjacent plasma region;

a plurality of gas channels in a first plane embedded within the plasma showerhead and extending parallel to a bottom surface of the plasma showerhead in a second plane parallel to the first plane; and

a plurality of gas nozzles extending from each gas channel in the first plane to a corresponding plurality of holes in the bottom surface in the second plane, wherein one or more of the plurality of gas nozzles is an angled gas nozzle which is angled from a vertical extending between the first plane and the second plane.

2. The plasma showerhead of claim 1 , wherein the plasma showerhead is configured to accept at least one plasma applicator within each plasma region.

3. The plasma showerhead of claim 1 , wherein the plurality of plasma regions are arranged in concentric rings.

4. The plasma showerhead of claim 1 , wherein the plurality of plasma regions are arranged in a hexagonal pattern.

5. The plasma showerhead of claim 1 , wherein there are greater than or equal to 18 plasma regions.

6. The plasma showerhead of claim 1 , wherein each of the plurality of gas channels extends in the first plane from near a peripheral edge of the plasma showerhead toward the center of the plasma showerhead.

7. The plasma showerhead of claim 6 , wherein at least two of the plurality of gas channels merge to form a merged channel.

8. The plasma showerhead of claim 1 , wherein none of the gas channels intersect with any of the plasma regions.

9. The plasma showerhead of claim 1 , wherein the plurality of plasma regions are arranged in concentric rings including an outer concentric ring and an inner concentric ring and at least two gas channels are disposed between adjacent plasma regions of the outer concentric ring and the two gas channels extend to provide a merged channel extending between adjacent plasma regions of the inner concentric ring.

10. The plasma showerhead of claim 1 , wherein more than half of the plurality of gas nozzles are angled gas nozzles angled from the vertical.

11. The plasma showerhead of claim 1 , wherein the angled gas nozzle has a vertical offset angle of up to 55° from the vertical.

12. The plasma showerhead of claim 11 , wherein the angled gas nozzle having the vertical offset angle up to 55° from the vertical also has a directional offset angle in the first plane with respect to one of the plurality of gas channels that intersects with the angled gas nozzle.

13. The plasma showerhead of claim 12 , wherein more than one of the plurality of gas nozzles intersects the one of the plurality of gas channels that intersects with the angled gas nozzle, the more than one of plurality of intersecting gas nozzles having an intersection point that is the same.

14. The plasma showerhead of claim 13 , wherein at least one of the plurality of intersecting gas nozzles has a different vertical offset angle from another one of the plurality of intersecting gas nozzles.

15. The plasma showerhead of claim 13 , wherein at least one of the plurality of intersecting gas nozzles has a different directional offset angle from another one of the plurality of intersecting gas nozzles.

16. The plasma showerhead of claim 13 , wherein two gas nozzles intersect, and the intersecting gas nozzles have a vertical offset angle that is the same and opposing directional offset angles.

17. The plasma showerhead of claim 1 , wherein none of the gas nozzles intersect with any of the plasma regions.

18. The plasma showerhead of claim 1 , wherein the plasma regions, the gas channels and the gas nozzles are arranged in a radially symmetrical pattern.

19. The plasma showerhead of claim 18 , wherein the plasma showerhead comprises six identical, radially symmetrical segments.

20. A plasma showerhead comprising:

a plurality of plasma regions, each plasma region configured to accept a plasma applicator, the plasma regions including;

a plurality of gas channels in a first plane and embedded within the plasma showerhead extending from near a peripheral edge towards the center of the plasma showerhead, wherein the gas channels do not intersect with any of the plurality of plasma regions; and

a plurality of gas nozzles extending from each gas channel to a corresponding plurality of holes in a bottom surface of the plasma showerhead in a second plane parallel to the first plane, the plurality of plasma regions are arranged in concentric rings including an outer concentric ring and an inner concentric ring and at least two gas channels are disposed between adjacent plasma regions of the outer concentric ring and the two gas channels extend to provide a merged channel extending between adjacent plasma regions of the inner concentric ring, the plurality of gas channels and gas nozzles do not intersect with any of the plurality of plasma regions.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 28, 2022
From: WANG, CHAOWEI; DOERING, KENNETH BRIAN; CHEN, HANHONG; SHAH, KARTIK; GRIFFIN, KEVIN; ZHANG, HAO
To: APPLIED MATERIALS, INC.
Reel/Frame 059759/0679 →
Continuity (1)
Related Publication 20230317416A1 · Oct 5, 2023
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