Dynamic random access memory device
View Patent ↗A dynamic random access memory device includes a substrate having a first active region, a first isolation region, a second active region, and a second isolation region arranged in order along a first direction. A first bit line is disposed on the first active region and in direct contact with the first active region. A second bit line is disposed on the second isolation region. An insulating layer is disposed between and separate the second bit line and the second isolation region. A storage node contact structure is disposed between the first bit line and the second bit line and is in direct contact with a top surface of the second active region, a sidewall of the first isolation region, and a sidewall of the second isolation region.
1. A dynamic random access memory device, comprising:
a substrate comprising a first active region, a first isolation region, a second active region, and a second isolation region arranged in order along a first direction;
a first bit line disposed on the first active region and direct contacting the first active region;
a second bit line disposed on the second isolation region;
an insulating layer disposed between and separating the second bit line and the second isolation region; and
a storage node contact structure disposed between the first bit line and the second bit line and directly contacting a top surface of the second active region, a sidewall of the first isolation region, and a sidewall of the second isolation region.
2. The dynamic random access memory device according to claim 1 , wherein a bottom portion of the storage node contact structure comprises a step profile.
3. The dynamic random access memory device according to claim 1 , further comprising:
a first spacer disposed between a sidewall of the first bit line and the storage node contact structure; and
a second spacer disposed between a sidewall of the second bit line and the storage node contact structure.
4. The dynamic random access memory device according to claim 3 , wherein a bottom corner of the storage node contact structure is on the first spacer.
5. The dynamic random access memory device according to claim 3 , wherein a portion of the storage node contact structure extends to directly below the second spacer.
6. The dynamic random access memory device according to claim 1 , wherein the storage node contact structure directly contacts a bottom surface of the insulating layer.
7. The dynamic random access memory device according to claim 1 , further comprising a remaining portion of the second active region disposed between the storage node contact structure, the insulating layer and the second isolation region.
8. The dynamic random access memory device according to claim 1 , wherein a top surface of the first active region is lower than the top surface of the second active region.
9. The dynamic random access memory device according to claim 1 , wherein a top surface of the first isolation region is lower than a top surface of the second isolation region.
10. The dynamic random access memory device according to claim 1 , wherein the storage node contact structure comprises a semiconductor layer and a metal layer disposed on the semiconductor layer, wherein the semiconductor layer directly contacts the top surface of the second active region, the sidewall of the first isolation region, and the sidewall of the second isolation region.
11. The dynamic random access memory device according to claim 10 , wherein the semiconductor layer comprises:
a lower portion comprising an epitaxial semiconductor layer, wherein a top surface of the lower portion is higher than a bottom surface of the insulating layer; and
an upper portion between the lower portion and the metal layer and comprising a deposited semiconductor layer.