IP Library Granted Patent US 12,498,636
Granted Patent B2
US 12,498,636 · App. 17/792,883 · Granted Dec 16, 2025

Photosensitive resin composition, photosensitive resin film, multilayered printed wiring board, semiconductor package, and method for producing multilayered printed wiring board

Inventors: Hayato Sawamoto (Tokyo, JP); Shuji Nomoto (Tokyo, JP); Akihiro Nakamura (Tokyo, JP); Kohei Otsuka (Tokyo, JP); Yuya Akiyama (Tokyo, JP)
Assignee: RESONAC CORPORATION
G03F7/028C08K3/013H01L21/481H01L23/49894H05K1/0373H05K3/389H01L23/49822H05K3/108H05K3/18H05K3/423H05K2201/0239H05K2201/209H05K2203/072H05K2203/0723
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Quick Facts
Patent No.
US 12,498,636
App. No.
17/792,883
Granted
Dec 16, 2025
Kind
B2
Abstract

Provided is a photosensitive resin composition containing: a photopolymerizable compound (A) having an ethylenically unsaturated group; a photopolymerization initiator (B); and an inorganic filler (F), in which the photopolymerizable compound (A) having an ethylenically unsaturated group includes a photopolymerizable compound (A1) having an acidic substituent and an alicyclic structure together with an ethylenically unsaturated group, and the inorganic filler (F) includes an inorganic filler surface-treated with a coupling agent without at least one functional group selected from the group consisting of an amino group and a (meth)acryloyl group. The present disclosure also provides a photosensitive resin composition for photo via formation, and a photosensitive resin composition for interlayer insulating layer. The present disclosure further provides: a photosensitive resin film and a photosensitive resin film for interlayer insulating layer, each of which contains the photosensitive resin composition; a multilayered printed wiring board and a semiconductor package; and a method for producing a multilayered printed wiring board.

Claims (29)

1 . A photosensitive resin composition comprising:

a photopolymerizable compound (A) having an ethylenically unsaturated group;

a photopolymerization initiator (B); and

an inorganic filler (F), wherein

the photopolymerizable compound (A) having an ethylenically unsaturated group includes a photopolymerizable compound (A1) having an acidic substituent and an alicyclic structure together with an ethylenically unsaturated group, and the alicyclic structure is represented by the following general formula (a):

wherein, in the general formula (a), R A1 represents an alkyl group having 1 to 12 carbon atoms and may be substituted in any site in the alicyclic structure; m 1 is an integer of 0 to 6; and * is a binding site to another structure, and

the inorganic filler (F) includes an inorganic filler surface-treated with a coupling agent without at least one functional group selected from the group consisting of an amino group and a (meth)acryloyl group.

2 . The photosensitive resin composition according to claim 1 , wherein the coupling agent has a group including an alkoxy group.

3 . The photosensitive resin composition according to claim 1 , wherein an average particle size of the inorganic filler (F) is 0.01 to 5 μm.

4 . The photosensitive resin composition according to claim 1 , wherein the content of the inorganic filler (F) is 5 to 80% by mass based on the total solid content.

5 . The photosensitive resin composition according claim 1 , wherein the photopolymerizable compound (A) having an ethylenically unsaturated group further includes at least one selected from the group consisting of a monofunctional vinyl monomer (Ai) having one polymerizable ethylenically unsaturated group, a bifunctional vinyl monomer (Aii) having two polymerizable ethylenically unsaturated groups, and a polyfunctional vinyl monomer (Aiii) having at least three polymerizable ethylenically unsaturated groups.

6 . The photosensitive resin composition according to claim 1 , wherein in the photopolymerizable compound (A1) having an acidic substituent and an alicyclic structure together with an ethylenically unsaturated group, the alicyclic structure is an alicyclic structure having a ring-forming carbon number of 5 to 20.

7 . The photosensitive resin composition according to claim 1 , wherein in the photopolymerizable compound (A1) having an acidic substituent and an alicyclic structure together with an ethylenically unsaturated group, the alicyclic structure includes two or more rings.

8 . The photosensitive resin composition according to claim 1 , further containing a thermosetting resin (C).

9 . The photosensitive resin composition according to claim 1 , further comprising an elastomer (D).

10 . The photosensitive resin composition according to claim 9 , wherein the elastomer (D) includes at least one selected from the group consisting of a styrene-based elastomer, an olefin-based elastomer, a polyester-based elastomer, a urethane-based elastomer, a polyamide-based elastomer, an acrylic elastomer, and a silicone-based elastomer.

11 . The photosensitive resin composition according to claim 1 , wherein the content of the photopolymerizable compound (A) having an ethylenically unsaturated group is 0.1 to 60% by mass based on the total solid content of the photosensitive resin composition.

12 . A photosensitive resin composition for photo via formation, comprising the photosensitive resin composition according to claim 1 .

13 . A photosensitive resin composition for interlayer insulating layer, comprising the photosensitive resin composition according to claim 1 .

14 . A photosensitive resin film comprising the photosensitive resin composition according to claim 1 .

15 . A photosensitive resin film for interlayer insulating layer, comprising the photosensitive resin composition according to claim 1 .

16 . A multilayered printed wiring board comprising an interlayer insulating layer formed of the photosensitive resin composition according to claim 1 .

17 . A multilayered printed wiring board comprising an interlayer insulating layer formed of the photosensitive resin film according to claim 14 .

18 . A semiconductor package comprising the multilayered printed wiring board according claim 16 and a semiconductor element.

19 . A method for producing a multilayered printed wiring board, comprising the following (1) to (4):

(1) laminating the photosensitive resin film according to claim 14 on one surface or both surfaces of a circuit substrate;

(2) exposing and developing the photosensitive resin film laminated in the above (1), to form an interlayer insulating layer having a via;

(3) subjecting the via and the interlayer insulating layer to a roughening treatment; and

(4) forming a circuit pattern on the interlayer insulating layer.

Assignments (3)
CHANGE OF ADDRESS Recorded Feb 9, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066547/0677 →
CHANGE OF NAME Recorded Mar 8, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062992/0805 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 15, 2022
From: SAWAMOTO, HAYATO; NOMOTO, SHUJI; NAKAMURA, AKIHIRO; OTSUKA, KOHEI; AKIYAMA, YUYA
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 060521/0833 →