IP Library Granted Patent US 12,410,507
Granted Patent B2
US 12,410,507 · App. 17/806,531 · Granted Sep 9, 2025

Mask group, method of manufacturing organic device and organic device

Inventors: Yusuke Nakamura (Tokyo, JP); Isao Miyatani (Tokyo, JP); Naoki Nishimura (Tokyo, JP); Hiroshi Yano (Tokyo, JP)
Assignee: Dai Nippon Printing Co., Ltd.
C23C14/042H10K50/82H10K59/121H10K59/65H10K59/80521H10K71/00H10K71/621
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Quick Facts
Patent No.
US 12,410,507
App. No.
17/806,531
Granted
Sep 9, 2025
Kind
B2
Abstract

A mask group may include two or more masks. When a section in a normal direction is viewed, a region-defining straight line may be defined as a straight line that forms an angle θ together with a first surface. The region-defining straight line may intersect the first surface at a first intersection point. An effective region may be defined as a region inside the first intersection point in the through-hole, and a peripheral region may be defined as a region outside the first intersection point in the through-hole. The angle θ may be 35° or more and 70° or less. The penetration region in the second mask region may include a hole overlapping region in which the through-holes of two masks overlap. The hole overlapping region may include a first hole overlapping region in which the peripheral regions of the through-holes of the two masks overlap.

Claims (16)

1. A mask group comprising:

two or more masks,

wherein each of the two or more masks includes a shield region and a through-hole,

wherein a mask multilayer body in which the two or more masks are stacked has a penetration region that overlaps the through-hole when viewed in a normal direction of a mask of the two or more masks,

wherein the mask multilayer body has a first mask region that contains the penetration region that has a first aperture ratio and a second mask region that contains the penetration region that has a second aperture ratio lower than the first aperture ratio when viewed in the normal direction of the mask,

wherein each mask of the two or more masks has a first surface and a second surface that is located opposite the first surface,

wherein the through-hole includes a first recessed portion that is located at the first surface, a second recessed portion that is located at the second surface, and a connection portion at which the first recessed portion and the second recessed portion are connected to each other,

wherein when a section in the normal direction is viewed, a region-defining straight line is defined as a straight line that passes through the connection portion and that forms an angle θ together with the first surface, the region-defining straight line intersects the first surface at a first intersection point, an effective region is defined as a region inside the first intersection point in the through-hole, and a peripheral region is defined as a region outside the first intersection point in the through-hole,

wherein the angle θ is 35° or more and 70° or less,

wherein the penetration region in the second mask region includes a hole overlapping region in which through-holes of two masks of the two or more masks overlap,

wherein the hole overlapping region includes a first hole overlapping region in which the peripheral regions of the through-holes of the two masks that are included in the mask multilayer body overlap, and

wherein effective regions of the through-holes forming the first hole overlapping region do not overlap.

2. The mask group according to claim 1 , wherein the first hole overlapping region is separated from the effective region of the through-holes of the mask.

3. The mask group according to claim 1 , wherein the hole overlapping region includes a second hole overlapping region in which the effective region of the through-hole of one of the masks that are included in the mask multilayer body and the peripheral region of the through-hole of another of the masks overlap.

4. The mask group according to claim 1 , wherein the region-defining straight line is in contact with a freely selected point on a wall surface of the second recessed portion.

5. The mask group according to claim 1 , wherein the two or more masks include a plurality of the through-holes in the first mask region and the second mask region.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 25, 2022
From: NAKAMURA, YUSUKE; MIYATANI, ISAO; NISHIMURA, NAOKI; YANO, HIROSHI
To: DAI NIPPON PRINTING CO., LTD.
Reel/Frame 060603/0236 →
Priority Claims (2)
JP 2021-098994 · Jun 14, 2021 · national
JP 2022-037594 · Mar 10, 2022 · national
Continuity (1)
Related Publication 20220399503A1 · Dec 15, 2022
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