Method of manufacturing a silicon carbide epitaxial substrate
A method of manufacturing a silicon carbide epitaxial substrate includes: preparing a silicon carbide single-crystal substrate having a polytype of 4H and having a principal surface inclined at an angle θ from a {0001} plane in a <11-20> direction; growing a silicon carbide epitaxial layer on the principal surface having a basal plane dislocation, the basal plane dislocation having a portion extending in a <1-100> direction and a portion extending in a <11-20> direction; and irradiating the silicon carbide epitaxial layer with an ultraviolet light having a predetermined power and a predetermined wavelength for a predetermined period of time to stabilize the basal plane dislocation. After the irradiating, the basal plane dislocation does not move even when the basal plane dislocation is irradiated with an ultraviolet light having a power of 270 mW and a wavelength of 313 nm for 10 seconds.
1. A method of manufacturing a silicon carbide epitaxial substrate, the method comprising:
preparing a silicon carbide single-crystal substrate having a polytype of 4H and having a principal surface inclined at an angle θ from a {0001} plane in a <11-20> direction;
growing a silicon carbide epitaxial layer on the principal surface having a basal plane dislocation, the basal plane dislocation having a portion extending in a <1-100> direction and a portion extending in a <11-20> direction; and
irradiating the silicon carbide epitaxial layer with an ultraviolet light having a predetermined power and a predetermined wavelength for a predetermined period of time to stabilize the basal plane dislocation;
wherein after the irradiating, the basal plane dislocation does not move even when the basal plane dislocation is irradiated with an ultraviolet light having a power of 270 mW and a wavelength of 313 nm for 10 seconds.
2. The method according to claim 1 , wherein the predetermined power is 270 mW or more, the predetermined wavelength is 313 nm or less, and the predetermined period of time is 10 seconds or more.
3. The method according to claim 1 , wherein the predetermined power is 270 mW, the predetermined wavelength is 313 nm, and the predetermined period of time is 10 seconds.
4. The method according to claim 1 , wherein a diameter of the silicon carbide single-crystal substrate is greater than or equal to 150 mm.
5. The method according to claim 1 , wherein the angle θ is greater than 0° and less than or equal to 6°.