Source/drain epitaxy process in stacked FET
Embodiments of present invention provide a method of forming a semiconductor structure. The method includes forming a first set of nanosheets and a second set of nanosheets on top of the first set of nanosheets, wherein the first set of nanosheets has an uppermost nanosheet and the second set of nanosheets has a lowermost nanosheet, the lowermost nanosheet being separated from the uppermost nanosheet by a first gap; forming a conformal liner covering the first set of nanosheets and the first gap; covering a first portion of the conformal liner at the first gap with a protective stud; selectively removing a second portion of the conformal liner from end surfaces of the first set of nanosheets; and forming source/drain at the end surfaces of the first set of nanosheets. A structure formed thereby is also provided.
1. A semiconductor structure comprising:
a first nanosheet transistor having a first set of nanosheets, the first set of nanosheets having an uppermost nanosheet; and
a second nanosheet transistor having a second set of nanosheets, the second set of nanosheets having a lowermost nanosheet,
wherein the second nanosheet transistor is stacked directly above the first nanosheet transistor and a first end of the lowermost nanosheet of the second nanosheet transistor is vertically separated from a first end of the uppermost nanosheet of the first nanosheet transistor by a first C-shaped spacer.
2. The semiconductor structure of claim 1 , wherein the first nanosheet transistor comprises inner spacers between the first set of nanosheets, and wherein the inner spacers of the first nanosheet transistor and the first C-shaped spacer are made of a same material.
3. The semiconductor structure of claim 1 , wherein the first end of the uppermost nanosheet of the first nanosheet transistor is adjacent to and substantially aligned vertically with a first horizontal portion of the first C-shaped spacer, and the first end of the lowermost nanosheet of the second nanosheet transistor is adjacent to but misaligned vertically with a second horizontal portion of the first C-shaped spacer.
4. The semiconductor structure of claim 1 , wherein the uppermost nanosheet of the first nanosheet transistor has a first length and the lowermost nanosheet of the second nanosheet transistor has a second length, and the first length of the uppermost nanosheet is longer than the second length of the lowermost nanosheet.
5. The semiconductor structure of claim 1 , wherein a source/drain region of the first nanosheet transistor is isolated from a source/drain region of the second nanosheet transistor by a middle-dielectric-isolation (MDI) region.
6. The semiconductor structure of claim 1 , wherein the first nanosheet transistor has a first gate metal and the second nanosheet transistor has a second gate metal and the first gate metal and the second gate metal are connected through a connecting gate contact, wherein a vertical portion of the first C-shaped spacer is directly adjacent to the connecting gate contact.
7. The semiconductor structure of claim 1 , wherein the first nanosheet transistor comprises a first and second sections and the second nanosheet transistor is stacked directly above the first section of the first nanosheet transistor, the second section of the first nanosheet transistor comprises a second C-shaped spacer directly above the uppermost nanosheet of the first nanosheet transistor, wherein a vertical portion of the second C-shaped spacer has a height that is lower than a height of a vertical portion of the first C-shaped spacer.
8. A semiconductor structure comprising:
a first nanosheet transistor having an uppermost nanosheet; and
a second nanosheet transistor having a lowermost nanosheet,
wherein the second nanosheet transistor is stacked directly above the first nanosheet transistor and a first end of the lowermost nanosheet of the second nanosheet transistor and a first end of the uppermost nanosheet of the first nanosheet transistor are directly adjacent to a first C-shaped spacer, and wherein a length of the uppermost nanosheet of the first nanosheet transistor is longer than a length of the lowermost nanosheet of the second nanosheet transistor.
9. The semiconductor structure of claim 8 , wherein the first nanosheet transistor comprises inner spacers between a first set of nanosheets, the first set of nanosheets including the uppermost nanosheet, and wherein the inner spacers of the first nanosheet transistor and the first C-shaped spacer are made of a same material.
10. The semiconductor structure of claim 8 , wherein the first end of the uppermost nanosheet of the first nanosheet transistor is substantially aligned vertically with a first horizontal portion of the first C-shaped spacer, and the first end of the lowermost nanosheet of the second nanosheet transistor is misaligned vertically with a second horizontal portion of the first C-shaped spacer.
11. The semiconductor structure of claim 8 , wherein a source/drain region of the first nanosheet transistor is isolated from a source/drain region of the second nanosheet transistor by a middle-dielectric-isolation (MDI) region.
12. The semiconductor structure of claim 8 , wherein the first nanosheet transistor has a first gate metal and the second nanosheet transistor has a second gate metal and the first gate metal and the second gate metal are connected through a connecting gate contact, wherein a vertical portion of the first C-shaped spacer is directly adjacent to the connecting gate contact.
13. The semiconductor structure of claim 8 , further comprising a second C-shaped spacer directly above the uppermost nanosheet of the first nanosheet transistor in a section of the first nanosheet transistor not covered by the second nanosheet transistor, wherein a vertical portion of the second C-shaped spacer has a height that is lower than a height of a vertical portion of the first C-shaped spacer.
14. A method of forming a semiconductor structure comprising:
forming a first set of nanosheets and a second set of nanosheets on top of the first set of nanosheets, wherein the first set of nanosheets has an uppermost nanosheet and the second set of nanosheets has a lowermost nanosheet, the lowermost nanosheet being vertically separated from the uppermost nanosheet by a first gap;
forming a conformal liner covering the first set of nanosheets and the first gap;
covering a first portion of the conformal liner at the first gap with a protective stud;
selectively removing a second portion of the conformal liner from end surfaces of the first set of nanosheets; and
forming source/drain regions at the end surfaces of the first set of nanosheets.
15. The method of claim 14 , wherein forming the conformal liner comprises:
recessing a sacrificial material between the first set of nanosheets and in the first gap to create indentations between the first set of nanosheets and in the first gap; and
forming the conformal liner to form inner spacers between the first set of nanosheets by fully filling the indentations between the first set of nanosheets and form a C-shaped spacer between the uppermost nanosheet and the lowermost nanosheet by partially filling the indentation between the uppermost nanosheet and the lowermost nanosheet.
16. The method of claim 15 , further comprising, before forming the source/drain at the end surfaces of the first set of nanosheets, removing the protective stud to expose the first portion of the conformal liner.
17. The method of claim 14 , wherein covering the first portion of the conformal liner comprises covering the conformal liner with a protective material and recessing the protective material in an anisotropic etching process to remove the protective material, except a portion thereof that forms the protective stud, from the conformal liner.
18. The method of claim 14 , further comprising removing sacrificial gate materials surrounding the first and second sets of nanosheets with a gate metal in a replacement-metal-gate (RMG) process.
19. The method of claim 14 , further comprising forming middle-dielectric-isolation (MDI) above the source/drain regions of the first set of nanosheets, wherein the MDI has sidewall surfaces being encapsuled by the first portion of the conformal liner.
20. The method of claim 19 , further comprising forming source/drain regions of the second set of nanosheets, wherein the source/drain regions of the second set of nanosheets are isolated from the source/drain regions of the first set of nanosheets by the MDI.