IP Library Granted Patent US 12,627,062
Granted Patent B2
US 12,627,062 · App. 17/865,685 · Granted May 12, 2026

Antenna system

Inventors: Kyle J. Byers (Kansas City, MO); Brian C. Rutherford (Stilwell, KS); Matt Clewell (Kansas City, MO)
Assignee: Honeywell Federal Manufacturing & Technologies, LLC
H01Q11/083H01Q1/2283
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Quick Facts
Patent No.
US 12,627,062
App. No.
17/865,685
Granted
May 12, 2026
Kind
B2
Abstract

An antenna system comprises a substrate, an antenna positioned on the substrate, and a circuit component positioned on the substrate. The antenna is positioned on a first surface of the substrate and operable to emit a radiation pattern. The circuit component is positioned on the substrate in a null region of the radiation pattern. The thickness of portions of the substrate are modified to achieve a desired performance characteristic of the antenna.

Claims (10)

1 . A method of fabricating an antenna system, the method comprising:

depositing an antenna on a first surface of a substrate, the antenna being configured to emit a radiation pattern having a radiation region;

positioning a circuit component on the substrate below at least a portion of the antenna outside of the radiation region;

modifying a thickness of the substrate to a desired thickness corresponding to a desired capacitance between a ground plane and the antenna, the desired capacitance being configured to help the antenna generate a predetermined fringe electric field; and

depositing the ground plane on a second surface of the substrate to obtain the desired capacitance between the ground plane and the antenna.

2 . The method of claim 1 , wherein the antenna is deposited via additive manufacturing.

3 . The method of claim 1 , wherein the thickness of the substrate is modified via at least one of laser ablation, ion milling, or etching.

4 . The method of claim 1 , further comprising a step of forming a recess on a second surface of the substrate, the second surface opposing the first surface, wherein the step of positioning the circuit component includes positioning the circuit component in the recess.

5 . The method of claim 1 , further comprising a step of forming a platform on a second surface of the substrate, the second surface opposing the first surface, wherein the step of positioning the circuit component includes positioning the circuit component on the platform.

6 . The method of claim 1 , further comprising a step of forming a chamber in the substrate below the first surface of the substrate, wherein the step of positioning the circuit component includes positioning the circuit component in the chamber.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 27, 2022
From: BYERS, KYLE J.; RUTHERFORD, BRIAN C.
To: HONEYWELL FEDERAL MANUFACTURING & TECHNOLOGIES, LLC
Reel/Frame 060646/0896 →
Continuity (3)
Division 16542476 · Aug 16, 2019
Provisional Application 62720528 · Aug 21, 2018
Related Publication 20220368020A1 · Nov 17, 2022
References Cited (11)
US 6992314B2 · Masaki et al. · 2006 [cited by applicant]
US 7474272B2 · Lamoureux et al. · 2009 [cited by applicant]
US 8256685B2 · Chen et al. · 2012 [cited by applicant]
US 8307535B2 · Feller et al. · 2012 [cited by applicant]
US 8502735B1 · Moosbrugger · 2013 [cited by examiner]
US 8745853B2 · Grbic et al. · 2014 [cited by applicant]
US 8810466B2 · Sciré-Scappuzzo et al. · 2014 [cited by applicant]
US 10270186B2 · Teshima et al. · 2019 [cited by applicant]
US 10811777B1 · Fuchi · 2020 [cited by examiner]
US 20120038526A1 · Lim · 2012 [cited by examiner]
US 20170097440A1 · Stolarczyk · 2017 [cited by examiner]