IP Library Granted Patent US 12,429,517
Granted Patent B2
US 12,429,517 · App. 17/903,632 · Granted Sep 30, 2025

Thermal measurement of materials

Inventors: Rohan Shirsat (Bangalore, IN); Ankur Agrawal (Bangalore, IN)
Assignee: Sandisk Technologies, Inc.
G01R31/2875G01R31/2601G01R31/2862
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,429,517
App. No.
17/903,632
Granted
Sep 30, 2025
Kind
B2
Abstract

A thermal measurement system includes a temperature-controlled chamber configured to house a Device Under Test (DUT) and a first temperature sensor to measure an external temperature of the DUT inside the temperature-controlled chamber. The thermal measurement system further includes a heating device for heating a test material outside the temperature-controlled chamber and a controller configured to control the heating device to heat the test material to the external temperature measured by the first temperature sensor of the DUT inside the temperature-controlled chamber. In one aspect, a thermethesiometer indicates a skin effect of a surface temperature of the test material outside the temperature-controlled chamber.

Claims (38)

1. A thermal measurement system, comprising:

a temperature-controlled chamber configured to house a Device Under Test (DUT);

a first temperature sensor configured to measure an external temperature of the DUT inside the temperature-controlled chamber;

a heating device configured to heat a test material outside the temperature-controlled chamber;

a second temperature sensor configured to measure a temperature of the test material outside the temperature-controlled chamber; and

a controller configured to control the heating device to heat the test material to the external temperature measured by the first temperature sensor of the DUT inside the temperature-controlled chamber.

2. The thermal measurement system of claim 1 , further comprising a thermethesiometer outside the temperature-controlled chamber and configured to indicate a skin effect of a surface temperature of the test material.

3. The thermal measurement system of claim 1 , wherein the test material is comprised of the same material as an exterior component of the DUT and has the same thickness as the exterior component of the DUT.

4. The thermal measurement system of claim 1 , further comprising means for heating an ambient temperature inside the temperature-controlled chamber to greater than 32 degrees Celsius.

5. The thermal measurement system of claim 1 , further comprising means for heating an ambient temperature inside the temperature-controlled chamber to greater than 40 degrees Celsius.

6. The thermal measurement system of claim 1 , further comprising means for operating the DUT inside the temperature-controlled chamber.

7. The thermal measurement system of claim 1 , wherein the first temperature sensor is further configured to measure the external temperature of the DUT on a surface of the DUT that has a length or a width that is smaller than 2.5 centimeters.

8. A method for measuring a temperature of a test material, the method comprising:

heating an ambient temperature inside a temperature-controlled chamber to a target temperature, wherein the temperature-controlled chamber houses a Device Under Test (DUT);

measuring an exterior surface temperature of the DUT inside the temperature-controlled chamber when the ambient temperature is at the target temperature;

heating a test material outside the temperature-controlled chamber to the measured exterior surface temperature of the DUT; and

measuring a surface temperature of the test material outside the temperature-controlled chamber.

9. The method of claim 8 , further comprising using a thermethesiometer to indicate a skin effect of a the surface temperature of the test material outside the temperature-controlled chamber.

10. The method of claim 8 , wherein the test material is comprised of the same material as an exterior component of the DUT and has the same thickness as the exterior component of the DUT.

11. The method of claim 8 , wherein the target temperature is greater than 32 degrees Celsius.

12. The method of claim 8 , wherein the target temperature is greater than 40 degrees Celsius.

13. The method of claim 8 , further comprising operating the DUT inside the temperature-controlled chamber.

14. A thermal measurement system, comprising:

a temperature-controlled chamber for housing a Device Under Test (DUT);

a first temperature sensor configured to measure an external temperature of the DUT inside the temperature-controlled chamber;

a heating device configured to heat a test material outside the temperature-controlled chamber to the external temperature of the DUT inside the temperature-controlled chamber; and

a thermethesiometer configured to indicate a skin effect of a surface temperature of the test material outside the temperature-controlled chamber.

15. The thermal measurement system of claim 14 , further comprising:

a second temperature sensor configured to measure the temperature of the test material outside the temperature-controlled chamber; and

a controller configured to control the heating device to heat the test material to the external temperature of the DUT measured by the first temperature sensor inside the temperature-controlled chamber.

16. The thermal measurement system of claim 14 , wherein the test material is comprised of the same material as an exterior component of the DUT and has the same thickness as the exterior component of the DUT.

17. The thermal measurement system of claim 14 , further comprising:

an ambient temperature sensor configured to measure an ambient temperature inside the temperature-controlled chamber;

a second heating device for heating an interior of the temperature-controlled chamber; and

circuitry for controlling the second heating device to heat the interior of the temperature-controlled chamber to an ambient target temperature based on the ambient temperature measured by the ambient temperature sensor.

18. The thermal measurement system of claim 17 , wherein the target temperature is greater than 40 degrees Celsius.

19. The thermal measurement system of claim 14 , further comprising a host configured to perform at least one of supplying power to the DUT inside the temperature-controlled chamber and communicating with the DUT inside the temperature-controlled chamber.

20. The thermal measurement system of claim 14 , wherein the first temperature sensor is further configured to measure the external temperature of the DUT on a surface of the DUT that has a length or a width that is smaller than 2.5 centimeters.

Assignments (8)
PARTIAL RELEASE OF SECURITY INTERESTS Recorded Apr 25, 2025
From: JPMORGAN CHASE BANK, N.A., AS AGENT
To: SANDISK TECHNOLOGIES, INC.
Reel/Frame 071382/0001 →
SECURITY AGREEMENT Recorded Apr 25, 2025
From: SANDISK TECHNOLOGIES, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 071050/0001 →
PATENT COLLATERAL AGREEMENT Recorded Aug 23, 2024
From: SANDISK TECHNOLOGIES, INC.
To: JPMORGAN CHASE BANK, N.A., AS THE AGENT
Reel/Frame 068762/0494 →
CHANGE OF NAME Recorded Jun 27, 2024
From: SANDISK TECHNOLOGIES, INC.
To: SANDISK TECHNOLOGIES, INC.
Reel/Frame 067982/0032 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 29, 2024
From: WESTERN DIGITAL TECHNOLOGIES, INC.
To: SANDISK TECHNOLOGIES, INC.
Reel/Frame 067567/0682 →
PATENT COLLATERAL AGREEMENT - A&R LOAN AGREEMENT Recorded Aug 21, 2023
From: WESTERN DIGITAL TECHNOLOGIES, INC.
To: JPMORGAN CHASE BANK, N.A.
Reel/Frame 064715/0001 →
PATENT COLLATERAL AGREEMENT - DDTL LOAN AGREEMENT Recorded Aug 21, 2023
From: WESTERN DIGITAL TECHNOLOGIES, INC.
To: JPMORGAN CHASE BANK, N.A.
Reel/Frame 067045/0156 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 6, 2022
From: SHIRSAT, ROHAN; AGRAWAL, ANKUR
To: WESTERN DIGITAL TECHNOLOGIES, INC.
Reel/Frame 060999/0713 →
Continuity (2)
Provisional Application 63245690 · Sep 17, 2021
Related Publication 20230091586A1 · Mar 23, 2023
References Cited (5)
US 20210396694A1 · Smith · 2021 [cited by examiner]
US 20240125843A1 · Nakayama · 2024 [cited by examiner]
EP 1347280A1 · 2003 [cited by examiner]
KR 20220150823A · 2022 [cited by examiner]
KR 20230111442A · 2023 [cited by examiner]