Thin-film transistor and preparation method therefor, and display substrate and display panel
Disclosed are a thin-film transistor and a preparation method therefor, and a display substrate and a display panel. The thin-film transistor includes: a base substrate; an active layer located on the base substrate; and a source-drain electrode which is located on the side of the active layer facing away from the base substrate, and includes an electrode layer and a protective layer, where the material of the electrode layer includes a first metal element; the protective layer covers the surface of the side of the electrode layer facing away from the base substrate, and a side face of the electrode layer; and the material of the protective layer is an oxide of the first metal element.
1 . A thin-film transistor, comprising:
a base substrate;
an active layer arranged on the base substrate; and
a source-drain electrode layer, which is arranged on a side, facing away from the base substrate, of the active layer, and comprises an electrode layer, a transition layer arranged between the active layer and the electrode layer, and a protective layer,
wherein a material of the electrode layer comprises a first metal element, and a mass percentage of the first metal element in the electrode layer is less than 0.5 wt. %;
the protective layer covers a surface of a side, facing away from the base substrate, of the electrode layer, and a side face of the electrode layer;
a material of the protective layer is an oxide of the first metal element;
an orthographic projection of the transition layer on the base substrate overlaps with an orthographic projection of the electrode layer on the base substrate.
2 . The thin-film transistor according to claim 1 , wherein the protective layer further covers a side face of the transition layer.
3 . The thin-film transistor according to claim 1 , wherein the electrode layer is made of an alloy material; and the alloy material comprises the first metal element.
4 . The thin-film transistor according to claim 3 , wherein the material of the electrode layer comprises a copper alloy.
5 . The thin-film transistor according to claim 4 , wherein the first metal element is an aluminum element; and the material of the protective layer comprises aluminum oxide.
6 . The thin-film transistor according to claim 4 , wherein the first metal element is a chromium element; and the material of the protective layer comprises chromium oxide.
7 . The thin-film transistor according to claim 1 , wherein a ratio of a thickness of the protective layer to a thickness of the electrode layer ranges from 1/20 to 1/200.
8 . The thin-film transistor according to claim 1 , wherein the active layer comprises: an undamaged layer close to the base substrate and a damaged layer far away from the base substrate;
wherein an orthographic projection of the damaged layer on the base substrate does not overlap with an orthographic projection of a channel region of the thin-film transistor on the base substrate.
9 . The thin-film transistor according to claim 8 , wherein the orthographic projection of the damaged layer on the base substrate is on two sides of the orthographic projection of the channel region of the thin-film transistor on the base substrate.
10 . A display substrate, comprising the thin-film transistor according to claim 1 .
11 . A display panel, comprising the display substrate according to claim 10 .
12 . A preparation method for the thin-film transistor according to claim 1 , comprising:
preparing and forming the active layer on the base substrate;
sequentially depositing a transition layer and the electrode layer of the source-drain electrode layer on the active layer, wherein the electrode layer comprises the first metal element;
patterning the transition layer and the electrode layer by a patterning process to form a pattern of the source-drain electrode layer; and
oxidizing the source-drain electrode layer for forming a layer of an oxide film of the first metal element on a surface of the electrode layer.
13 . The preparation method according to claim 12 , wherein the electrode layer is made of a copper alloy, and the first metal element is aluminum or chromium;
wherein the oxidizing the source-drain electrode layer for forming the layer of the oxide film of the first metal element on the surface of the electrode layer specifically comprises:
performing thermal annealing treatment on the electrode layer at an annealing temperature of higher than or equal to 300° C. for an annealing time of greater than or equal to 1 h under an atmosphere of air, for forming a layer of aluminum oxide film or chromium oxide film on the surface of the electrode layer.
14 . The preparation method according to claim 12 , wherein the sequentially depositing the transition layer and the electrode layer of the source-drain electrode layer on the active layer specifically comprises:
sequentially depositing the transition layer and the electrode layer by using a plasma sputtering deposition process while forming a damage layer on an upper surface of the active layer;
wherein the patterning the transition layer and the electrode layer by the patterning process to form the pattern of the source-drain electrode layer specifically comprises:
etching the transition layer and the electrode layer by an etching solution for an etch time of greater than or equal to (EPD+A/B), wherein EPD is a time required for the transition layer and the electrode layer to be etched exactly, A is a depth of a damaged layer in the active layer, and B is an etching rate of the damaged layer in the active layer by the etching solution.