IP Library Patent Application 17925014
Patent Application
App. No. 17/925,014

PRIMER, SUBSTRATE EQUIPPED WITH PRIMER LAYER, METHOD FOR PRODUCING SUBSTRATE EQUIPPED WITH PRIMER LAYER, SEMICONDUCTOR DEVICE, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

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Quick Facts
Patent No.
US None
App. No.
17/925,014
Abstract

A primer for forming a primer layer on the surface of a substrate having surface free energy of 50 mN/m or higher, the primer including a liquid crystalline epoxy compound and a curing agent.

Claims (54)

1 . A primer for forming a primer layer on a surface of a substrate having a surface free energy of 50 mN/m or higher, the primer comprising:

a liquid crystalline epoxy compound; and

a curing agent.

2 . The primer according to claim 1 ,

wherein the liquid crystalline epoxy compound comprises at least one of a structure represented by the following general formula (M-1) and a structure represented by the following general formula (M-2),

in the general formula (M-1) and the general formula (M-2), Y's each independently represent an aliphatic hydrocarbon group having 1 to 8 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a cyano group, a nitro group or an acetyl group, n's each independently represent an integer of 0 to 4, and * represents a bonding site to an adjacent atom.

3 . The primer according to claim 2 ,

wherein the crystalline epoxy compound comprises a reaction product between a liquid crystalline epoxy compound comprising at least one of the structure represented by the general formula (M-1) and the structure represented by the general formula (M-2) and at least one selected from the group consisting of hydroquinone, 3,3-biphenol, 4,4-biphenol, 2,6-naphthalenediol, 1,5-naphthalenediol, 4-hydroxybenzoic acid and 2-hydroxy-6-naphthoic acid.

4 . The primer according to claim 1 ,

wherein the curing agent comprises at least one selected from the group consisting of an amine-based curing agent and a phenolic curing agent.

5 . The primer according to claim 1 ,

wherein a liquid crystalline structure that is formed by a reaction between the liquid crystalline epoxy compound and the curing agent is a nematic structure or a smectic structure.

6 . The primer according to claim 5 ,

wherein the smectic structure has a periodic structure in which a length of one period is 2 nm to 4 nm.

7 . The primer according to claim 1 , further comprising:

an alcohols solvent.

8 . The primer according to claim 1 ,

wherein the substrate is a metal substrate.

9 . A substrate equipped with a primer layer comprising:

a substrate; and

a primer layer,

wherein the primer layer is a cured product of the primer according to claim 1 , and

a surface free energy of a surface of the substrate facing the primer layer is 50 mN/m or higher.

10 . A method for producing a substrate equipped with a primer layer, the method comprising:

a step of forming a layer comprising the primer according to claim 1 on a substrate; and

a step of forming a primer layer by curing the layer comprising the primer,

wherein a surface free energy of a surface of the substrate facing the primer layer is 50 mN/m or higher.

11 . A semiconductor device comprising:

a substrate;

a primer layer; and

an insulating member in this order,

wherein the primer layer is a cured product of the primer according to claim 1 , and

a surface free energy of a surface of the substrate facing the primer layer is 50 mN/m or higher.

12 . A method for producing a semiconductor, the method comprising:

a step of forming a layer comprising the primer according to claim 1 , on a substrate;

a step of disposing an insulating member on the layer comprising the primer, and

a step of forming a primer layer by curing the layer comprising the primer,

wherein a surface free energy of a surface of the substrate facing the primer layer is 50 mN/m or higher.

13 . The primer according to claim 2 ,

wherein the curing agent comprises at least one selected from the group consisting of an amine-based curing agent and a phenolic curing agent.

14 . The primer according to claim 3 ,

wherein the curing agent comprises at least one selected from the group consisting of an amine-based curing agent and a phenolic curing agent.

15 . The primer according to claim 2 ,

wherein a liquid crystalline structure that is formed by a reaction between the liquid crystalline epoxy compound and the curing agent is a nematic structure or a smectic structure.

16 . The primer according to claim 3 ,

wherein a liquid crystalline structure that is formed by a reaction between the liquid crystalline epoxy compound and the curing agent is a nematic structure or a smectic structure.

17 . The primer according to claim 4 ,

wherein a liquid crystalline structure that is formed by a reaction between the liquid crystalline epoxy compound and the curing agent is a nematic structure or a smectic structure.

18 . The primer according to claim 2 , further comprising:

an alcohols solvent.

19 . The primer according to claim 3 , further comprising:

an alcohols solvent.

20 . The primer according to claim 4 , further comprising:

an alcohols solvent.

Assignments (3)
CHANGE OF ADDRESS Recorded Feb 9, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066547/0677 →
CHANGE OF NAME Recorded Apr 23, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 063410/0085 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 5, 2022
From: TANG, NING; TANAKA, SHINGO; TAKEZAWA, YOSHITAKA
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 061965/0520 →