Power tap cell for front side power rail connection to BSPDN
A semiconductor structure is presented having a plurality of circuit rows, a plurality of first power rails positioned on front sides of the plurality of circuit rows, a plurality of second power rails positioned on back sides of the plurality of circuit rows, and power tap cells associated with each the plurality of circuit rows, wherein each of the power tap cells includes one or more power vias connecting at least one first power rail of the plurality of first power rails to at least one second power rail of the plurality the second power rails. In one instance, the plurality of second power rails are orthogonal to the plurality of first power rails. in another instance, the plurality of first power rails are horizontally offset from the plurality of second power rails. The one or more power vias include at least two or more different sized power vias.
1 . A semiconductor structure comprising:
a first circuit row;
a first power rail on a front side of the first circuit row;
a second power rail on a back side of the first circuit row, wherein the first power rail is horizontally offset from the second power rail; and
a first cell in the first circuit row, wherein the first cell includes one or more power vias connecting the first power rail to the second power rail.
2 . The semiconductor structure of claim 1 , wherein the one or more power vias have at least two or more different sized power vias.
3 . The semiconductor structure of claim 1 , wherein the one or more power vias include at least two or more different aspect ratios.
4 . The semiconductor structure of claim 1 , wherein the first cell is positioned on an edge of the first circuit row.
5 . The semiconductor structure of claim 1 , wherein additional power rails are positioned over the first power rail, such that the additional power rails are perpendicular to the first power rail.
6 . A semiconductor structure comprising:
a plurality of circuit rows;
a plurality of first power rails positioned on front sides of the plurality of circuit rows;
a plurality of second power rails positioned on back sides of the plurality of circuit rows, wherein the plurality of first power rails are horizontally offset from the plurality of second power rails; and
power tap cells associated with each of the plurality of circuit rows, wherein each of the power tap cells includes one or more power vias connecting at least one first power rail of the plurality of first power rails to at least one second power rail of the plurality of second power rails.
7 . The semiconductor structure of claim 6 , wherein the one or more power vias include at least two or more different sized power vias.
8 . The semiconductor structure of claim 6 , wherein the one or more power vias have at least two or more different aspect ratios.
9 . The semiconductor structure of claim 6 , wherein each of the plurality of circuit rows is associated with a single power tap cell of the power tap cells.
10 . The semiconductor structure of claim 6 , wherein at least one power tap cell of the power tap cells is positioned within two circuit rows of the plurality of circuit rows.
11 . The semiconductor structure of claim 6 , wherein the power tap cells are positioned on an edge of the plurality of circuit rows.
12 . The semiconductor structure of claim 6 , wherein additional power rails are positioned over the plurality of first power rails, such that the additional power rails are perpendicular to the plurality of first power rails.
13 . A semiconductor structure comprising:
a first power rail on a front side of a stacked field effect transistor (FET);
a second power rail on a back side of the stacked FET, wherein the first power rail is horizontally offset from the second power rail; and
a tap power cell having one or more power vias connecting the first power rail to the second power rail.
14 . The semiconductor structure of claim 13 , wherein the one or more power vias have at least two or more different sized power vias.
15 . The semiconductor structure of claim 13 , wherein the one or more power vias include at least two or more different aspect ratios.
16 . The semiconductor structure of claim 13 , wherein the tap power cell is positioned on an edge of a circuit row.
17 . The semiconductor structure of claim 13 , wherein additional power rails are positioned over the first power rail, such that the additional power rails are perpendicular to the first power rail.