Integrated circuit having contact jumper

1. An integrated circuit comprising:

first and second fins each extending in a first direction;

first and second gate lines each extending longitudinally across the first and second fins in a second direction substantially perpendicular to the first direction; and

a first contact jumper comprising a first conductive pattern extending in the first direction, and a second conductive pattern extending longitudinally in the second direction and connected to the first conductive pattern.

2. The integrated circuit of claim 1 , wherein the second conductive pattern is located above the first fin and extends between the first and second gate lines.

3. The integrated circuit of claim 1 , wherein the second conductive pattern corresponds to a source/drain contact.

4. The integrated circuit of claim 3 , wherein the source/drain contact is connected to a first transistor including the first gate line and a second transistor including the second gate line.

5. The integrated circuit of claim 1 , wherein the first conductive pattern corresponds to a power region to which a power supply voltage or a ground voltage is applied.

6. The integrated circuit of claim 1 , wherein a power supply voltage or a ground voltage is applied to the first contact jumper.

7. The integrated circuit of claim 1 , further comprising a second contact jumper spaced apart from the first contact jumper.

8. The integrated circuit of claim 7 , wherein the second contact jumper comprises:

a third conductive pattern extending in the first direction, and

a fourth conductive pattern extending longitudinally in the second direction and connected to the third conductive pattern.

9. The integrated circuit of claim 8 , wherein the fourth conductive pattern is located above the second fin and extends between the first and second gate lines.

10. The integrate circuit of claim 8 , wherein a power supply voltage is applied to the first contact jumper and a ground voltage is applied to the second contact jumper.

11. The integrated circuit of claim 1 , wherein the first and second fins are spaced in the second direction such that a middle region exists as interposed between the first and second fins in the second direction.

12. The integrated circuit of claim 1 , wherein the second conductive pattern is electrically insulated from the first and second gate lines.

13. An integrated circuit comprising:

first and second fins each extending in a first direction and spaced in a second direction substantially perpendicular to the first direction such that a middle region exists as interposed between the first and second fins in the second direction;

first and second gate lines spaced from each other in the first direction, each of the first and second gate lines extending longitudinally across the first and second fins and the middle region in the second direction;

a contact jumper comprising a first conductive pattern extending in the first direction and crossing the first gate line and a second conductive pattern extending longitudinally in the second direction and connected to the first conductive pattern; and

a metal layer comprising a first metal pattern extending in the first direction above the first fin, a second metal pattern extending in the first direction above the second fin, and a plurality of third metal patterns extending in the second direction in the middle region.

14. The integrated circuit of claim 13 , wherein the first conductive pattern is located below the first metal pattern or the second metal pattern.

15. The integrated circuit of claim 13 , wherein the first conductive pattern is located above the first metal pattern or the second metal pattern.

16. The integrated circuit of claim 13 , wherein the second conductive pattern is located below at least one of the third metal patterns.

17. The integrated circuit of claim 13 , wherein the second conductive pattern is located above at least one of the third metal patterns.

18. The integrated circuit of claim 13 , wherein the first conductive pattern is located below at least two of the third metal patterns.

19. The integrated circuit of claim 13 , wherein the first conductive pattern is located above at least two of the third metal patterns.

20. The integrated circuit of claim 13 , wherein the second conductive pattern is located below the first gate line or the second gate line.

21. The integrated circuit of claim 13 , wherein the second conductive pattern is located above the first gate line or the second gate line.

22. The integrated circuit of claim 13 , wherein the second conductive pattern extends between the first and second gate lines.

23. An integrated circuit comprising:

first and second fins each extending in a first direction and spaced in a second direction substantially perpendicular to the first direction such that a middle region exists as interposed between the first and second fins in the second direction;

first and second gate lines spaced from each other in the first direction, each of the first and second gate lines extending longitudinally across the first and second fins and the middle region in the second direction; and

a contact jumper comprising a first conductive pattern extending in the first direction and crossing the first gate line above the first fin and a second conductive pattern extending longitudinally in the second direction and connected to the first conductive pattern.

24. The integrated circuit of claim 23 , wherein the second conductive pattern is arranged above the first gate line.

25. The integrated circuit of claim 23 , wherein the second conductive pattern extends between the first and second gate lines.

26. The integrated circuit of claim 25 , wherein the first conductive pattern crosses the first and second gate lines.