IP Library › Granted Patent US 12,603,259
Granted Patent B2
US 12,603,259 · App. 18/334,038 · Granted Apr 14, 2026

Resistivity-controlled dielectric materials for substrate supports with improved high temperature chucking

Inventors: Amir H. Tavakoli (San Jose, CA); Jian Li (Fremont, CA); Peter Reimer (San Jose, CA)
Assignee: Applied Materials, Inc.
H01J37/32724H01L21/6833H01J2237/2001H01J2237/2007H01J2237/332
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Quick Facts
Patent No.
US 12,603,259
App. No.
18/334,038
Granted
Apr 14, 2026
Kind
B2
Abstract

Substrate support assembly and methods of making such substrate support assemblies are provided. Substrate support assemblies include an electrostatic chuck body defining a substrate support surface, a support stem coupled with the electrostatic chuck body, and an electrode embedded within the electrostatic chuck body. Substrate support surfaces exhibit a resistivity of 1×10 8 Ω-cm to 1×10 11 Ω-cm at a temperature of greater than 650° C. Substrate support surfaces can include a composite ceramic material having a base dielectric material and a second dielectric material having an electrical resistivity at least about two times higher than an electrical resistivity of the base dielectric material at a temperature of greater than 650° C.

Claims (15)

1 . A substrate support assembly comprising:

an electrostatic chuck body defining a substrate support surface;

a support stem coupled with the electrostatic chuck body; and

an electrode embedded within the electrostatic chuck body, wherein the substrate support surface comprises a composite ceramic material, the composite ceramic material comprising a second dielectric material dispersed in a base dielectric material, and the substrate support surface comprises a resistivity of 1×10 8 Ω-cm to 1×10 11 Ω-cm at a temperature of greater than 600° C.

2 . The substrate support assembly of claim 1 , wherein the substrate support surface comprises a resistivity of 1×10 8 Ω-cm to 1×10 11 Ω-cm at a temperature of greater than 650° C.

3 . The substrate support assembly of claim 1 , further comprising a heater embedded in the chuck body.

4 . A substrate support assembly comprising:

an electrostatic chuck body defining a substrate support surface;

a support stem coupled with the electrostatic chuck body; and

an electrode embedded within the electrostatic chuck body;

wherein the substrate support surface comprises a composite ceramic material, the composite ceramic material comprising a base dielectric material dispersed in a second dielectric material, wherein the second dielectric material comprises an electrical resistivity at least about two times higher than an electrical resistivity of the base dielectric material at a temperature of greater than 600° C.

5 . The substrate support assembly of claim 4 , wherein the composite ceramic material has a second dielectric material concentration at any given point along the substrate support or portion thereof that is greater than or about 50% of an average second dielectric material concentration.

6 . The substrate support assembly of claim 4 , wherein the base dielectric material comprises aluminum nitride and/or the second dielectric material comprises boron nitride.

7 . The substrate support assembly of claim 6 , wherein the boron nitride is polycrystalline boron nitride, pyrolytic boron nitride, amorphous boron nitride, stack of multiple sheets of boron nitride, or a combination thereof.

8 . The substrate support assembly of claim 4 , wherein the second dielectric material is present in the composite ceramic material in an amount of about 0.1 wt. % to about 30 wt. %, based upon the weight of the base dielectric material and the second dielectric material.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 28, 2023
From: TAVAKOLI, AMIR H.; LI, JIAN; REIMER, PETER
To: APPLIED MATERIALS, INC.
Reel/Frame 065066/0683 →
Continuity (1)
Related Publication 20240420933A1 · Dec 19, 2024
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