Method of making semiconductor device including optical through via and method of using
A method of making a semiconductor device includes defining an opening extending from a first side of a substrate to a second side of the substrate, wherein the first side of the substrate is opposite the second side of the substrate. The method further includes depositing a dielectric material into the opening, wherein the dielectric material has a first refractive index. The method further includes etching the dielectric material to define a core opening extending from the first side of the substrate to the second side of the substrate. The method further includes depositing a core material into the core opening, wherein the core material has a second refractive index different from the first refractive index, and the core material is optically transparent. The method further includes removing excess core material from a surface of the substrate.
1 . A method of using a semiconductor device comprising:
receiving an optical signal in a waveguide on a first side of a substrate, wherein the substrate comprises a semiconductor material;
deflecting the optical signal into an optical through via (OTV) using a first beam deflector on the first side of the substrate, wherein the OTV extends through the substrate from the first side of the substrate to a second side of the substrate;
deflecting the optical signal on the second side of the substrate using a second beam deflector, wherein deflecting the optical signal into the OTV comprises controlling a deflection angle of the first beam deflector; and
detecting the optical signal using a photodetector (PD) on the second side of the substrate.
2 . The method of claim 1 , wherein the waveguide comprises:
a core configured to permit the optical signal to propagate; and
a cladding surrounding the core, wherein the cladding on the first side of the substrate is continuous through the OTV.
3 . The method of claim 1 , wherein controlling the deflection angle of the first beam deflector comprises applying a voltage to a control element attached to the first beam deflector.
4 . The method of claim 1 , wherein controlling the deflection angle of the first beam deflector comprises applying a voltage to a plurality of control elements attached to the first beam deflector.
5 . The method of claim 1 , wherein deflecting the optical signal into the OTV comprises using a curved surface of the first beam deflector.
6 . The method of claim 1 , wherein deflecting the optical signal on the second side of the substrate comprises controlling a deflection angle of the second beam deflector.
7 . The method of claim 6 , wherein controlling the deflection angle of the second beam deflector comprises applying a voltage to a control element attached to the second beam deflector.
8 . The method of claim 6 , wherein controlling the deflection angle of the second beam deflector comprises applying a voltage to a plurality of control elements attached to the second beam deflector.
9 . The method of claim 6 , wherein controlling the deflection angle of the second beam deflector comprises deflecting the optical signal along one of a plurality of waveguides.
10 . A method of using a semiconductor device comprising:
receiving an optical signal in a waveguide on a first side of a substrate, wherein the substrate comprises a semiconductor material;
propagating the optical signal through the substrate using an optical through via (OTV) extending through the substrate;
deflecting the optical signal using a beam deflector toward a photonic element on a second side of the substrate, wherein deflecting the optical signal comprises:
receiving at least one voltage signal; and
adjusting a deflection angle of the beam deflector in response to the at least one voltage signal having a first voltage.
11 . The method of claim 10 , wherein adjusting the deflection angle comprises adjusting a temperature of a portion of a surface of the beam deflector.
12 . The method of claim 10 , wherein adjusting the deflection angle comprises adjusting a temperature of an entire surface of the beam deflector.
13 . The method of claim 10 , wherein adjusting the deflection angle comprises receiving a plurality of voltage signals, the plurality of voltage signals includes the at least one voltage signal, each voltage signal is received at a corresponding control element of a plurality of control elements, and each of the plurality of control elements is attached to the beam deflector.
14 . The method of claim 10 , wherein adjusting the deflection angle comprises deflecting the optical signal along one of a plurality of waveguides.
15 . The method of claim 10 , wherein propagating the optical signal through the OTV comprises deflecting the optical signal into the OTV using a first side beam deflector.
16 . The method of claim 10 , wherein deflecting the optical signal comprises deflecting the optical signal using a convex surface of the beam deflector.
17 . The method of claim 10 , wherein deflecting the optical signal comprises deflecting the optical signal using a concave surface of the beam deflector.
18 . The method of claim 10 , further comprising detecting the optical signal using a photodetector (PD) on the second side of the substrate.
19 . A method of using a semiconductor device comprising:
receiving an optical signal in a waveguide on a first side of a substrate, wherein the substrate comprises a semiconductor material;
deflecting the optical signal into an optical through via (OTV) using a first beam deflector on the first side of the substrate, wherein the OTV extends through the substrate from the first side of the substrate to a second side of the substrate, wherein deflecting the optical signal into the OTV comprises:
controlling a first angle of deflection of the first beam deflector using a first control element; and
deflecting the optical signal on the second side of the substrate using a second beam deflector.
20 . The method of claim 19 , wherein deflecting the optical signal on the second side comprises controlling a second angle of deflection of the second beam deflector using a second control element.