IP Library › Granted Patent US 12,424,375
Granted Patent B2
US 12,424,375 · App. 18/442,523 · Granted Sep 23, 2025

Coil electronic component

Inventors: Yu Jong Kim (Suwon-si, KR); Jong Min Lee (Suwon-si, KR)
Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.
H01F27/2804H01F27/022H01F2027/2809
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,424,375
App. No.
18/442,523
Granted
Sep 23, 2025
Kind
B2
Abstract

A coil electronic component includes a support substrate, a coil pattern disposed on the support substrate, an encapsulant encapsulating at least portions of the support substrate and the coil pattern, and external electrodes disposed externally on the encapsulant and connected to the coil pattern. The coil pattern includes a seed layer having a thickness of 1.5 μm or less and a plating layer disposed on the seed layer.

Claims (18)

1. A coil electronic component, comprising:

a support substrate;

a coil pattern disposed on the support substrate;

an encapsulant encapsulating at least portions of the support substrate and the coil pattern; and

external electrodes disposed externally on the encapsulant and connected to the coil pattern,

wherein the coil pattern includes a seed layer and a plating layer disposed on the seed layer,

the plating layer includes a first plating layer, disposed on the seed layer, a second plating layer covering the first plating layer, and a third plating layer disposed on an upper surface of the second plating layer,

a thickness of the first plating layer is larger than a thickness of the second plating layer and a thickness of the third plating layer, where the thickness of the second plating layer is measured from the upper surface of the second plating layer to an upper surface of the first plating layer, the thickness of the first plating layer is measured from a lower surface of the second plating layer, which contacts the upper surface of the first plating layer, to an upper surface of the seed layer, and the first plating layer has a single-layer structure, and

the encapsulant includes a cover portion extending from an uppermost surface of the coil pattern to an upper surface of the encapsulant, and a thickness of the cover portion, in a thickness direction orthogonal to a surface of the support substrate having the coil pattern thereon, is smaller than a thickness of the coil pattern in the thickness direction.

2. The coil electronic component of claim 1 , wherein the seed layer has a thickness of 0.5 μm or greater and 1.5 μm or less.

3. The coil electronic component of claim 1 , wherein the coil pattern forms a plurality of turns, and turns adjacent to each other are spaced apart from each other by a pitch of 35 μm or less.

4. The coil electronic component of claim 1 , wherein the support substrate has a thickness of 20 μm or greater to 40 μm or less.

5. The coil electronic component of claim 1 , wherein the first plating layer is a pattern plating layer and has a same width as a width of the seed layer.

6. The coil electronic component of claim 1 , wherein the second plating layer covers an upper surface and side surfaces of the first plating layer, and covers side surfaces of the seed layer.

7. The coil electronic component of claim 6 , wherein the second plating layer is an isotropic plating layer.

8. The coil electronic component of claim 1 , wherein the third plating layer is an anisotropic plating layer.

9. The coil electronic component of claim 1 , wherein the encapsulant has a thickness of 0.65 mm or less.

10. The coil electronic component of claim 1 , wherein the seed layer is a Cu layer.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 15, 2024
From: KIM, YU JONG; LEE, JONG MIN
To: SAMSUNG ELECTRO-MECHANICS CO., LTD.
Reel/Frame 066476/0175 →
Priority Claims (1)
KR 10-2018-0157290 · Dec 7, 2018 · national
Continuity (2)
Continuation 16591283 · Oct 2, 2019
Related Publication 20240186055A1 · Jun 6, 2024
References Cited (43)
US 4959631A · Hasegawa et al. · 1990 [cited by applicant]
US 10614943B2 · Choi et al. · 2020 [cited by applicant]
US 10658103B2 · Seino et al. · 2020 [cited by applicant]
US 10902988B2 · Choi et al. · 2021 [cited by applicant]
US 20070085647A1 · Kawarai · 2007 [cited by examiner]
US 20130249662A1 · Tonoyama et al. · 2013 [cited by applicant]
US 20140285305A1 · Yoo et al. · 2014 [cited by applicant]
US 20150048920A1 · Lee et al. · 2015 [cited by applicant]
US 20160163444A1 · Choi · 2016 [cited by examiner]
US 20160172097A1 · Jeong · 2016 [cited by examiner]
US 20160336105A1 · Choi et al. · 2016 [cited by applicant]
US 20170032884A1 · Choi · 2017 [cited by examiner]
US 20170148562A1 · Lee et al. · 2017 [cited by applicant]
US 20170178789A1 · Kim · 2017 [cited by examiner]
US 20170287621A1 · Seino · 2017 [cited by examiner]
US 20180054900A1 · Ueda et al. · 2018 [cited by applicant]
US 20180175494A1 · Horikawa et al. · 2018 [cited by applicant]
CN 106158242A · 2016 [cited by applicant]
CN 106783069A · 2017 [cited by examiner]
CN 107430922A · 2017 [cited by applicant]
JP H04005806A · 1992 [cited by applicant]
JP 2004319570A · 2004 [cited by examiner]
JP 2008118059A · 2008 [cited by applicant]
JP 2016072615A · 2016 [cited by applicant]
JP 201734227A · 2017 [cited by applicant]
JP 2017183663A · 2017 [cited by applicant]
JP 2017216485A · 2017 [cited by applicant]
JP 2018098415A · 2018 [cited by applicant]
KR 101442402B1 · 2014 [cited by applicant]
KR 1020160034802A · 2016 [cited by applicant]
KR 1020170097883A · 2017 [cited by applicant]
KR 1020170113136A · 2017 [cited by applicant]
WO WO2016147993A1 · 2016 [cited by examiner]
WO 2017171265A1 · 2017 [cited by applicant]
Korean Office Action dated Apr. 3, 2024 issued in Korean Patent Application No. 10-2023-0178968 (with English translation). [cited by applicant]
Office Action issued in corresponding Korean Patent Application No. 10-2018-0157290 dated Apr. 1, 2023, with English translation. [cited by applicant]
Office Action issued in corresponding Japanese Patent Application No. 2019-182606 date Jul. 11, 2023, with English translation. [cited by applicant]
Office Action issued in corresponding Chinese Patent Application No. 201911187884.5 dated Nov. 22, 2023, with English translation. [cited by applicant]
Office Action issued corresponding Japanese Patent Application No. 2019-182606 dated Jan. 9, 2024, with English translation. [cited by applicant]
Notice of Allowance issued in corresponding U.S. Appl. No. 16/591,283 dated Nov. 16, 2023. [cited by applicant]
Office Action issued in corresponding U.S. Appl. No. 16/591,283 dated Jul. 24, 2023. [cited by applicant]
Final Office Action issued in corresponding U.S. Appl. No. 16/591,283 dated Nov. 15, 2022. [cited by applicant]
Office Action issued in corresponding U.S. Appl. No. 16/591,283 dated May 13, 2022. [cited by applicant]