Multi-beam charged particle system and method of controlling the working distance in a multi-beam charged particle system
A multi-beam charged particle system and a method of setting a working distance WD of the multi beam charged particle system are provided. With the method, the working distance is adjusted while the imaging performance of a wafer inspection task is maintained by computing parameter values of components from predetermined calibration parameter values. The method can allow a relatively fast wafer inspection task even with a wafer stage with a fixed z-position parallel to an optical axis of the multi-beam charged particle system.
1 . A method of setting a working distance of a multi-beam charged particle system with a raster of a plurality of primary charged particle beamlets to inspect a wafer, the working distance being defined as a distance parallel to an optical axis between a reference plane of the multi-beam charged particle system and a wafer surface of the wafer, the method comprising:
determining a first working distance of the multi-beam charged particle system at a first inspection site of a first wafer inspection task;
determining a change of the first working distance to achieve a second working distance of a second inspection site of a second wafer inspection task subsequent to the first wafer inspection task;
computing N parameter values of a set of N parameters of components of the multi-beam charged particle system capable of jointly changing the first working distance to the second working distance while maintaining an imaging specification of a wafer inspection task, computing the N parameter values of the set of N parameters comprising interpolating a first set of predetermined calibration parameter values of the set of N parameters;
providing the computed N parameter values to the components of the multi-beam charged particle system; and
performing the second wafer inspection task at the second inspection site using an inspection setting with the computed parameter values and a corresponding image performance within an imaging specification of the second wafer inspection task.
2 . The method of claim 1 , wherein:
the set of N parameters comprises a parameter to adjust or change a scan program configured to operate a scanning deflector of the multi-beam charged particle system;
the change of the scan program comprises a scan rotation to compensate a rotation of the raster of the plurality of primary beamlets and/or a change of a scanning pixel number in a scanning line to compensate a change of a pitch between the plurality of primary beamlets.
3 . The method of claim 2 , wherein:
the set of N parameters further comprises a parameter to control a component of the multi-beam charged particle system; and
the component of the multi-beam charged particle system comprises a member selected from the group consisting of an array of micro-lenses, an array element acting as deflector array to adjust a pitch of a plurality of beamlets, field lenses, an objective lens, a beam splitter, a voltage supply for an electrode to generate a retarding field, and a telecentricity compensator array.
4 . The method of claim 1 , further comprising:
loading the wafer to a wafer table with a fixed position in a direction parallel to the optical axis of the multi-beam charged particle system; and
positioning the wafer at the first inspection site beyond a reference plane of an objective lens of the multi-beam charged particle system,
wherein determining the first working distance comprises using a distance sensor to measure the distance between the wafer surface and the reference plane.
5 . The method of claim 1 , further comprising using a wafer table with a fixed position in a direction parallel to the optical axis of the multi-beam charged particle system to move the wafer to the second inspection site, wherein determining the change of the first working distance to achieve the second working distance comprises using a distance sensor to measure the second working distance between the wafer surface and the reference plane.
6 . The method of claim 1 , wherein the step of computing the N parameter values comprises selecting the inspection setting from a first inspection setting with the first set of predetermined calibration parameters values and a second inspection setting with a second set of predetermined calibration parameters values.
7 . The method of claim 6 , wherein selecting the inspection setting is performed according to a sensitivity of a change of the working distance with respect to a change of at least one of the parameters the N parameter values according the first predetermined calibration parameter values or the second set of predetermined calibration parameters values.
8 . The method of claim 7 , wherein the inspection setting is selected in accordance with a desired robustness of the second wafer inspection task by selecting the second inspection setting with a minimal sensitivity of a change of the working distance with respect to a change of at least one of the parameters of the N parameter values.
9 . The method of claim 7 , wherein the inspection setting is selected in accordance with a desired speed of the second wafer inspection task by selecting the inspection setting with a maximal sensitivity of a change of the working distance with respect to a change of at least one of the parameters of the N parameter values.
10 . The method of claim 6 , wherein selecting the inspection setting is performed according a threshold of an imaging performance of the second wafer inspection task.
11 . The method of claim 6 , wherein the first set of predetermined calibration parameter values comprise predetermined calibration parameter values at at least three calibration working distances, and the N parameter values according the second working distance are interpolated from the predetermined calibration parameter values at the at least three calibration working distances.
12 . The method of claim 11 , further comprising determining the first set of predetermined calibration parameter values at at least three calibration working distances, and storing the predetermined calibration parameter values in a memory of the multi-beam charged particle system.
13 . The method of claim 1 , further comprising:
storing the inspection setting with an inspection result of the second inspection task in a memory; and
performing a post-processing of the inspection result,
wherein the stored inspection setting is considered during the postprocessing.
14 . One or more machine-readable hardware storage devices comprising instructions that are executable by one or more processing devices to perform operations comprising the method of claim 1 .
15 . A system, comprising:
one or more processing devices; and
one or more machine-readable hardware storage devices comprising instructions that are executable by the one or more processing devices to perform operations comprising the method of claim 1 .
16 . A multi-beam charged particle system, comprising:
an object irradiation unit configured to focus a plurality of primary charged particle beamlets on a surface of a wafer,
a wafer table configured to hold the wafer with a fixed position in a direction parallel to an optical axis of the multi-beam charged particle system, the wafer table configured to laterally move the wafer;
a plurality of components configured to jointly change a working distance between the wafer surface and a reference surface of the object irradiation unit while maintaining an imaging specification of a wafer inspection task;
a detection unit comprising a charged particle detector;
a control unit configured to determine a first working distance at an inspection site on the wafer surface,
wherein:
the control unit is configured to control the plurality of components to control jointly changing the working distance;
the control unit is configured to: i) determine parameter values; and ii) provide the parameter values to the plurality of components to jointly change a working distance to the first working distance while maintaining the imaging specification of a wafer inspection task.
17 . The multi-beam charged particle system of claim 16 , wherein the control unit comprises a memory to store a first set of predetermined calibration parameter values, and the control unit is configured to compute the parameter values from the first set of predetermined calibration parameter values by interpolation.
18 . The multi-beam charged particle system of claim 16 , wherein a first component of the plurality of components comprises a scanning deflector, and the control unit is configured to determine and provide a scanning program to the scanning deflector to maintain the imaging specification of a wafer inspection task.
19 . The multi-beam charged particle system of claim 16 , wherein the plurality of components comprises at least one member selected from the group consisting of an array of micro-lenses, an array element configured to act as deflector array to adjust a pitch of a plurality of beamlets, field lenses, an objective lens, a beam splitter, a voltage supply for an electrode to generate a retarding field, and a telecentricity compensator array.
20 . The multi-beam charged particle system of claim 16 , further comprising a distance sensor connected to the control unit, wherein the sensor is configured to measure the working distance between the reference surface and the wafer surface.