IP Library › Granted Patent US 12,514,129
Granted Patent B2
US 12,514,129 · App. 18/599,458 · Granted Dec 30, 2025

Magnetic memory device

Inventors: Hyung-Woo Ahn (Seongnam-si, KR); Tadaaki Oikawa (Seoul, KR); Taiga Isoda (Tokyo, JP); Kenji Fukuda (Seoul, KR); Ku Youl Jung (Icheon-si, KR)
Assignees: Kioxia Corporation; SK hynix Inc.
H10N50/10G11C11/161H10B61/10H10N50/85
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Quick Facts
Patent No.
US 12,514,129
App. No.
18/599,458
Granted
Dec 30, 2025
Kind
B2
Abstract

According to one embodiment, a magnetic memory device includes a memory cell. The memory cell includes a switching element, a magnetoresistance effect element, and an electrode that electrically couples the switching element to the magnetoresistance effect element. The electrode includes: a first non-magnetic layer being in contact with the switching element; and a second non-magnetic layer provided on a side opposite to a side on which the switching element is provided with respect to the first non-magnetic layer. The second non-magnetic layer has an amorphous structure and contains a metal oxide or a metal nitride.

Claims (49)

1 . A magnetic memory device comprising a memory cell, the memory cell including:

a switching element;

a magnetoresistance effect element; and

an electrode that electrically couples the switching element to the magnetoresistance effect element,

wherein the electrode includes:

a first non-magnetic layer being in contact with the switching element; and

a second non-magnetic layer provided on a side opposite to a side on which the switching element is provided with respect to the first non-magnetic layer, and

the second non-magnetic layer has an amorphous structure and contains a metal oxide or a metal nitride.

2 . The magnetic memory device of claim 1 , wherein

the second non-magnetic layer contains at least one compound selected from WSiN, WSiO, SiN, SiB, AlO, NiCr, TiN, InO, CuSi, WN, and TaN.

3 . The magnetic memory device of claim 1 , wherein

the first non-magnetic layer contains carbon (C).

4 . The magnetic memory device of claim 3 , wherein

the first non-magnetic layer further contains nitride (N).

5 . The magnetic memory device of claim 1 , wherein

the electrode further includes a third non-magnetic layer that is in contact with the second non-magnetic layer on a side opposite to a side on which the first non-magnetic layer is provided with respect to the second non-magnetic layer, and

the third non-magnetic layer contains an oxide of a compound contained in the second non-magnetic layer.

6 . The magnetic memory device of claim 5 , wherein

the electrode further includes a fourth non-magnetic layer provided on a side opposite to a side on which the second non-magnetic layer is provided with respect to the third non-magnetic layer, and

the fourth non-magnetic layer contains hafnium (Hf) and boron (B).

7 . The magnetic memory device of claim 6 , wherein

the electrode further includes a fifth non-magnetic layer provided on a side opposite to a side on which the third non-magnetic layer is provided with respect to the fourth non-magnetic layer, and

the fifth non-magnetic layer contains tantalum (Ta).

8 . The magnetic memory device of claim 7 , wherein

the electrode further includes a sixth ferromagnetic layer provided on a side opposite to a side on which the fourth non-magnetic layer is provided with respect to the fifth non-magnetic layer, and

the sixth non-magnetic layer contains platinum (Pt).

9 . The magnetic memory device of claim 8 , wherein

the electrode further includes a seventh non-magnetic layer provided on a side opposite to a side on which the fifth non-magnetic layer is provided with respect to the sixth non-magnetic layer, and

the seventh non-magnetic layer includes silicon (Si) and boron (B).

10 . The magnetic memory device of claim 1 , wherein

the magnetoresistance effect element is provided on a side opposite to a side on which a substrate is provided with respect to the switching element.

11 . The magnetic memory device of claim 1 , wherein

the magnetoresistance effect element includes:

a first ferromagnetic layer;

a second ferromagnetic layer;

a third ferromagnetic layer provided on an opposite side on which the first conductive layer is provided with respect to the second ferromagnetic layer;

an eighth non-magnetic layer provided between the first ferromagnetic layer and the second ferromagnetic layer; and

a ninth non-magnetic layer provided between the second ferromagnetic layer and the third ferromagnetic layer, and

the eighth non-magnetic layer contains an oxide of magnesium (Mg).

12 . The magnetic memory device of claim 11 , wherein

the ninth non-magnetic layer contains an element selected from the group consisting of ruthenium (Ru), osmium (Os), rhodium (Rh), iridium (Ir), vanadium (V), and chrome (Cr).

13 . The magnetic memory device of claim 11 , wherein

the third ferromagnetic layer is provided between a substrate and the second ferromagnetic layer.

14 . The magnetic memory device of claim 11 , wherein

the first ferromagnetic layer is provided between a substrate and the second ferromagnetic layer.

15 . The magnetic memory device of claim 11 , wherein

the second ferromagnetic layer and the third ferromagnetic layer are coupled in an antiferromagnetic manner.

16 . The magnetic memory device of claim 1 , wherein

the switching element is a 2-terminal type switching element.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 17, 2024
From: AHN, HYUNG-WOO; OIKAWA, TADAAKI; ISODA, TAIGA; FUKUDA, KENJI; JUNG, KU YOUL
To: KIOXIA CORPORATION; SK HYNIX INC.
Reel/Frame 067445/0882 →
Priority Claims (1)
JP 2023-039668 · Mar 14, 2023 · national
Continuity (1)
Related Publication 20240315143A1 · Sep 19, 2024
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