Semiconductor process equipment
A station for a substrate processing system that includes a magnetic levitation actuator assembly disposed in a first region of the station that is separated from a second region of the station by a membrane. The magnetic levitation actuator assembly is configured to contactlessly convey a carrier disposed in the second region to one or more positions within the second region.
1 . A process station, comprising:
a housing comprising a first wall that comprises a first opening, wherein the first wall at least partially defines a transport region;
a first membrane covering the first opening, wherein the first membrane comprises a first surface and a second surface, wherein the second surface at least partially defines the transport region, and the first membrane is positioned over a portion of the transport region;
a first cavity formed in the housing and isolated from the transport region by the first membrane, wherein the first cavity is at least partially defined by a portion of the first wall and the first surface of the first membrane; and
a magnetic levitation actuator assembly disposed in the first cavity and over the first surface of the first membrane, wherein the magnetic levitation actuator is configured to generate a first magnetic field that extends through the first membrane and within the transport region.
2 . The process station of claim 1 , wherein:
the first membrane includes a recess including an interface surface and a pole portion;
the first magnetic levitation actuator assembly comprises a stator pole and a wire vertically wound around the stator pole, the wire is engaged with the interface surface and a first end of the stator pole is disposed in the pole portion, and a clearance is present between a surface of the pole portion and the first end.
3 . The process station of claim 1 , wherein the first membrane is formed from a ceramic material or a non-magnetic metal.
4 . The process station of claim 1 , wherein the first membrane includes a seal groove around a periphery of the first surface of the first membrane, wherein a seal disposed in the seal groove is engaged with the a housing interface surface of the housing around the opening.
5 . The process station of claim 4 , wherein a first portion of the housing interface surface is disposed at an angle relative to a second portion of the housing surface, the process station further comprising one or more wedge members are engaged with a tapered surface of the second surface of the first membrane to secure the engagement of the first membrane with the first housing interface surface.
6 . The process station of claim 1 , wherein the first magnetic levitation actuator assembly includes a plurality of linear stators, wherein each linear stator includes at least one middle stator pole disposed between outer stator poles, wherein the at least one middle stator pole has a thickness that exceeds the thickness of each outer stator pole.
7 . The process station of claim 1 , wherein the first magnetic levitation actuator assembly includes a first linear array of linear stators and second linear array of top sensors coupled to a member, wherein the first linear array of stators is parallel to the second linear array of top sensors, wherein each top sensor is configured to generate a second magnetic field that extends through the first membrane and within the transport.
8 . The process station of claim 7 , wherein the first membrane includes a first row of first recesses and a second row of second recesses, wherein each stator is partially disposed in a corresponding first recess and each top sensor is partially disposed in a corresponding second recess.
9 . The process station of claim 7 , wherein the first magnetic levitation actuator assembly further comprises:
a side actuator configured to generate a third magnetic field that extends through the first membrane and within the transport region; and
at least one side sensor configured to generate a fourth magnetic field that extends through the first membrane and within the transport region.
10 . The process station of claim 7 , wherein a magnetic shield member is disposed between one or more linear stators and one or more top sensors.
11 . The process station of claim 1 , further comprising:
a side actuator assembly disposed in an opening in the housing and further disposed beneath the first membrane, the side actuator assembly including:
a side actuator assembly housing including an end wall with an outer surface that faces the transport region;
a side actuator disposed in the side actuator assembly housing, the side actuator configured to generate a second magnetic field that extends through the side actuator assembly housing and into the transport region; and
at least one side position sensor disposed in the side actuator assembly, the at least one side position sensor configured to generate a third magnetic field that extends through the side actuator assembly housing and into the transport region.
12 . The process station of claim 1 , wherein the magnetic levitation actuator assembly further comprises a first top sensor at least partially disposed in the first cavity.
13 . A process station comprising:
a housing comprising a first wall that comprises a first opening, wherein the first wall at least partially defines a transport region;
a first membrane covering the first opening, wherein the first membrane comprises a first surface and a second surface, wherein the second surface at least partially defines the transport region;
a first cavity formed in the housing and isolated from the transport region by the first membrane, wherein the first cavity is at least partially defined by a portion of the first wall and the first surface of the first membrane;
a magnetic levitation actuator assembly disposed in the first cavity and over the first surface of the first membrane, wherein the magnetic levitation actuator is configured to generate a first magnetic field that extends through the first membrane and within the transport region;
a substrate support at least partially disposed in the transport region, the substrate support moveable from a first position to a second position;
a source assembly disposed over the substrate support, the source assembly configured to process a substrate disposed on the substrate support when the substrate support is in the second position, and wherein the process may be at least one of chemical vapor deposition, plasma enhanced chemical vapor deposition, atomic layer deposition, plasma enhanced atomic layer deposition, etch, lithography, ion implantation, ashing, cleaning, thermal process, or a degas; and
an equipment assembly disposed in the housing, wherein a carrier with the substrate disposed thereon is below the equipment assembly when in a park position.
14 . The process station of claim 13 , wherein the equipment assembly includes at least one of a heat source configured to adjust the temperature of the substrate, a shower head configured to deliver a gas to the substrate, or one or more sensors.
15 . A process station comprising:
a housing comprising a first wall that comprises a first opening, wherein the first wall at least partially defines a transport region, the housing further comprising a second wall that comprises a second opening;
a first membrane covering the first opening, wherein the first membrane comprises a first surface and a second surface, wherein the second surface at least partially defines the transport region;
a second membrane covering the second opening, the second membrane including a first surface and a second surface, wherein the second surface of the second membrane at least partially defines the transport region;
a first cavity formed in the housing and isolated from the transport region by the first membrane, wherein the first cavity is at least partially defined by a portion of the first wall and the first surface of the first membrane;
a second cavity formed in the housing and isolated the transport region by the second membrane, wherein the first cavity is at least partially defined by the first surface of the second membrane;
a magnetic levitation actuator assembly disposed in the first cavity and over the first surface of the first membrane, wherein the magnetic levitation actuator is configured to generate a first magnetic field that extends through the first membrane and within the transport region; and
a second magnetic levitation actuator assembly disposed in the second cavity and over the first surface of the second membrane, wherein the magnetic levitation actuator is configured to generate a second magnetic field that extends through the second membrane and within the transport region, and wherein the second magnetic levitation actuator assembly is oriented parallel to the first magnetic levitation actuator assembly.
16 . A process station, comprising:
a housing comprising one or more walls that define a transport region;
a membrane attached to a wall of the one or more walls of the housing, the membrane including a first surface and a second surface, wherein the first surface of the membrane and a portion of the wall of the one or more walls of the housing define a cavity, and the second surface at least partially defines the transport region; and
a magnetic levitation actuator assembly disposed in the cavity and over the first surface of the membrane, and the magnetic levitation actuator assembly comprises:
a plurality of stators, wherein each stator of the plurality of stators is configured to generate a first magnetic field that extends through the membrane and into the transport region; and
a plurality of sensors, wherein each sensor comprises a magnetic field detection sensor that is configured to detect a position of a magnetically permeable material disposed in the transport region relative to the sensor.
17 . The process station of claim 16 , further comprising a shield element disposed between each stator stators and adjacent top sensors.
18 . The process station of claim 16 , wherein the housing includes a single machined block that partially defines the cavity, and the membrane is attached to the single machined block.
19 . A process station, further comprising:
a housing including a transport region, an opening, a first interface surface, and a second interface surface, wherein the opening is between the first interface surface and the second interface surface;
a membrane covering the opening to enclose a cavity formed in the housing from the transport region, the membrane including a first surface and a second surface, the first surface partially defines the cavity and includes a first recess, and the transport region is partially defined by a second surface of the membrane; and
a magnetic levitation actuation assembly including a first linear stator and a first top sensor at least partially disposed in the first recess.
20 . The process station of claim 19 , the first recess further comprises:
a top sensor portion, wherein a portion of the top sensor is disposed in the top sensor portion and a first clearance is present between the top sensor and a surface of the top sensor portion;
a stator interface surface configured to engage with the first linear stator; and
a pole portion configured to receive a plurality of teeth of the first linear stator, the pole portion is surrounded by the stator interface surface, and wherein a second clearance is present between a surface of the pole portion and the teeth of the first linear stator.
21 . The process station of claim 19 , further comprising:
the first surface of the membrane further comprises a second recess; and
the magnetic levitation actuator assembly includes a side actuator and a second top sensor, wherein the second top sensor and the side actuator are disposed in the second recess.