Silicon Carbide Wafers with Relaxed Positive Bow and Related Methods
Silicon carbide (SiC) wafers and related methods are disclosed that include intentional or imposed wafer shapes that are configured to reduce manufacturing problems associated with deformation, bowing, or sagging of such wafers due to gravitational forces or from preexisting crystal stress. Intentional or imposed wafer shapes may comprise SiC wafers with a relaxed positive bow from silicon faces thereof. In this manner, effects associated with deformation, bowing, or sagging for SiC wafers, and in particular for large area SiC wafers, may be reduced. Related methods for providing SiC wafers with relaxed positive bow are disclosed that provide reduced kerf losses of bulk crystalline material. Such methods may include laser-assisted separation of SiC wafers from bulk crystalline material.
1 . A silicon carbide (SiC) wafer comprising:
a silicon face and a carbon face;
a diameter of at least 200 millimeters (mm);
a relaxed positive bow from the silicon face; and
wherein a surface of the SiC wafer is not parallel to a crystallographic c-plane associated with the SiC wafer.
2 . The silicon carbide wafer of claim 1 , wherein a surface of the SiC wafer is misaligned with a crystallographic c-plane by an oblique angle relative to the crystallographic c-plane.
3 . The silicon carbide wafer of claim 2 , wherein the oblique angle is in a range from 1 to 10 degrees.
4 . The silicon carbide wafer of claim 2 , wherein the oblique angle is in a range from 2 to 6 degrees.
5 . The silicon carbide wafer of claim 2 , wherein the oblique angle is 4 degrees.
6 . The SiC wafer of claim 1 , wherein the diameter is in a range from 200 mm to 205 mm.
7 . The SiC wafer of claim 1 , wherein the relaxed positive bow is in a range from greater than 0 μm to 50 μm.
8 . The SiC wafer of claim 1 , wherein the relaxed positive bow is in a range from greater than 0 μm to 15 μm.
9 . The SiC wafer of claim 1 , wherein the relaxed positive bow is in a range including 30 μm to 50 μm.
10 . The SiC wafer of claim 1 , wherein the relaxed positive bow is in a range including 8 μm to 16 μm.
11 . The SiC wafer of claim 1 , wherein the SiC wafer comprises a diameter to thickness ratio of at least 250.
12 . The SiC wafer of claim 1 , wherein the SiC wafer comprises a diameter to thickness ratio of at least 350.
13 . The SiC wafer of claim 1 , wherein the SiC wafer comprises a diameter to thickness ratio of at least 400.
14 . The SiC wafer of claim 1 , wherein the SiC wafer comprises a diameter to thickness ratio in a range of about 250 to 1020.
15 . The SiC wafer of claim 1 , wherein the wafer is an n-type conductive SiC wafer.
16 . The SiC wafer of claim 1 , wherein the wafer is a semi-insulating SiC wafer.
17 . The SiC wafer of claim 1 , wherein the SiC wafer is an unintentionally doped SiC wafer.