NON-CONTACT SEMICONDUCTOR DIE SINGULATION PROCESS
A non-contact semiconductor die singulation process utilizes compressed air to separate a first portion of a semiconductor wafer from a second portion of the semiconductor wafer. During the non-contact semiconductor die singulation process, the semiconductor wafer is placed on dicing tape. A channel is formed along various scribe lines in the semiconductor wafer. When the channels are formed, a compressed air tool applies compressed air along a length of the channel. Pressure from the compressed air causes the semiconductor wafer to deform. As the semiconductor wafer deforms, the semiconductor wafer cracks or splits along the length of the scribe line thereby separating the first portion of the semiconductor wafer from the second portion.
1 . A method of singulating semiconductor dies from a semiconductor wafer, comprising:
forming a channel on a scribe line of the semiconductor wafer, the semiconductor wafer including a plurality of unsingulated semiconductor dies and the scribe line at least partially defining a boundary of an individual semiconductor die of the plurality of semiconductor dies; and
applying non-contact pressure along the channel to form a crack along the scribe line, the crack at least partially separating the individual semiconductor die from the plurality of semiconductor dies.
2 . The method of claim 1 , wherein the channel is formed by a laser.
3 . The method of claim 1 , wherein the non-contact pressure is applied using compressed air.
4 . The method of claim 1 , wherein the semiconductor wafer is attached to dicing tape.
5 . The method of claim 4 , wherein the non-contact pressure and deformation characteristics of the dicing tape causes the crack to form along the scribe line.
6 . The method of claim 4 , further comprising removing the individual semiconductor die from the dicing tape.
7 . The method of claim 1 , wherein the non-contact pressure is a first non-contact pressure and is applied at a first location on the wafer and wherein the method further comprises applying second non-pressure at a second location on the wafer.
8 . A semiconductor die singulation method, comprising:
coupling a semiconductor wafer to dicing tape, the semiconductor wafer comprising a plurality of scribe lines;
removing at least a portion of the semiconductor wafer above at least one scribe line of the plurality of scribe lines; and
applying pressure to the at least the portion of the semiconductor wafer above the at least one scribe line to separate a first portion of the semiconductor wafer from a second portion of the semiconductor wafer.
9 . The method of claim 8 , wherein the pressure is non-contact pressure.
10 . The method of claim 9 , wherein the non-contact pressure is applied using compressed air.
11 . The method of claim 8 , wherein the at least the portion of the semiconductor wafer that is removed is removed by a laser.
12 . The method of claim 8 , wherein the at least the portion of the semiconductor wafer that is removed is removed by a blade.
13 . The method of claim 8 , further comprising applying pressure to another portion of the semiconductor wafer above at least another scribe line to separate a third portion of the semiconductor wafer from at least one of the first portion of the semiconductor wafer and the second portion of the semiconductor wafer.
14 . The method of claim 13 , further comprising removing the third portion of the semiconductor wafer from the dicing tape.
15 . A method, comprising:
forming a channel on a surface of a semiconductor wafer, the channel being formed over a scribe line of the semiconductor wafer using a channel forming means; and
applying non-contact pressure along the channel using a pressure application means, the non-contact pressure causing a first portion of the semiconductor wafer to be separated from a second portion of the semiconductor wafer.
16 . The method of claim 15 , wherein the channel forming means is a laser.
17 . The method of claim 15 , wherein the channel forming means is a blade.
18 . The method of claim 15 , wherein the pressure application means is compressed air.
19 . The method of claim 15 , further comprising coupling the semiconductor wafer to a wafer securement means.
20 . The method of claim 15 , wherein the non-contact pressure is a first non-contact pressure and the pressure application means is a first pressure application means and wherein the method further comprises applying a second non-contact pressure using a second pressure application means, wherein the first non-contact pressure and the second non-contact pressure are applied to the semiconductor wafer simultaneously.