IP Library › Granted Patent US 1,132,263
Granted Patent S1
US 1,132,263 · App. 29/846,286 · Granted Jun 30, 2026

Purge ring for a substrate processing chamber

Inventors: Geraldine Vasquez (San Jose, CA); Yi Xu (San Jose, CA); Dien-yeh Wu (San Jose, CA); Aixi Zhang (Sunnyvale, CA); Jallepally Ravi (San Ramon, CA); Yu Lei (Belmont, CA)
Assignee: Applied Materials Inc.
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Quick Facts
Patent No.
US 1,132,263
App. No.
29/846,286
Granted
Jun 30, 2026
Kind
S1
Claims (1)

The ornamental design for a purge ring for a substrate processing chamber, as shown and described.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 3, 2022
From: VASQUEZ, GERALDINE; XU, YI; WU, DIEN-YEH; ZHANG, AIXI; RAVI, JALLEPALLY; LEI, YU
To: APPLIED MATERIALS, INC.
Reel/Frame 061286/0268 →
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