Granted Patent
S1
US 1,121,576 · App. 29/846,296 · Granted Apr 7, 2026
Purge ring for a substrate processing chamber
Inventors:
Geraldine Vasquez (San Jose, CA); Yi Xu (San Jose, CA); Dien-yeh Wu (San Jose, CA); Aixi Zhang (Sunnyvale, CA); Jallepally Ravi (San Ramon, CA); Yu Lei (Belmont, CA)
Assignee:
Applied Materials Inc.
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Claims (1)
The ornamental design for a purge ring for a substrate processing chamber, as shown and described.
Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded Aug 2, 2022
From: VASQUEZ, GERALDINE; XU, YI; WU, DIEN-YEH; ZHANG, AIXI; RAVI, JALLEPALLY; LEI, YU
To: APPLIED MATERIALS, INC.
Reel/Frame 060697/0612 →
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