Method of producing semiconductor device
A method of producing a semiconductor device in which a film is formed on a substrate by a chemical vapor deposition (CVD) process, the method comprising purifying a source gas for a film to be formed by selectively removing at least one of components contained in the source gas, which does not pertain to reactions for the deposition of the film, based on the difference in molecular size between the component to be removed and other components.
1. A method of producing a semiconductor device in which a film is formed on a substrate by an organic metal chemical vapor deposition (MOCVD) process using an organic metal or metals as a material or materials for the film formation, the method comprising purifying a source gas for a film to be formed by separating and removing an organic solvent in which the organic metal or metals contained in the source gas are dissolved based on the difference in molecular size between the organic solvent and other components.
2. The method of claim 1 , wherein the selective removal is carried out by an adsorbing process using an adsorbent.
3. The method of claim 2 , wherein a molecular sieve is used as the adsorbent.
4. The method of claim 2 , wherein the adsorbent preferentiaIly adsorbs the component to be removed.
5. The method of claim 2 , wherein two or more adsorbers, which contain the adsorbent, are used in parallel.
6. The method of claim 1 , wherein the selective removal is carried out by a process using a separating membrane.
7. The method of claim 6 , wherein a membrane or membranes in the form of sheet or hollow fiber are used as the separating membrane.
8. The method of claim 6 , wherein the membrane allows the component to be removed to preferentially permeate therethrough.
9. The method of claim 8 , wherein the film to be form is a film of an oxide comprising the metal elements Pb, Zr and Ti.
10. The method of claim 9 , wherein the film of the oxide further comprises at least one of the metal elements La, Ca and Sr.
11. The method of claim 1 , wherein the film to be formed is a film of an oxide comprising metal elements of Ba, Sr and Ti.
12. The method of claim 1 , which is used for the production of a ferroelectric memory.
13. A method of producing a semiconductor device in which a film is formed on a substrate by a chemical vapor deposition (CVD) process, the method comprising purifying a source gas for a film to be formed by selectively removing a least one of components, contained in the source gas, which does not pertain to reactions for the deposition of the film, based on the difference in molecular size between the component to be removed and other components; and
after the formation of the oxide film, forming an oxide or metalic film comprising one metal element Ir, Ru and Pt by the use of an MOCVD process which uses an organometallic material or materials for the formation of the film dissolved in an organic solvent, and feeding a source gas which is purified by selectively removing the organic solvent from a gas comprising the organometallic material or materials and the organic solvent having been vaporized;
wherein the selective removal is carried out by a process using a separating membrane;
wherein the membrane allows the component to be removed to preferentially permeate therethrough; and
wherein the film to be formed is a film of an oxide comprising be metal elements Pb, Zr and Ti.
14. method of producing a semiconductor device in which a film is formed on a substrate by a chemical vapor deposition (CVD) process, the method comprising purifying a source gas for a film to be formed by selectively removing at least one of components, contained in the source gas, which does not pertain to reactions for the deposition of the film, based on the difference in molecular size between the component to be removed and other components;
wherein the film to be formed is a film of an oxide comprising metal elements of Sr, Bi and Ta.
15. A method of producing a semiconductor device in which a film is formed on a substrate by a chemical vapor deposition (CVD) process, the method comprising purifying a source gas for a film to be formed by selectively removing at least one of components, contained in the source gas, which does not pertain to reactions for the deposition of the film, based on the difference in molecular size between the component to be removed and other components;
wherein the film to be formed is a film of an oxide comprising metal elements of Bi, La and Ti.