Exposure apparatus and stage device, and device manufacturing method
After exposure of a divided area on a wafer is completed, for exposure of the next divided area, a control unit sends configuration information on control parameters necessary to expose the next divided area to a stage control system, sometime before the stage control system begins deceleration of a reticle stage and a wafer stage in a scanning direction. Therefore, both stages do not have to be suspended before acceleration for the stage control system to receive the configuration information on control parameters necessary to expose the next divided area, and since suspension time is not required, throughput can be improved. In this case, no serious problems occur, so the performance of other devices is not disturbed.
1. An exposure apparatus that sequentially transfers a pattern of a mask onto a plurality of divided areas on an object by synchronously moving said mask and said object in a predetermined scanning direction, said exposure apparatus comprising:
a mask stage that holds said mask and is movable in at least said scanning direction;
an object stage that holds said object and is movable in a two-dimensional plane; and
a stage control system that controls both said mask and said object stages, said stage control system controlling both stages based on instruction values according to a jerk curve, which is an inverse curve of polarized symbols, when a preliminary operation where said both stages are accelerated after deceleration in said scanning direction is performed in between divided areas in the same row in a non-scanning direction perpendicular to said scanning direction, the jerk curve including an interval where jerk is zero provided in between a jerk curve convex to a plus side and a jerk curve convex to a minus side.
2. The exposure apparatus of claim 1 wherein said jerk curve is an inverse curve of polarized symbols having different shapes.
3. The exposure apparatus of claim 2 wherein said stage control system sets a post-settling period where said both stages are moved in uniform velocity in said scanning direction after exposure is completed on a divided area until said deceleration begins, longer than a synchronous settling period of said both stages prior to exposure, and also sets a peak of said jerk curve after completing exposure of a divided area larger than a peak of said jerk curve prior to exposure.
4. The exposure apparatus of claim 1 wherein said jerk curve is an inverse curve of polarized symbols having the same shape.
5. The exposure apparatus of claim 1 wherein
said stage control system controls said object stage based on instruction values according to a jerk curve, which is a quadrupoled jerk curve, when a movement operation of said both stages in said scanning direction is performed in between divided areas of different rows in said non-scanning direction.
6. The exposure apparatus of claim 5 wherein said quadrupoled jerk curve has at least two poles that are shaped differently.
7. The exposure apparatus of claim 1 wherein
said stage control system performs a movement operation in between divided areas where said object stage is moved in said non-scanning direction based on instruction values according to a jerk curve, which is a quadrupoled jerk having at least two poles that are shaped differently, in parallel with said preliminary operation of said both stages in said scanning direction in between said divided areas.
8. The exposure apparatus of claim 1 wherein
said stage control system controls said both stages so that after exposure of a divided area on said object is completed, a preliminary operation where both stages are accelerated in said scanning direction after deceleration and a movement operation in between divided areas where said object stage is moved in a non-scanning direction perpendicular to said scanning direction are simultaneously performed in parallel for exposure on the next divided area, and said movement operation of said object stage in said non-scanning direction is completed before a synchronous settling period of said both stages prior to exposure on said next divided area.
9. A device manufacturing method including a lithographic process, wherein in said lithographic process exposure is performed using said exposure apparatus of claim 1 .
10. An exposure apparatus that sequentially transfers a pattern of a mask onto a plurality of divided areas on an object by synchronously moving said mask and said object in a predetermined scanning direction, said exposure apparatus comprising:
a mask stage that holds said mask and is movable in at least said scanning direction;
two object stages that each hold said object and are movable independently in a two-dimensional plane; and
a stage control system that controls said mask stage and said object stages when a predetermined operation is performed on one object stage of said object stages and exposure is performed in parallel on a plurality of divided areas on an object held on the other object stage, said stage control system controlling said mask stage and said other object stage based on instruction values according to a jerk curve, which is an inverse curve of polarized symbols, when a preliminary operation where said mask stage and said other object stage are accelerated after deceleration in said scanning direction is performed in between divided areas in the same row in a non-scanning direction perpendicular to said scanning direction, the jerk curve including an interval where jerk is zero provided in between a jerk curve convex to a plus side and a jerk curve convex to a minus side.
11. The exposure apparatus of claim 10 wherein
said stage control system controls said other object stage based on instruction values according to a jerk curve, which is a quadrupoled jerk curve, when a movement operation of said mask stage and said other object stage in said scanning direction is performed in between divided areas of different rows in said non-scanning direction.
12. The exposure apparatus of claim 10 wherein
said stage control system performs a movement operation in between divided areas where said other object stage is moved in said non-scanning direction based on instruction values according to a jerk curve, which is quadrupoled jerk having at least two poles that are shaped differently, in parallel with said preliminary operation of said mask stage and said other object stage in said scanning direction in between said divided areas.
13. The exposure apparatus of claim 10 , further comprising:
a mark detection system that detects marks formed on said object, whereby
said predetermined process includes a mark detection process of detecting marks formed on an object mounted on said one object stage with said mark detection system.
14. A device manufacturing method including a lithographic process, wherein in said lithographic process exposure is performed using said exposure apparatus of claim 10 .