Semiconductor device and wiring forming method in semiconductor device
The present invention provides a semiconductor device in which a problem such as a thermal diffusion defect in a hollow wiring technique can be solved. In the semiconductor device, a gap is formed between wirings formed on a substrate, and the gap is filled with a gas having a thermal conductivity equal to or higher than three times that of air at 0° C.
1. A wiring forming method in a semiconductor device, the method comprising the steps of:
(A) forming a wiring and a filling layer filled between wirings, on a substrate;
(B) forming a gas permeable film on the wiring and the filling layer, said gas permeable film being made of silicon nitride;
(C) removing the filling layer through the gas permeable film so as to form a gap between the wirings;
(D) filling the gap with a gas having a thermal conductivity equal to or higher than three times that of air at 0° C. through the gas permeable film into the gap; and
(E) forming a gas impermeable film on the gas permeable film, wherein, the filling layer comprises:
a non-fluorine system polymer selected from the group consisting of BCB, poly-aryl-ether, polyimide, and like effective non-fluorine system polymers, a fluorine system polymer selected from the group consisting of a fluorine addition polymer, tetra-fluoro ethylene, cyclo-perfluoro carbon, poly-aryl-fluoride ether, fluorine addition parylene, and like effective flourine system polymers, organic SOG, silicon oxide system xerogel, nano-porous silica, or amorphous carbon.
2. A wiring forming method in a semiconductor device, the method comprising the steps of:
(A) forming a plurality of wirings on a substrate with a filling layer between said wirings;
(B) forming a gas permeable film on the wiring and the filling layer, said gas permeable film being made of a polyimide film;
(C) removing the filling layer through the gas permeable film so as to form a gap; and
(D) forming a gas impermeable film on the wirings and above gaps existing between the wirings, in a gas atmosphere having a thermal conductivity equal to or higher than three times that of air at 0° C.; wherein,
the filling layer comprises:
a non-fluorine system polymer selected from the group consisting of BCB, poly-aryl-ether, polyimide, and like effective non-fluorine system polymers, a fluorine system polymer selected from the group consisting of a fluorine addition polymer, tetra-fluoro ethylene, cyclo-perfluoro carbon, poly-aryl-fluoride ether, fluorine addition parylene, and like effective flourine system polymers, organic SOG, silicon oxide system xerogel, nano-porous silica, or amorphous carbon.
3. A wiring forming method in a semiconductor device, the method comprising the steps of:
(A) forming a plurality of wirings on a substrate with a filling layer between the wirings;
(B) forming a gas permeable film on the wirings and above gaps existing between the wirings, said gas permeable film being made of one of silicon oxide film and a low dielectric constant film;
(C) filling a gas having a thermal conductivity equal to or higher than three times that of air at 0° C. through the gas permeable films into the gaps; and
(D) forming a gas impermeable film made of silicon nitride on the gas permeable film, wherein, the filling layer comprises:
a non-fluorine system polymer selected from the group consisting of BCB, poly-aryl-ether, polyimide, and like effective non-fluorine system polymers, a fluorine system polymer selected from the group consisting of a fluorine addition polymer, tetra-fluoro ethylene, cyclo-perfluoro carbon, poly-aryl-fluoride ether, fluorine addition parylene, and like effective flourine system polymers, organic SOG, silicon oxide system xerogel, nano-porous silica, or amorphous carbon.