IP Library Granted Patent US 7,084,987
Granted Patent B2
US 7,084,987 · App. 10/959,511 · Granted Aug 1, 2006

Method and system to interferometrically detect an alignment mark

Assignee: ASML Holdings N.V.
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Quick Facts
Patent No.
US 7,084,987
App. No.
10/959,511
Granted
Aug 1, 2006
Kind
B2
Abstract

Coherent illumination is used to illuminate a symmetrical alignment mark with an image rotation interferometer producing two images of the alignment mark, rotating the images 1800 with respect to each other, and recombining the images interferometrically. The recombined images interfere constructively or destructively, in an amplitude and or polarization sense depending upon the method of recombination, when the alignment sensor is located at the center of the alignment mark. The rotation interferometer is preferably a solid glass assembly made of a plurality of prisms. A detector extracts the alignment information from the image rotation interferometer. The resulting center of the alignment mark is accurately determined. A relatively large number of different alignment mark patterns may be utilized, as long as the alignment mark patterns exhibit one hundred and eighty degree symmetry. Parallel lines, a grid pattern, or a checkerboard grating may be used. The alignment sensor may be applied to a scanning photolithographic system providing sinusoidal alignment signals. The alignment system is particularly applicable to photolithography as used in semiconductor manufacturing.

Claims (39)

1. A system, comprising:

an interferormeter that receives an image from a one-hundred and eighty degree symmetrical alignment mark, splits the received image into first an second images, rotates the first image with respect to the second image, and recombines the first and second images;

a detector that receives the recombined first and second images to generate a detection signal; and

an analyzer that analyzes the detection signal to determine a location of a center of the one-hundred and eighty degree symmetrical alignment mark.

2. The system of claim 1 , wherein:

said interferometer comprises a prism.

3. The system of claim 1 , wherein:

said interferometer comprises optical elements.

4. The system of claim 1 , wherein:

the one-hundred and eighty degree symmetrical alignment mark comprises equally spaced lines and spaces.

5. The system of claim 1 , wherein:

the one-hundred and eighty degree symmetrical alignment mark is a grating.

6. The system of claim 1 , wherein:

the one-hundred and eighty degree symmetrical alignment mark is a checkerboard.

7. The system of claim 1 , wherein:

the one-hundred and eighty degree symmetrical alignment mark is a grid.

8. The system of claim 1 , wherein the first image is rotated 180 degrees with respect to the second image.

9. The system of claim 1 , further comprising:

a substrate that contains the alignment mark; and

a substrate stage coupled to the analyzer, the substrate stage being moved before an exposure operation based on the analyzed detection signal.

10. A method, comprising:

(a) creating a first image of a one-hundred and eighty degree symmetrical alignment mark;

(b) creating a second image of the one-hundred and eighty degree symmetrical alignment mark that is rotated relative to the first image; and

(c) recombining the first image and the second image; and

(d) determining a center of the one-hundred and eight degree symmetrical alignment mark from the recombined image.

11. The method of claim 10 , wherein in step (b) the first image is rotated one hundred and eighty degrees relative to the second image.

12. The method of claim 10 , wherein step (c) comprises:

interfereometrically recombining the first and second images.

13. The method of claim 12 , wherein step (d) comprises:

using polarization interference to determine the center.

14. The method of claim 12 , wherein step (d) comprises:

using amplitude interference to determine the center.

15. The method of claim 12 , further comprising:

initially forming the alignment mark on a substrate to be exposed using a lithography tool.

16. An interferometer, comprising:

a splitting device that splits an image into first and second images;

a first optical element that receives the first image;

a second optical element that receives and rotates the second image 180 degrees with respect to the first image; and

a combining optical element that receives and combines the first and second images.

Assignments (5)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 21, 2005
From: KREUZER, JUSTIN L.
To: SVG LITHOGRAPHY SYSTEMS, INC.
Reel/Frame 016293/0841 →
MERGER Recorded Jul 21, 2005
From: SVG LITHOGRAPHY SYSTEMS, INC.
To: ASML US, INC.
Reel/Frame 016293/0874 →
CONVERSION Recorded Jul 21, 2005
From: ASML US, INC.
To: ASML US, LLC
Reel/Frame 016293/0885 →
MERGER Recorded Jul 21, 2005
From: ASM LITHOGRAPHY INC. AND ASML US, LLC
To: ASML US, INC.
Reel/Frame 016294/0041 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 21, 2005
From: ASML US, INC.
To: ASML HOLDING N.V.
Reel/Frame 016294/0055 →
Continuity (3)
Continuation 1067002800 · Sep 25, 2003
Continuation 0955327000 · Apr 20, 2000
Related Publication 20050041256A1 · Feb 24, 2005