IP Library Granted Patent US 7,150,673
Granted Patent B2
US 7,150,673 · App. 11/176,184 · Granted Dec 19, 2006

Method for estimating polishing profile or polishing amount, polishing method and polishing apparatus

Assignee: Ebara Corporation
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Quick Facts
Patent No.
US 7,150,673
App. No.
11/176,184
Granted
Dec 19, 2006
Kind
B2
Abstract

A polishing method can automatically reset polishing conditions according to a state of a polishing member based on data on a polishing profile changing with time, thereby extending life of the polishing member and obtaining flatness of a polished surface with higher accuracy. The polishing method, includes steps of: independently applying a desired pressure by each of pressing portions of a top ring on a polishing object; estimating a polishing profile of the polishing object based on set pressure values, and calculating a recommended polishing pressure value so that a difference between the polishing profile of the polishing object after it is polished under certain polishing conditions and a desired polishing profile becomes smaller; and polishing the polishing object with the recommended polishing pressure value.

Claims (100)

1. A polishing apparatus comprising:

a top ring for holding an object to be polished and rotating the object while pressing a front surface of the object against a polishing surface, said top ring having at least two pressing portions each capable of independently applying a desired pressure on a back surface of the object,

wherein, when a desired polishing profile of the object is set and an estimated polishing profile of the object is determined based on set pressure values, with a recommended polishing pressure value being calculated so that a difference between the desired polishing profile and the estimated polishing profile becomes within a predetermined range, said top ring is to press the front surface of the object against the polishing surface so as to polish the object under a polishing condition including the recommended polishing pressure value.

2. The polishing apparatus according to claim 1 , wherein

when an actual polished profile is measured after the object is polished and corrected pressure values are calculated based on a difference between the actual polished profile and the estimated polishing profile, said top ring is to press the front surface of a next object against the polishing surface so as to polish the next object under a polishing condition including a polishing pressure value based on the corrected pressure values.

3. The polishing apparatus according to claim 1 , wherein

when an actual polished profile is measured in a predetermined interval and corrected pressure valves are calculated based on a difference between the actual polished profile and the estimated polishing profile, said top ring is to press the front surface of a next object against the polishing surface so as to polish the next object under a polishing condition including a polishing pressure value based on the corrected pressure values.

4. The polishing apparatus according to claim 1 , wherein

when an actual polished profile is measured after the object is polished and corrected pressure values are calculated based on a difference between the actual polished profile and the estimated polishing profile, said top ring is to press the front surface of a next object against the polishing surface so as to polish the next object under a polishing condition including a polishing pressure value based on the corrected pressure values when a difference between the actual polished profile and the desired polishing profile is within a preset allowable range.

5. The polishing apparatus according to claim 1 , wherein

when an actual polished profile is measured in a predetermined interval and corrected pressure values are calculated based on a difference between the actual polished profile and the estimated polishing profile, said top ring is to press the front surface of a next object against the polishing surface so as to polish the next object under a polishing condition including a polishing pressure value based on the corrected pressure values when a difference between the actual polished profile and the desired polishing profile is within a preset allowable range.

6. The polishing apparatus according to claim 1 , wherein

said polishing apparatus is constructed and arranged to have polishing of the object stopped or a warning issued when the recommended polishing pressure value falls outside a predetermined allowable range.

7. The polishing apparatus according to claim 1 , further comprising:

a computer for controlling said top ring, said computer including a storage medium reader for reading a program or data from a computer readable storage medium into said computer.

8. A program recorded on a computer readable storage medium, said program for causing a computer to control an apparatus, including a top ring having pressing portions for holding an object to be polished and pressing the object against a polishing surface, to perform operations of:

(a) setting a desired polishing profile;

(b) independently setting a pressure value for each of at least two of the pressing portions, which pressure value corresponds to a pressure that a respective one of each of the at least two pressing portions is to apply on a back surface of the object;

(c) determining an estimated polishing profile of the object based on the pressure values set in (b);

(d) calculating a difference between the desired polishing profile and the estimated polishing profile;

(e) repeating (b)–(d) until the difference between the desired polishing profile and the estimated polishing profile becomes within a predetermined range;

(f) determining a recommended polishing pressure value such that the difference between the desired polishing profile and the estimated polishing profile becomes within the predetermined range, which recommended polishing pressure value corresponds to a pressure that is to be applied by the top ring to the back surface of the object; and

(g) polishing the object by causing the top ring to press a front surface of the object against the polishing surface under a polishing condition including the recommended polishing pressure value.

9. The program according to claim 8 , wherein

the program is also for causing the computer to control the apparatus to perform an operation of stopping polishing of the object or issuing a warning when the recommended polishing pressure falls outside a predetermined allowable range.

10. A computer useable medium having means for storing the program according to claim 8 .

11. A program recorded on a computer readable storage medium, said program for causing a computer to control an apparatus, including a top ring having pressing portions for holding an object to be polished and pressing the object against a polishing surface, to perform operations of:

(a) independently setting a pressure value for each of at least two of the pressing portions, which pressure value corresponds to a pressure that a respective one of each of the at least two pressing portions is to apply on a back surface of the object;

(b) determining an estimated polishing profile of the object based on the pressure values set in (a);

(c) measuring an actual polished profile after the object is polished;

(d) calculating corrected pressure values based on a difference between the actual polished profile and the estimated polishing profile; and

(e) using the corrected pressure values for a next object to be polished.

12. The program according to claim 11 , wherein

the program is for causing the computer to control the apparatus to use the corrected pressure values for a next object to be polished when a difference between the actual polished profile and the desired polishing profile is within a preset allowable range.

13. The program according to claim 11 , wherein

the program is also for causing the computer to control the apparatus to perform an operation of stopping polishing of the object or issuing a warning when the recommended polishing pressure falls outside a predetermined allowable range.

14. A computer useable medium having means for storing the program according to claim 11 .

15. A program recorded on a computer readable storage medium, said program for causing a computer to control an apparatus, including a top ring having pressing portions for holding an object to be polished and pressing the object against a polishing surface, to perform operations of:

(a) independently setting a pressure value for each of at least two of the pressing portions, which pressure value corresponds to a pressure that a respective one of each of the at least two pressing portions is to apply on a back surface of the object;

(b) determining an estimated polishing profile of the object based on the pressure values set in (a);

(c) measuring an actual polished profile in a predetermined interval;

(d) calculating corrected pressure values based on a difference between the actual polished profile and the estimated polishing profile; and

(e) using the corrected pressure values for a next object to be polished.

16. The program according to claim 15 , wherein

the program is for causing the computer to control the apparatus to use the corrected pressure values for a next object to be polished when a difference between the actual polished profile and the desired polishing profile is within a preset allowable range.

17. The program according to claim 15 , wherein

the program is also for causing the computer to control the apparatus to perform an operation of stopping polishing of the object or issuing a warning when the recommended polishing pressure falls outside a predetermined allowable range.

18. A computer useable medium having means for storing the program according to claim 15 .

19. A method for estimating a polishing profile or a polishing amount when polishing an object by using a top ring to press a front surface of the object against a polishing surface, with the top ring having at least two pressing portions each capable of independently applying a desired pressure on a back surface of the object, said method comprising:

setting back surface pressure distributions of the object;

calculating front surface pressure distributions of the object corresponding to said back surface pressure distributions;

storing said back surface pressure distributions and said front surface pressure distributions in a memory medium so as to provide stored back surface pressure distributions and stored front surface pressure distributions;

setting a desired back surface pressure distribution of the object;

synthesizing said desired back surface pressure distribution from a combination of said stored back surface pressure distributions;

calculating a desired front pressure distribution corresponding to said desired back surface pressure distribution based on a combination of said stored back surface pressure distributions;

calculating an estimated polishing profile or polishing amount of the object based on said desired front pressure distribution and a predetermined equation which includes a polishing amount value and a pressure value as parameters; and

determining set pressure values that provide a desired polishing profile, by

(a) determining a difference in a polishing amount between a polishing profile of the object during polishing and said estimated polishing profile,

(b) correcting said desired front pressure distribution based on the difference in polishing amount so as to provide a corrected front pressure distribution,

(c) determining an estimated polishing profile as obtained by said corrected desired front pressure distribution, and

(d) repeating (a)–(c) until a difference between a polishing profile of the object during polishing and said estimated polishing profile determined in (c) becomes within a predetermined range.

20. A method for estimating a polishing profile or a polishing amount when polishing an object by using a top ring to press a front surface of the object against a polishing surface, with the top ring having at least two pressing portions each capable of independently applying a desired pressure on a back surface of the object, said method comprising:

setting back surface pressure distributions of the object;

calculating front surface pressure distributions of the object corresponding to said back surface pressure distributions;

storing said back surface pressure distributions and said front surface pressure distributions in a memory medium so as to provide stored back surface pressure distributions and stored front surface pressure distributions;

setting a desired back surface pressure distribution of the object;

synthesizing said desired back surface pressure distribution from a combination of said stored back surface pressure distributions;

calculating a desired front pressure distribution corresponding to said desired back surface pressure distribution based on a combination of said stored back surface pressure distributions;

calculating an estimated polishing profile or polishing amount of the object based on said desired front pressure distribution and a predetermined equation which includes a polishing amount value and a pressure value as parameters; and

updating said estimated polishing profile based on a measured polishing profile of the object.

21. A method for estimating a polishing profile or a polishing amount when polishing an object by using a top ring to press a front surface of the object against a polishing surface, with the top ring having at least two pressing portions each capable of independently applying a desired pressure on a back surface of the object, said method comprising:

setting back surface pressure distributions of the object;

calculating front surface pressure distributions of the object corresponding to said back surface pressure distributions;

storing said back surface pressure distributions and said front surface pressure distributions in a memory medium so as to provide stored back surface pressure distributions and stored front surface pressure distributions;

setting a desired back surface pressure distribution of the object;

synthesizing said desired back surface pressure distribution from a combination of said stored back surface pressure distributions;

calculating a desired front pressure distribution corresponding to said desired back surface pressure distribution based on a combination of said stored back surface pressure distributions; and

calculating an estimated polishing profile or polishing amount of the object based on said desired front pressure distribution, a predetermined equation which includes a polishing amount value and a pressure value as parameters, and results of measurement of a configuration of a polished object performed by a configuration monitor capable of measuring an edge configuration of the polished object.

22. A method for polishing an object by using a polishing apparatus including a top ring having pressing portions to press a back surface of the object such that a front surface of the object is pressed against a polishing surface, said method comprising:

(a) setting a desired polishing profile;

(b) independently setting a pressure value for each of at least two of the pressing portions, which pressure value corresponds to a pressure that a respective one of each of the at least two pressing portions is to apply on a back surface of the object;

(c) determining an estimated polishing profile of the object based on the pressure values set in (b);

(d) calculating a difference between said desired polishing profile and said estimated polishing profile;

(e) repeating (b)–(d) until the difference between said desired polishing profile and said estimated polishing profile becomes within a predetermined range;

(f) determining a recommended polishing pressure value such that the difference between said desired polishing profile and said estimated polishing profile becomes within the predetermined range, which recommended polishing pressure value corresponds to a pressure that is to be applied by the top ring to the back surface of the object; and

(g) polishing the object by causing the top ring to press a front surface of the object against the polishing surface under a polishing condition including said recommended polishing pressure value.

23. The method according to claim 22 , further comprising:

measuring an actual polished profile after the object is polished;

calculating corrected pressure values based on a difference between said actual polished profile and said estimated polishing profile; and

using said corrected pressure values for a next object to be polished.

24. The method according to claim 23 , wherein

using said corrected pressure values for a next object to be polished comprises using said corrected pressure values when a difference between said actual polished profile and said desired polishing profile is within a preset allowable range.

25. The method according to claim 22 , further comprising:

measuring an actual polished profile of the object in a predetermined interval;

calculating corrected pressure values based on a difference between said actual polished profile and said estimated polishing profile; and

using said corrected pressure values for a next object to be polished.

26. The method according to claim 25 , wherein

using said corrected pressure values for a next object to be polished comprises using said corrected pressure values when a difference between said actual polished profile and said desired polishing profile is within a preset allowable range.

27. The method according to claim 22 , further comprising:

stopping polishing of the object or issuing a warning when said recommended polishing pressure value falls outside a predetermined allowable range.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 27, 2005
From: SAKURAI, KUNIHIKO; TOGAWA, TETSUJI; MOCHIZUKI, YOSHIHIRO; FUKUDA, AKIRA; HIYAMA, HIROKUNI; HIROKAWA, KAZUTO; TSUJIMURA, MANABU
To: EBARA CORPORATION
Reel/Frame 017029/0218 →
Priority Claims (1)
JP 2004-202970 · Jul 9, 2004 · national
Continuity (1)
Related Publication 20060009127A1 · Jan 12, 2006