Method of resetting substrate processing apparatus, storage medium storing program for implementing the method, and substrate processing apparatus

1. A method of resetting a substrate processing apparatus having a chamber, the method comprising:

an evacuating step of evacuating the chamber;

a temperature setting step of setting a temperature in the chamber;

an abnormality judgment step of judging whether or not there is an abnormality in the chamber;

a seasoning step of stabilizing an atmosphere in the chamber so as to conform to predetermined processing conditions; and

a displaying step of displaying results judged in said abnormality judgment step,

wherein:

said abnormality judgment step comprises measuring at least one selected from data that change in response to a change in a state inside the chamber, and comparing the measured data with reference data that corresponds to the measured data for a normal state in the chamber; and

in said temperature setting step, the temperature in the chamber is set to a temperature different from a temperature in the chamber during ordinary substrate processing.

2. A method as claimed in claim 1 , wherein in said abnormality judgment step, a processing gas that does not cause production of a reaction product in the chamber is introduced while a substrate in the chamber is subjected to a predetermined process.

3. A method as claimed in claim 2 , wherein the processing gas comprises only oxygen.

4. A method as claimed in claim 1 , wherein the measured data comprises a log showing a state of at least one component part of the substrate processing apparatus.

5. A method as claimed in claim 4 , wherein the log is of an impedance of a matcher that adjusts high-frequency electrical power applied to a lower electrode disposed in the chamber.

6. A method as claimed in claim 4 , wherein the log is of a voltage between a lower electrode disposed in the chamber and a matcher that adjusts high-frequency electrical power applied to the lower electrode.

7. A method as claimed in claim 4 , wherein the log is of an opening extent of a control valve that controls a pressure in the chamber.

8. A method as claimed in claim 1 , wherein the measured data is processed substrate light emission data.

9. A method as claimed in claim 8 , wherein the light emission data relates to a light intensity ratio.

10. A method as claimed in claim 1 , wherein the measured data is data relating to a high-frequency power source that supplies high-frequency electrical power applied to a lower electrode disposed in the chamber.

11. A method as claimed in claim 1 , wherein in said evacuating step, the temperature in the chamber is raised.

12. A method as claimed in claim 1 , wherein in said seasoning step, stability of the atmosphere in the chamber is detected based on a difference in light emission data between two consecutively processed substrates.

13. A method as claimed in claim 12 , wherein in said seasoning step, the stability of the atmosphere in the chamber is detected based on a derivative of the difference in the light emission data.

14. A method as claimed in claim 1 , wherein in said abnormality judgment step, a leak in the chamber is detected based on a ratio of light emission amounts at different wavelengths for light emission from a processed substrate.

15. A computer-readable storage medium storing a program for causing a computer to implement a method of resetting a substrate processing apparatus having a chamber, the program comprising:

an evacuating module for evacuating the chamber;

a temperature setting module for setting a temperature in the chamber;

an abnormality judgment module for judging whether or not there is an abnormality in the chamber;

a seasoning module for stabilizing an atmosphere in the chamber so as to conform to predetermined processing conditions; and

a displaying module for displaying results judged by said abnormality judgment module,

wherein:

said abnormality judgment module measures at least one selected from data that change in response to a change in a state inside the chamber, and compares the measured data with reference data that corresponds to the measured data for a normal state in the chamber; and

said temperature setting module sets the temperature in the chamber to a temperature different from a temperature in the chamber during ordinary substrate processing.

16. A substrate processing apparatus comprising:

a chamber;

an evacuating device that evacuates said chamber;

a temperature setting device that sets a temperature in said chamber;

an abnormality judgment device that judges whether or not there is an abnormality in said chamber;

a seasoning device that stabilizes an atmosphere in said chamber so as to conform to predetermined processing conditions; and

a displaying device for displaying results judged by said abnormality judgment device,

wherein:

said abnormality judgment device measures at least one selected from data that change in response to a change in a state inside said chamber, and compares the measured data with reference data that corresponds to the measured data for a normal state in said chamber; and

said temperature setting device sets the temperature in the chamber to a temperature different from a temperature in the chamber during ordinary substrate processing.