Processes and apparatuses for treating halogen-containing gases
There are disclosed various processes, apparatuses and systems for treating a halogen-containing gas such as F 2 that involve generating a plasma in order to reduce chemically the halogen-containing gas into products that are more environmentally manageable. According to a particular embodiment, a reducing agent is mixed with the halogen-containing gas to produce a feed gas mixture and a non-thermal plasma is generated in the feed gas mixture in the presence of liquid water.
1. A plasma reactor apparatus, comprising:
a chamber defining at least one first gas inlet for receiving a first gas, and at least one water inlet for receiving liquid water;
at least one first electrode disposed within the chamber and defining a first surface that is in fluid communication with the water inlet for receiving liquid water, and at least one second gas inlet for receiving a second gas;
an electrochemical cell that is in fluid communication with the second gas inlet; and
at least one second electrode disposed within the chamber and opposing the first surface of the first electrode;
wherein a dielectric barrier is disposed on at least one of the first surface of the first electrode or a surface of the second electrode.
2. An apparatus according to claim 1 , wherein the first electrode defines a plurality of second gas inlets.
3. An apparatus according to claim 1 , further comprising gas/liquid scrubbing packing material disposed within the chamber.
4. An apparatus according to claim 1 , wherein the first electrode defines a cylinder shape and is immersed in the liquid water.
5. An apparatus according to claim 1 , comprising a plurality of spaced-apart first electrodes and a plurality of second gas inlets defined by the spaces between the spaced-apart first electrodes.