Calibration substrate and method for calibrating a lithographic apparatus

1. A calibration substrate for use during calibration of a lithographic apparatus, the calibration substrate comprising:

a first substantially flat surface;

a second substantially flat surface that is substantially parallel to the first surface; and

an edge that connects the first surface to the second surface,

wherein the calibration substrate has a thermal expansion coefficient of less than about 1.0×10 −6 K −1 to reduce deformation thereof due to thermal changes in the substrate while in the lithographic apparatus.

2. A calibration substrate according to claim 1 , wherein the thermal expansion coefficient is less than about 0.1×10 −6 K −1 .

3. A calibration substrate according to claim 2 , wherein the thermal expansion coefficient is less than about 0.05×10 −6 K 1 .

4. A calibration substrate according to claim 1 , wherein said thermal changes comprise expansion of the substrate.

5. A calibration substrate according to claim 1 , wherein said thermal changes comprise shrinkage of the substrate.

6. A calibration substrate according to claim 1 , wherein the material is a glass ceramic material.

7. A calibration substrate according to claim 6 , wherein the material is ZERODUR® glass ceramic material.

8. A calibration substrate according to claim 6 , wherein the material is CLEARCERAM® glass ceramic material.

9. A calibration substrate according to claim 1 , wherein the material is a glass material.

10. A calibration substrate according to claim 9 , wherein the material is ULE® glass material.

11. A calibration substrate according to claim 1 , wherein the material is cordierite.

12. A calibration substrate according to claim 1 , wherein the first surface and the second surface each have a diameter of about 200 mm.

13. A calibration substrate according to claim 12 , wherein a thickness of the substrate at a center point of the first surface is about 705 μm to about 745 μm.

14. A calibration substrate according to claim 1 , wherein the first surface and the second surface each have a diameter of about 300 mm.

15. A calibration substrate according to claim 14 , wherein a thickness of the substrate at a center point of the first surface is about 755 μm to about 795 μm.

16. A calibration substrate according to claim 1 , wherein the edge comprises a notch.

17. A calibration substrate according to claim 1 , wherein the first surface comprises a coating having an optical density of greater than about 5.

18. A calibration substrate according to claim 17 , wherein the coating comprises TiN.

19. A calibration substrate according to claim 18 , wherein the coating has a thickness of about 200 nm.

20. A calibration substrate according to claim 1 , wherein the second surface comprises a coating having a volume resistivity of less than about 1×10 9 Ω/cm.

21. A calibration substrate according to claim 20 , wherein the coating comprises TiN.

22. A calibration substrate according to claim 21 , wherein the coating has a thickness of about 100 nm.

23. A method for calibrating a lithographic apparatus, the method comprising:

imaging a marker provided on a patterning device onto a radiation-sensitive layer on a calibration substrate with a beam of radiation;

measuring a property of the image of the marker on the calibration substrate;

determining any error between the measured property and an expected property based on the marker and operating parameters of the apparatus; and

adjusting at least one of the operating parameters of the apparatus to correct for the error,

wherein the calibration substrate comprises a first substantially flat surface, a second substantially flat surface that is substantially parallel to the first surface, and an edge that connects the first surface to the second surface, and

wherein the calibration substrate has a thermal expansion coefficient of less than about 1.0×10 −6 K −1 to reduce deformation thereof due to thermal changes in the substrate while in the lithographic apparatus.

24. A method according to claim 23 , wherein the thermal expansion coefficient is less than about 0.10×10 −6 K −1 .

25. A method according to claim 24 , wherein the thermal expansion coefficient is less than about 0.05×10 −6 K −1 .

26. A method according to claim 23 , wherein said thermal changes comprise expansion of the substrate.

27. A method according to claim 23 , wherein said thermal changes comprise shrinkage of the substrate.

28. A method according to claim 23 , wherein the material is a glass ceramic material.

29. A method according to claim 28 , wherein material is ZERODUR® glass ceramic material.

30. A method according to claim 23 , wherein the calibration substrate has a diameter of about 300 mm.

31. A method according to claim 23 , wherein the calibration substrate has a diameter of about 200 mm.

32. A method according to claim 23 wherein the marker comprises a plurality of marks.

33. A method according to claim 23 , wherein said measuring the property comprises measuring a position of the image of the marker.

34. A method according to claim 33 , wherein said position comprises an X position and a Y position.

35. A method according to claim 34 , wherein said operating parameter comprises the orthogonality of the substrate table.

36. A method according to claim 23 , wherein said measuring the property comprises measuring positions of the developed images of the marks.

37. A method according to claim 36 , wherein said adjusting at least one operating parameter comprises adjusting focus and dose parameters of the apparatus.

38. A method for manufacturing a device using a lithographic apparatus, the method comprising:

calibrating the lithographic apparatus with a calibration substrate, the calibration substrate comprising a first substantially flat surface, a second substantially flat surface that is substantially parallel to the first surface, and an edge that connects the first surface to the second surface, wherein the calibration substrate has a thermal expansion coefficient of less than about 1.0×10 −6 K −1 to reduce deformation thereof due to thermal changes in the calibration substrate while in the lithographic apparatus;

patterning a beam of radiation;

projecting a patterned beam of radiation onto a target area of a radiation sensitive material of a production substrate.

39. A device manufactured according to the method of claim 38 .

40. A lithographic apparatus in combination with a calibration substrate for use during calibration of the lithographic apparatus, the lithographic apparatus comprising:

an illumination system for conditioning a beam of radiation;

a support structure for supporting a patterning device, the patterning device serving to impart the beam of radiation with a pattern in its cross-section;

a substrate table for holding the calibration substrate; and

a projection system for projecting the patterned beam of radiation onto a target portion of the calibration substrate, and

the calibration substrate comprising a first substantially flat surface;

a second substantially flat surface that is substantially parallel to the first surface; and

an edge that connects the first surface to the second surface,

wherein the calibration substrate has a thermal expansion coefficient of less than about 1.0×10 −6 K −1 to reduce deformation thereof due to thermal changes in the substrate while in the lithographic apparatus.

41. A combination according to claim 40 , wherein the material has a thermal expansion coefficient of less than about 0.10×10 −6 K −1 .

42. A combination according to claim 40 , wherein the material is a glass ceramic material.

43. A combination according to claim 42 , wherein the material is ZERODUR® glass ceramic material.

44. A combination according to claim 40 , wherein the calibration substrate has a diameter of about 300 mm.

45. A combination according to claim 40 , wherein the calibration substrate has a diameter of about 200 mm.