Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process
Silicon compounds having fluorinated hemiacetal structure are provided. Silicone resins having the same structure have an appropriate acidity to enable formation of a finer pattern by minimizing the pattern collapse by swelling, exhibit improved resistance to the etching used in the pattern transfer to an organic film, and are thus suited for use in resist compositions for the bilayer process.
1. A silicon compound bearing a fluorinated cyclic structure, having the general formula (1):
wherein X 1 , X 2 and X 3 each are hydrogen, hydroxyl, halogen, a straight, branched or cyclic alkoxy group of 1 to 6 carbon atoms, or a monovalent organic group of 1 to 20 carbon atoms having a straight, branched, cyclic or polycyclic skeleton (excluding alkoxy), Y is a single bond or a divalent organic group, and Z is a trivalent organic group.
2. The silicon compound bearing a fluorinated cyclic structure of claim 1 wherein Y is a divalent organic group having an aliphatic ring.
3. The silicon compound bearing a fluorinated cyclic structure of claim 1 wherein Y is a divalent organic group having the general formula:
wherein p and q are each independently 1 or 0.
4. A silicon compound bearing a fluorinated cyclic structure, having the general formula (2), (3) or (4):
wherein at least one of R 1 , R 2 , R 3 and R 4 is a silicon-containing substituent group of the general formula:
wherein X 1 , X 2 and X 3 each are hydrogen, hydroxyl, halogen, a straight, branched or cyclic alkoxy group of 1 to 6 carbon atoms, or a monovalent organic group of 1 to 20 carbon atoms having a straight, branched, cyclic or polycyclic skeleton (excluding alkoxy), and Y is a single bond or a divalent organic group, and each of the remaining R 1 to R 4 is independently hydrogen, hydroxyl, halogen, or a monovalent organic group of 1 to 20 carbon atoms having a straight, branched, cyclic or polycyclic skeleton, or a combination of any two or more of R 1 , R 2 , R 3 and R 4 may bond together to form a ring with the carbon atom or atoms to which they are attached;
at least one of R 5 , R 6 , R 7 , R 8 , R 9 and R 10 is a silicon-containing substituent group of the general formula:
wherein X 1 , X 2 and X 3 each are hydrogen, hydroxyl, halogen, a straight, branched or cyclic alkoxy group of 1 to 6 carbon atoms, or a monovalent organic group of 1 to 20 carbon atoms having a straight, branched, cyclic or polycyclic skeleton (excluding alkoxy), and Y is a single bond or a divalent organic group, and each of the remaining R 5 to R 10 is independently hydrogen, hydroxyl, halogen, or a monovalent organic group of 1 to 20 carbon atoms having a straight, branched, cyclic or polycyclic skeleton, or a combination of any two or more of R 5 to R 10 may bond together to form a ring with the carbon atom or atoms to which they are attached;
at least one of R 11 , R 12 , R 13 and R 14 is a silicon-containing substituent group of the general formula:
wherein X 1 , X 2 and X 3 each are hydrogen, hydroxyl, halogen, a straight, branched or cyclic alkoxy group of 1 to 6 carbon atoms, or a monovalent organic group of 1 to 20 carbon atoms having a straight, branched, cyclic or polycyclic skeleton (excluding alkoxy), and Y is a single bond or a divalent organic group, and each of the remaining R 11 to R 14 is independently hydrogen, hydroxyl, halogen, or a monovalent organic group of 1 to 20 carbon atoms having a straight, branched, cyclic or polycyclic skeleton, or a combination of any two or more of R 11 , R 12 , R 13 and R 14 may bond together to form a ring with the carbon atom or atoms to which they are attached.
5. The silicon compound bearing a fluorinated cyclic structure of claim 4 wherein Y is a divalent organic group having an aliphatic ring.
6. The silicon compound bearing a fluorinated cyclic structure of claim 4 wherein Y is a divalent organic group having the general formula:
wherein p and q are each independently 1 or 0.
7. A fluorinated cyclic structure-bearing silicone resin comprising a partial structure having the general formula (1a), (2a), (3a) or (4a):
wherein Y is a single bond or a divalent organic group, Z is a trivalent organic group, at least one of X 1a , X 2a and X 3a is an oxygen atom, and the remaining is hydrogen, hydroxyl, halogen, a straight, branched or cyclic alkoxy group of 1 to 6 carbon atoms, or a monovalent organic group of 1 to 20 carbon atoms having a straight, branched, cyclic or polycyclic skeleton (excluding alkoxy),
at least one of R 1a , R 2a , R 3a and R 4a is a silicon-containing substituent group of the general formula:
wherein at least one of X 1a , X 2a and X 3a is an oxygen atom and the remaining is hydrogen, hydroxyl, halogen, a straight, branched or cyclic alkoxy group of 1 to 6 carbon atoms, or a monovalent organic group of 1 to 20 carbon atoms having a straight, branched, cyclic or polycyclic skeleton (excluding alkoxy), and Y is as defined above, and each of the remaining R 1a to R 4a is independently hydrogen, hydroxyl, halogen, or a monovalent organic group of 1 to 20 carbon atoms having a straight, branched, cyclic or polycyclic skeleton, or a combination of any two or more of R 1a to R 4a may bond together to form a ring with the carbon atom or atoms to which they are attached;
at least one of R 5a , R 6a , R 7a , R 8a , R 9a and R 10a is a silicon-containing substituent group of the general formula:
wherein at least one of X 1a , X 2a and X 3a is an oxygen atom and the remaining is hydrogen, hydroxyl, halogen, a straight, branched or cyclic alkoxy group of 1 to 6 carbon atoms, or a monovalent organic group of 1 to 20 carbon atoms having a straight, branched, cyclic or polycyclic skeleton (excluding alkoxy), and Y is as defined above, and each of the remaining R 5a to R 10a is independently hydrogen, hydroxyl, halogen, or a monovalent organic group of 1 to 20 carbon atoms having a straight, branched, cyclic or polycyclic skeleton, or a combination of any two or more of R 5a to R 10a may bond together to form a ring with the carbon atom or atoms to which they are attached;
at least one of R 11a , R 12a , R 13a and R 14a is a silicon-containing substituent group of the general formula:
wherein at least one X 1a , X 2a and X 3a is an oxygen atom and the remaining is hydrogen, hydroxyl, halogen, a straight, branched or cyclic alkoxy group of 1 to 6 carbon atoms, or a monovalent organic group of 1 to 20 carbon atoms having a straight, branched, cyclic or polycyclic skeleton (excluding alkoxy), and Y is as defined above, and each of the remaining R 11a to R 14a is independently hydrogen, hydroxyl, halogen, or a monovalent organic group of 1 to 20 carbon atoms having a straight, branched, cyclic or polycyclic skeleton, or a combination of any two or more of R 11a to R 14a may bond together to form a ring with the carbon atom or atoms to which they are attached.
8. A resist composition comprising
(A) the silicone resin of claim 7 ,
(B) a photoacid generator, and
(C) a solvent.
9. A patterning process comprising the steps of:
applying the resist composition of claim 8 onto a substrate to form a resist layer,
heat treating the resist layer and exposing it to high energy radiation having a wavelength of up to 300 nm or electron beam through a photomask, and
optionally heat treating the exposed resist layer, and developing it with a developer.
10. The fluorinated cyclic structure-bearing silicone resin of claim 7 wherein Y is a divalent organic group having an aliphatic ring.
11. The fluorinated cyclic structure-bearing silicone resin of claim 7 wherein Y is a divalent organic group having the general formula:
wherein p and q are each independently 1 or 0.