IP Library Granted Patent US 7,719,039
Granted Patent B2
US 7,719,039 · App. 11/864,257 · Granted May 18, 2010

Phase change memory structures including pillars

Assignee: Freescale Semiconductor, Inc.
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Quick Facts
Patent No.
US 7,719,039
App. No.
11/864,257
Granted
May 18, 2010
Kind
B2
Abstract

A phase change memory cell has a first electrode, a heater, a phase change material, and a second electrode. The heater is over the first electrode, and the heater includes a pillar. The phase change material is around the heater. The second electrode is electrically coupled to the phase change material. In some embodiments, a method includes forming a electrode layer over a substrate, depositing a first layer, providing nanoclusters over the first layer, and etching the first layer. The first layer comprises one of a group consisting of a heater material and a phase change material. The first layer may be etched using the nanocluster defined pattern to form pillars from the first layer.

Claims (28)

1. A phase change memory cell, comprising:

a first electrode;

a heater located over the first electrode, wherein the heater comprises a first pillar and a second pillar, the first pillar and the second pillar each including a top side and a bottom side;

a phase change material, the phase change material is around a lateral side portion of the first pillar, the lateral side portion of the first pillar being located between the top side and the bottom side of the first pillar, the phase change material is around a lateral side portion the second pillar, the lateral side portion of the second pillar being located between the top side and the bottom side of the second pillar; and

a second electrode located over the heater and phase change material, the first electrode electrically coupled to the second electrode via at least the phase change material.

2. The memory cell of claim 1 , wherein the phase change material is located over the first pillar.

3. The memory cell of claim 1 , wherein the phase change material comprises at least one a group consisting of germanium, antimony, and tellurium.

4. The memory cell of claim 1 , wherein the heater includes at least one of a group consisting of titanium, aluminum, nitrogen, silicon, tantalum, and tungsten.

5. The memory cell of claim 1 , wherein the first pillar has a width of less than 20 nanometers.

6. The memory cell of claim 1 , wherein the first pillar and the second pillar each have a width of less than 20 nanometers.

7. The memory cell of claim 1 , wherein the first pillar and the second pillar each include at least one of a group consisting of titanium, aluminum, tantalum, and tungsten.

8. The memory cell of claim 1 , wherein the heater is further characterized as comprising a base portion under the first pillar and the second pillar.

9. The memory cell of claim 8 , wherein the first pillar and the second pillar each have a width of less than 20 nanometers.

10. The memory cell of claim 1 , wherein the heater further comprises a third pillar located between the first electrode and the second electrode, the third pillar including a top side and a bottom side, wherein the phase change material is around a lateral side portion of the third pillar, the lateral side portion of the third pillar being located between the top side and the bottom side of the third pillar.

11. The memory cell of claim 10 , wherein the heater further comprises a fourth pillar located between the first electrode and the second electrode, the fourth pillar including a top side and a bottom side, wherein the phase change material is around a lateral side portion of the fourth pillar, the lateral side portion of the fourth pillar being located between the top side and the bottom side of the fourth pillar.

12. The memory cell of claim 10 , wherein the phase change material is over the third pillar.

13. The memory cell of claim 1 , wherein the phase change material is over the first pillar and the second pillar.

14. The memory cell of claim 13 , wherein the first pillar and the second pillar each have a width of less than 20 nanometers.

15. The memory cell of claim 13 , wherein the heater is further characterized as comprising a base portion under the first pillar and the second pillar.

16. The memory cell of claim 15 , wherein the first pillar and the second pillar each has a width of less than 20 nanometers.

17. A phase change memory cell, comprising:

a first electrode over a substrate;

a second electrode;

a plurality of pillars comprising heater material electrically coupled to the first electrode, the plurality of pillars located between the first electrode and the second electrode, each of the plurality of pillars having a width of less than 20 nanometers, each pillar of the plurality of pillars including a top side and a bottom side;

a phase change material around a lateral side portion of each pillar of the plurality of pillars, the lateral side portion of each pillar of the plurality of pillars is located between a top side and a bottom side of the each pillar, the phase change material electrically coupled to the second electrode.

18. The phase change memory cell of claim 17 , wherein the phase change material has a planarized surface.

19. The phase change memory cell of claim 17 wherein the phase change material is over each of the plurality of pillars.

20. The phase change memory cell of claim 17 , a base portion including heater material under the plurality of pillars between the first electrode and the second electrode.

Assignments (23)
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040925 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Recorded Feb 17, 2020
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP, B.V. F/K/A FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 052917/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040928 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Recorded Jan 17, 2020
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 052915/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 037486 FRAME 0517. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS. Recorded Dec 10, 2019
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 053547/0421 →
RELEASE OF SECURITY INTEREST Recorded Sep 10, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 050744/0097 →
CORRECTIVE ASSIGNMENT TO CORRECT THE TO CORRECT THE APPLICATION NO. FROM 13,883,290 TO 13,833,290 PREVIOUSLY RECORDED ON REEL 041703 FRAME 0536. ASSIGNOR(S) HEREBY CONFIRMS THE THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS.. Recorded Feb 20, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: SHENZHEN XINGUODU TECHNOLOGY CO., LTD.
Reel/Frame 048734/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 17, 2018
From: NXP USA, INC.
To: VLSI TECHNOLOGY LLC
Reel/Frame 045084/0184 →
CORRECTIVE ASSIGNMENT TO CORRECT THE NATURE OF CONVEYANCE PREVIOUSLY RECORDED AT REEL: 040632 FRAME: 0001. ASSIGNOR(S) HEREBY CONFIRMS THE MERGER AND CHANGE OF NAME. Recorded Sep 21, 2017
From: FREESCALE SEMICONDUCTOR INC.
To: NXP USA, INC.
Reel/Frame 044209/0047 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE PATENTS 8108266 AND 8062324 AND REPLACE THEM WITH 6108266 AND 8060324 PREVIOUSLY RECORDED ON REEL 037518 FRAME 0292. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS. Recorded Feb 1, 2017
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 041703/0536 →
CHANGE OF NAME Recorded Nov 8, 2016
From: FREESCALE SEMICONDUCTOR, INC.
To: NXP USA, INC.
Reel/Frame 040632/0001 →
RELEASE OF SECURITY INTEREST Recorded Nov 7, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 040928/0001 →
RELEASE OF SECURITY INTEREST Recorded Sep 21, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP, B.V., F/K/A FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 040925/0001 →
SUPPLEMENT TO THE SECURITY AGREEMENT Recorded Jun 16, 2016
From: FREESCALE SEMICONDUCTOR, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 039138/0001 →
ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Recorded Jan 13, 2016
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 037518/0292 →
ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Recorded Jan 12, 2016
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 037486/0517 →
PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037356/0553 →
PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037354/0704 →
PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037356/0143 →
SECURITY AGREEMENT Recorded Nov 6, 2013
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS NOTES COLLATERAL AGENT
Reel/Frame 031591/0266 →
SECURITY AGREEMENT Recorded Jun 18, 2013
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS NOTES COLLATERAL AGENT
Reel/Frame 030633/0424 →
SECURITY AGREEMENT Recorded May 13, 2010
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS COLLATERAL AGENT
Reel/Frame 024397/0001 →
SECURITY AGREEMENT Recorded Mar 15, 2010
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A.
Reel/Frame 024085/0001 →
SECURITY AGREEMENT Recorded Feb 16, 2008
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A.
Reel/Frame 020518/0215 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 28, 2007
From: MURALIDHAR, RAMACHANDRAN; MERCHANT, TUSHAR P.; RAO, RAJESH A.
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 019897/0213 →
Continuity (1)
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