IP Library › Granted Patent US 7,767,006
Granted Patent B2
US 7,767,006 · App. 10/581,729 · Granted Aug 3, 2010

Ozone processing apparatus and ozone processing method

Assignee: Tokyo Electron Limited
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 7,767,006
App. No.
10/581,729
Granted
Aug 3, 2010
Kind
B2
Abstract

Water vapor is mixed to O 3 gas generated by an ozone generator of discharge type. The mixed fluid is cooled by a cooler, thereby impurities such as metals and nitrogen oxides contained in the O 3 gas dissolve into condensed water. Subsequently, a gas-liquid separator separates the O 3 gas from the condensed water. Water vapor is mixed with the O 3 gas again. The mixed fluid passes through a metal trap composed of a container containing plural silicon chips as a metal adsorbent, thereby to remove the remaining metals therefrom.

Claims (12)

1. An ozone processing apparatus that processes a process object by using ozone gas, comprising:

a processing part having a processing space configured to contain a process object therein;

an ozone generator configured to generate ozone gas from an oxygen-containing gas through an electric discharge;

an ozone supply line provided to supply the ozone gas generated by the ozone generator into the processing space of the processing part;

a steam generator configured to generate water vapor;

a steam supply line connected to the ozone supply line to supply the water vapor generated by the steam generator into the ozone supply line;

a metal trap arranged in the ozone supply line at a portion thereof downstream of a joint between the ozone supply line and the steam supply line such that a mixed fluid containing the ozone gas and the water vapor is introduced into the metal trap, the metal trap containing an adsorbent composed of a silicon-containing material;

a cooler arranged in the ozone supply line at a portion thereof downstream of the metal trap to cool the mixed fluid containing the ozone gas and the water vapor having been passed through the metal trap; and

a gas-liquid separator arranged in the ozone supply line at a portion thereof downstream of the cooler to separate the ozone gas contained in the mixed fluid cooled by the cooler from condensed water generated by cooling the water vapor.

2. The ozone processing apparatus according to claim 1 , wherein the adsorbent is composed of pure silicon or SiO 2 .

3. The ozone processing apparatus according to claim 1 , wherein the metal trap comprises a container containing plural chips composed of the silicon-containing material.

4. The ozone processing apparatus according to claim 1 , wherein the gas-liquid separator comprises a tank holding water therein, whereby, when the condensed water and the ozone gas pass through the water in the tank, the condensed water is mixed to the water in the tank to be separated from the ozone gas.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 5, 2006
From: TOKUNO, YOSHICHIKA; ITO, NORIHIRO; ORII, TAKEHIKO; NAKAMORI, MITSUNORI; IINO, TADASHI; OHNO, HIROKI; SAITO, YUSUKE
To: TOKYO ELECTRON LIMITED
Reel/Frame 017965/0490 →
Priority Claims (3)
JP 2003-419044 · Dec 17, 2003 · national
JP 2004-167081 · Jun 4, 2004 · national
JP 2004-167082 · Jun 4, 2004 · national
Continuity (1)
Related Publication 20070107751A1 · May 17, 2007