IP Library Granted Patent US 7,812,461
Granted Patent B2
US 7,812,461 · App. 11/727,553 · Granted Oct 12, 2010

Method and apparatus providing integrated circuit having redistribution layer with recessed connectors

Assignee: Micron Technology, Inc.
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 7,812,461
App. No.
11/727,553
Granted
Oct 12, 2010
Kind
B2
Abstract

A method of making a semiconductor die includes forming a trench around a conductive stud extending from the first side to a second side of a substrate to expose a portion of the stud and then forming a conductive layer inside the trench and in electrical contact with the stud.

Claims (39)

1. A semiconductor die, comprising:

a substrate having a first side and a second side;

an integrated circuit formed on the second side of the substrate;

a stud arranged through the substrate and electrically coupling the integrated circuit to the first side of the substrate;

a trench arranged in the substrate around the stud and extending away from the stud;

a first dielectric layer arranged in the trench; and

a conductive layer arranged in the trench on the first dielectric layer and electrically coupled to the stud, wherein the conductive layer comprises a first bond pad, a second bond pad, and a conductive trace connecting the first bond pad and the second bond pad.

2. The semiconductor die of claim 1 , further comprising a second dielectric layer arranged over the conductive layer and the first dielectric layer.

3. The semiconductor die of claim 2 , wherein a portion of the conductive layer arranged away from the stud is not covered by the second dielectric layer.

4. The semiconductor die of claim 1 , further comprising a dielectric layer arranged around the through wafer interconnect stud.

5. The semiconductor die of claim 1 , further comprising a redistribution line electrically coupling the integrated circuit to the stud.

6. The semiconductor die of claim 1 , wherein the stud is substantially perpendicular to the plane of the substrate.

7. The semiconductor die of claim 1 , wherein the stud is surrounded by at least one dielectric layer.

8. The semiconductor die of claim 1 , wherein the conductive layer comprises at least one of aluminum, copper, an alloy of aluminum, and an alloy of copper.

9. The semiconductor die of claim 2 , wherein the stud is not covered by the second dielectric layer.

10. A semiconductor die comprising:

a substrate;

integrated circuitry arranged in an active surface of the substrate;

a stud arranged through the substrate and electrically coupled to the integrated circuitry;

a first bond pad electrically coupled to the integrated circuitry via the stud;

a second bond pad; and

a conductive trace,

wherein the first bond pad, the second bond pad and the conductive trace are arranged in a trench on a back surface of the substrate, the back surface being arranged opposite the active surface.

11. The semiconductor die of claim 10 , wherein the conductive stud is arranged substantially perpendicular to a plane of the substrate.

12. The semiconductor die of claim 10 further comprising redistribution lines electrically connecting the integrated circuitry to the conductive stud.

13. An electronic device comprising:

a semiconductor die comprising:

a substrate;

integrated circuitry arranged in a first surface of the substrate;

a trench arranged in a second surface of the substrate;

a first dielectric layer arranged entirely within the trench;

a conductive redistribution layer arranged entirely within the trench and on the first dielectric layer, the conductive redistribution layer being electrically coupled to the electronic device; and

a conductive stud extending into the conductive redistribution layer and electrically coupling the integrated circuitry to the conductive redistribution layer.

14. The semiconductor die of claim 13 , wherein the conductive redistribution layer comprises a first bond pad.

15. The semiconductor die of claim 14 , wherein the first bond pad is in electrical contact with the conductive stud.

16. The semiconductor die of claim 14 , wherein the conductive redistribution layer further comprises a second bond pad and a conductive trace electrically coupling the second bond pad to the first bond pad.

17. The semiconductor die of claim 13 , wherein the conductive redistribution layer comprises at least one of aluminum, copper, an alloy of aluminum, and an alloy of copper.

18. The semiconductor die of claim 16 further comprising a second dielectric layer arranged over at least the first bond pad and the conductive trace.

19. The semiconductor die of claim 16 , wherein the second bond pad is connected to the electronic device.

Assignments (8)
RELEASE OF SECURITY INTEREST Recorded Nov 12, 2019
From: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
Reel/Frame 051028/0001 →
RELEASE OF SECURITY INTEREST Recorded Oct 9, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 050937/0001 →
RELEASE OF SECURITY INTEREST Recorded Aug 23, 2018
From: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 047243/0001 →
SECURITY INTEREST Recorded Jul 13, 2018
From: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 047540/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REPLACE ERRONEOUSLY FILED PATENT #7358718 WITH THE CORRECT PATENT #7358178 PREVIOUSLY RECORDED ON REEL 038669 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY INTEREST. Recorded Jun 8, 2017
From: MICRON TECHNOLOGY, INC.
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 043079/0001 →
PATENT SECURITY AGREEMENT Recorded Jun 2, 2016
From: MICRON TECHNOLOGY, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
Reel/Frame 038954/0001 →
SECURITY INTEREST Recorded May 12, 2016
From: MICRON TECHNOLOGY, INC.
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 038669/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 27, 2007
From: PRATT, DAVID
To: MICRON TECHNOLOGY, INC.
Reel/Frame 019148/0701 →
Continuity (1)
Related Publication 20080237849A1 · Oct 2, 2008