Scanning exposure apparatus and method of manufacturing device
A scanning exposure apparatus according to this invention has a light source which can change the central wavelength of exposure light to undergo pulsed oscillation, and scan-exposes a substrate with slit-like exposure light while periodically changing the central wavelength in synchronism with the pulsed oscillation of the exposure light. The scanning exposure apparatus includes a controller which controls the light source so that integrated values Sws and Swl obtained by integrating the intensity of the exposure light for each wavelength in the scanning direction in a short-wavelength range and long-wavelength range, respectively, assuming a target central wavelength as a reference satisfy: |( Sws−Swl )/( Sws +Swl )|≦0.1.
1. A scanning exposure apparatus which includes a light source which can change a central wavelength of exposure light to undergo pulsed oscillation, and scan-exposes a substrate with slit-like exposure light while periodically changing the central wavelength in synchronism with the pulsed oscillation of the exposure light, the apparatus comprising:
a controller configured to control the light source so that a value Sws, that is obtained by integrating an intensity of the exposure light for each wavelength in a scanning direction in a wavelength range of wavelengths shorter than the center of an amplitude of the central wavelength when periodically changing the central wavelength, and a value Swl, that is obtained by integrating an intensity of the exposure light for each wavelength in a scanning direction in a wavelength range of wavelengths longer than the center of the amplitude, satisfy:
|( Sws−Swl )/( Sws+Swl )|≦0.1.
2. The apparatus according to claim 1 , wherein said controller controls the light source so that the central wavelength of the exposure light which strikes each point on the substrate changes by not less than two periods.
3. The apparatus according to claim 1 , wherein said controller controls the light source so that the central wavelength linearly changes with time in a periodic pattern.
4. The apparatus according to claim 1 , wherein the light source is one of an ArF excimer laser light source and a KrF excimer laser light source.
5. A method of manufacturing a device, the method comprising:
scan-exposing a substrate using a scanning exposure apparatus;
developing the scan-exposed substrate; and
processing the developed substrate to manufacture the device,
wherein the scanning exposure apparatus comprises a light source which can change a central wavelength of exposure light to undergo pulsed oscillation, and a controller which controls the light source, and scan-exposes a substrate with slit-like exposure light while periodically changing the central wavelength in synchronism with the pulsed oscillation of the exposure light, and
wherein the controller controls the light source so that a value Sws, that is obtained by integrating an intensity of the exposure light for each wavelength in a scanning direction in a wavelength range of wavelengths shorter than the center of an amplitude of the central wavelength when periodically changing the central wavelength, and a value Swl, that is obtained by integrating an intensity of the exposure light for each wavelength in a scanning direction in a wavelength range of wavelengths longer than the center of the amplitude, satisfy:
|( Sws−Swl )/( Sws+Swl )|≦0.1.