IP Library › Granted Patent US 7,859,893
Granted Patent B2
US 7,859,893 · App. 11/806,515 · Granted Dec 28, 2010

Phase change memory structure with multiple resistance states and methods of programming and sensing same

Assignee: Micron Technology, Inc.
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Quick Facts
Patent No.
US 7,859,893
App. No.
11/806,515
Granted
Dec 28, 2010
Kind
B2
Abstract

A phase change memory structure with multiple resistance states and methods of forming, programming, and sensing the same. The memory structure includes two or more phrase change elements provided between electrodes. Each phase change element has a respective resistance curve as a function of programming voltage which is shifted relative to the resistance curves of other phase change elements. In one example structure using two phase change elements, the memory structure is capable of switching among four resistance states.

Claims (28)

1. A resistive memory cell, comprising:

a plurality of phase change resistance elements provided between a single first electrode and a single second electrode, each of said resistance elements having a respective resistance curve as a function of programming voltage which is shifted relative to the resistance curves of others of said resistance elements.

2. The resistive memory cell of claim 1 , wherein the plurality of phase change resistance elements comprises two phase change resistance elements.

3. The resistive memory cell of claim 2 , wherein at a first programming voltage the first and second resistance elements are in a low resistance state, at a second programming voltage the first element is in a high resistance state while the second element is in a low resistance state, at a third programming voltage the first element is in a low resistance state while the second element is in a high resistance state, and at a forth programming voltage the first and second elements are in a high resistance state.

4. The resistive memory cell of claim 2 , wherein the first resistance element has a first length and the second resistance element has a second length less than the first length.

5. The resistive memory cell of claim 2 , wherein the second resistance element is doped such that the second resistance element has a resistance different than a resistance of the first resistance element.

6. The resistive memory cell of claim 1 , wherein the plurality of phase change elements comprises three phase change elements.

7. The resistive memory cell of claim 6 , wherein at a first programming voltage first, second, and third elements are in a low resistance state, at a second programming voltage the first element is in a high resistance state while the second and third elements are in a low resistance state, at a third programming voltage the first and second elements are in a high resistance state while the third element is in a low resistance state, at a forth programming voltage the first and second elements are in a low resistance state while the third element is in a high resistance state, at a fifth programming voltage, the first element is in a low resistance state while the second and third elements are in a high resistance state, and at a sixth programming voltage the first, second, and third elements are in a high resistance state.

8. The resistive memory cell of claim 1 , wherein the plurality of phase change resistance elements comprises four or more phase change resistance elements.

9. The resistive memory cell of claim 1 , wherein the memory cell is capable of storing at least two bits.

10. The resistive memory cell of claim 2 , wherein the first resistance element has a first width and the second resistance element has a second width greater than the first width.

11. The resistive memory cell of claim 1 , wherein the resistive memory cell is a stacked cell.

12. The resistive memory cell of claim 11 , wherein said single first and second electrodes function as respective first and second conductive sidewalls formed on either side of said resistance elements.

13. The resistive memory cell of claim 1 , wherein the resistive memory cell is a vertical cell.

14. The resistive memory cell of claim 4 , wherein said first electrode has an elongated portion used to shorten the distance between said first electrode and said second electrode in a portion of the resistive memory cell containing the second resistance element.

15. The resistive memory cell of claim 4 , wherein said second electrode has an elongated portion used to shorten the distance between said first electrode and said second electrode in a portion of the resistive memory cell containing the second resistance element.

16. The resistive memory cell of claim 1 , wherein the resistive memory cell is a planar cell.

17. A memory device, comprising:

an array of memory cells, each memory cell comprising:

a plurality of phase change resistance elements provided between a single first electrode and a single second electrode, each of said resistance elements having a respective resistance curve as a function of programming voltage which is shifted relative to the resistance curves of others of said resistance elements.

18. The memory device of claim 17 , wherein the plurality of phase change elements comprises two phase change elements.

19. The memory device of claim 18 , wherein at a first programming voltage the first and second phase change elements are in a low resistance state, at a second programming voltage the first phase change element is in a high resistance state while the second phase change element is in a low resistance state, at a third programming voltage the first phase change element is in a low resistance state while the second phase change element is in a high resistance state, and at a forth programming voltage the first and second phase change elements are in a high resistance state.

20. The memory device of claim 17 , wherein the plurality of phase change elements comprises three or more phase change elements.

21. The memory device of claim 17 , wherein each of the memory cells is a vertical cell.

22. The memory device of claim 17 , wherein each of the memory cells is a planar cell.

23. The memory device of claim 17 , wherein each memory cell is capable of storing at least two bits.

24. The memory device of claim 17 , further comprising a readout circuitry comprising a plurality of multi-state sense amplifiers.

25. The memory device of claim 24 , wherein each multi-state sense amplifier determines a resistance state of a respective memory cell by comparing a readout voltage corresponding to a resistance of the respective memory cell with a readout voltage corresponding to a reference resistance.

Assignments (9)
RELEASE OF SECURITY INTEREST Recorded Nov 12, 2019
From: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
Reel/Frame 051028/0001 →
RELEASE OF SECURITY INTEREST Recorded Oct 9, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 050937/0001 →
RELEASE OF SECURITY INTEREST Recorded Aug 23, 2018
From: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 047243/0001 →
SECURITY INTEREST Recorded Jul 13, 2018
From: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 047540/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REPLACE ERRONEOUSLY FILED PATENT #7358718 WITH THE CORRECT PATENT #7358178 PREVIOUSLY RECORDED ON REEL 038669 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY INTEREST. Recorded Jun 8, 2017
From: MICRON TECHNOLOGY, INC.
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 043079/0001 →
PATENT SECURITY AGREEMENT Recorded Jun 2, 2016
From: MICRON TECHNOLOGY, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
Reel/Frame 038954/0001 →
SECURITY INTEREST Recorded May 12, 2016
From: MICRON TECHNOLOGY, INC.
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 038669/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE EXECUTION DATE OF JUN LIU PREVIOUSLY RECORDED ON REEL 019425 FRAME 0498. ASSIGNOR(S) HEREBY CONFIRMS THE THE ENTIRE RIGHT, TITLE AND INTEREST.... Recorded Sep 17, 2010
From: LIU, JUN; VIOLETTE, MIKE
To: MICRON TECHNOLOGY, INC.
Reel/Frame 025007/0929 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 31, 2007
From: LIU, JUN; VIOLETTE, MIKE
To: MICRON TECHNOLOGY, INC.
Reel/Frame 019425/0498 →
Continuity (1)
Related Publication 20080298114A1 · Dec 4, 2008