Semiconductor device manufacturing method to form resist pattern
This invention discloses a method to form a resist pattern on a to-be-processed substrate by immersion exposure. A resist film is formed on the central portion of the upper surface of the to-be-processed substrate, on a bevel portion of the upper surface, which is obtained by chamfering the peripheral portion of the to-be-processed substrate, and on the end portion of the to-be-processed substrate. Pattern exposure for forming the latent image of a desired pattern on the resist film is executed while a liquid whose refractive index is higher than that of air exists between the resist film and a constituent element of a projection optical system of an exposure apparatus, which is nearest to the to-be-processed substrate. The resist film formed on the end portion of the to-be-processed substrate is removed by supplying a rinse solution to the end portion of the to-be-processed substrate after executing pattern exposure.
1. A semiconductor device manufacturing method comprising:
forming a resist film on a central portion of an upper surface of a to-be-processed substrate, on a bevel portion of the upper surface, which is obtained by chamfering a peripheral portion of the to-be-processed substrate, and on an end portion of the to-be-processed substrate;
executing pattern exposure for forming a latent image of a desired pattern on the resist film on the central portion of the upper surface while a liquid whose refractive index is higher than a refractive index of air exists between the resist film and a constituent element of a projection optical system of an exposure apparatus, which is nearest to the to-be-processed substrate;
exposing a peripheral portion including the bevel portion of the to-be-processed substrate after executing the pattern exposure;
developing the resist film on which the latent image is formed after the exposing of the peripheral portion; and
removing the resist film formed on the end portion of the to-be-processed substrate by supplying a rinse solution to the end portion of the to-be-processed substrate after the exposing of the peripheral portion.
2. The semiconductor device manufacturing method according to claim 1 , wherein the resist film comes in direct contact with the liquid.
3. The semiconductor device manufacturing method according to claim 1 , wherein the forming the resist film comprises removing the resist film of a lower surface of the to-be-processed substrate by discharging a rinse solution to the lower surface after forming by spin coating the resist film on the upper surface of the to-be-processed substrate.
4. The semiconductor device manufacturing method according to claim 1 , wherein the to-be-processed substrate includes a semiconductor substrate and a thin film formed on the semiconductor substrate, and at least one of an anti-reflection film and hard mask is formed between the thin film and the resist film.