IP Library › Granted Patent US 8,053,682
Granted Patent B2
US 8,053,682 · App. 12/467,542 · Granted Nov 8, 2011

Multilayer ceramic substrate

Assignee: Samsung Electro-Mechanics Co., Ltd.
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Quick Facts
Patent No.
US 8,053,682
App. No.
12/467,542
Granted
Nov 8, 2011
Kind
B2
Abstract

There is provided a multilayer ceramic substrate including a conductive via of a dual-layer structure capable of preventing loss in electrical conductivity and signal. The multilayer ceramic substrate includes: a plurality of dielectric layers; and a circuit pattern part formed on at least a portion of the dielectric layers, the circuit pattern part including at least one conductive via and conductive pattern, wherein the at least one conductive via comprises an outer peripheral portion and an inner peripheral portion, the outer peripheral portion formed along an inner wall of a via hole extending through the dielectric layers and formed of a first conductive material containing a metal, and the inner peripheral portion filled in the outer peripheral portion and formed of a second conductive material having a shrinkage initiation temperature higher than a shrinkage initiation temperature of the first conductive material.

Claims (7)

1. A multilayer ceramic substrate comprising:

a plurality of dielectric layers; and

a circuit pattern part disposed on at least a portion of the dielectric layers, the circuit pattern part including at least one conductive via and conductive pattern,

wherein the at least one conductive via comprises an outer peripheral portion and an inner peripheral portion, the outer peripheral portion being disposed along an inner wall of a via hole extending through the dielectric layers and being of a first conductive material containing a metal and at least one of silicon oxide (SiO 2 ) and glass, and the inner peripheral portion being filled inside the outer peripheral portion and being of a second conductive material having more silicon oxide (SiO 2 ) or glass than that of the first conductive material so as to have a shrinkage initiation temperature higher than a shrinkage initiation temperature of the first conductive material and equal to or higher than a shrinkage initiation temperature of the dielectric layers.

2. The multilayer ceramic substrate of claim 1 , wherein the metal in the first conductive material is Ag metal.

3. The multilayer ceramic substrate of claim 1 , wherein the outer peripheral portion has a thickness that is 10% or less with respect to an entire radius of the conductive via.

4. The multilayer ceramic substrate of claim 3 , wherein the outer peripheral portion has a thickness that is 0.5% or more with respect to an entire radius of the conductive via.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 13, 2017
From: SAMSUNG ELECTRO-MECHANICS CO., LTD.
To: SEMCNS CO., LTD.
Reel/Frame 041242/0295 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 18, 2009
From: PARK, YUN HWI; KIM, BONG GYUN; CHOI, YOON HYUCK
To: SAMSUNG ELECTRO-MECHANICS CO., LTD.
Reel/Frame 022702/0242 →
Priority Claims (1)
KR 10-2008-0084726 · Aug 28, 2008 · national
Continuity (1)
Related Publication 20100055393A1 · Mar 4, 2010