Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process
A method of decomposing a target pattern having features to be imaged on a substrate so as to allow said features to be imaged in a multi-exposure process. The method includes the steps of: (a) segmenting a plurality of the features into a plurality of polygons; (b) determining the image log slope (ILS) value for each of the plurality of polygons; (c) determining the polygon having the minimum ILS value, and defining a mask containing the polygon; (d) convolving the mask defined in step (c) with an eigen function of a transmission cross coefficient so as to generate an interference map, where the transmission cross coefficient defines the illumination system to be utilized to image the target pattern; and (e) assigning a phase to the polygon based on the value of the interference map at a location corresponding to the polygon, where the phase defines which exposure in said multiexposure process the polygon is assigned.
1. A computer-implemented method of decomposing a target pattern having features to be imaged on a substrate so as to allow said features to be imaged in a multi-exposure process, said method comprising the steps of:
(a) segmenting, using a computer, a plurality of said features into a plurality of polygons; and
(b) assigning a phase or color to said polygons based on the value of an interference map at a location respectively corresponding to said polygons, said phase or color defining which exposure in said multi-exposure process said polygons are assigned.
2. The method of claim 1 , wherein said interference map is generated by convolving a mask representing said polygons with an eigen function of a transmission cross coefficient, said transmission cross coefficient defining an illumination system.
3. The method of claim 1 , wherein the method further comprises:
forming a mask containing polygons to which the same phase or color are assigned.
4. The method of claim 3 , wherein the method further comprises:
exposing the mask with an exposure condition of the multi-exposure process.
5. A computer-implemented method of decomposing a target pattern having features to be imaged on a substrate so as to allow said features to be imaged in a multi-exposure process, said method comprising the steps of:
(a) segmenting, using a computer, a plurality of said features into a plurality of polygons; and
(b) assigning a phase or color to said polygons based on the result of a convolution of a mask representing said polygons with an eigen function of a transmission cross coefficient, said transmission cross coefficient defining an illumination system used in multi-exposure process.
6. The method of claim 5 , wherein the method further comprises:
forming a mask containing polygons to which the same phase or color are assigned.
7. The method of claim 6 , wherein the method further comprises:
exposing the mask with an exposure condition of the multi-exposure process.
8. A computer-implemented method of imaging a wafer comprising the steps of:
(c) segmenting, using a computer, a plurality of features to be imaged into a plurality of polygons; and
(d) assigning a phase or color to said polygons based on the value of an interference map at a location respectively corresponding to said polygons, said phase or color defining which exposure in a multi-exposure process said polygons are assigned.
9. The method of claim 8 , wherein said interference map is generated by convolving a mask representing said polygons with an eigen function of a transmission cross coefficient, said transmission cross coefficient defining an illumination system.
10. A computer-implemented method of imaging a wafer comprising the steps of:
(e) segmenting, using a computer, a plurality of features to be imaged into a plurality of polygons; and
(f) assigning a phase or color to said polygons based on the result of a convolution of a mask representing said polygons with an eigen function of a transmission cross coefficient, said transmission cross coefficient defining an illumination system used in a multi-exposure process.
11. A computer program product for controlling a computer comprising a non-transitory recording medium readable by the computer, means recorded on the recording medium for directing the computer to decompose a target pattern having features to be imaged on a substrate so as to allow said features to be imaged in a multi-exposure process, the process comprising the steps of:
(g) segmenting a plurality of said features into a plurality of polygons; and
(h) assigning a phase or color to said polygons based on the value of an interference map at a location respectively corresponding to said polygons, said phase or color defining which exposure in said multi-exposure process said polygons are assigned.
12. The computer program product of claim 11 , wherein said interference map is generated by convolving a mask representing said polygons with an eigen function of a transmission cross coefficient, said transmission cross coefficient defining an illumination system.
13. A computer program product for controlling a computer comprising a non-transitory recording medium readable by the computer, means recorded on the recording medium for directing the computer to decompose a target pattern having features to be imaged on a substrate so as to allow said features to be imaged in a multi-exposure process, the process comprising the steps of:
(i) segmenting a plurality of said features into a plurality of polygons; and
(j) assigning a phase or color to said polygons based on the result of a convolution of a mask representing said polygons with an eigen function of a transmission cross coefficient, said transmission cross coefficient defining an illumination system used in a multi-exposure process.