IP Library Granted Patent US 8,101,131
Granted Patent B2
US 8,101,131 · App. 12/382,659 · Granted Jan 24, 2012

Chlorosilanes purifying apparatus and chlorosilanes manufacturing method

Assignee: Mitsubishi Materials Corporation
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Quick Facts
Patent No.
US 8,101,131
App. No.
12/382,659
Granted
Jan 24, 2012
Kind
B2
Abstract

Aluminum chloride from a gas containing chlorosilanes produced in a chlorination reactor is effectively removed. A container 1 is filled with sodium chloride and heated by a heating device 17 , a gas containing chlorosilanes produced by a reaction between metallurgical grade silicon and hydrogen chloride passes through the sodium chloride layer 16 to generate a double salt of aluminum chloride contained in the gas and the sodium chloride, and the gas from which the double salt is separated is recovered from a gas recovery tube 26.

Claims (19)

1. A chlorosilanes purifying apparatus comprising:

a container filled with sodium chloride;

a heating device for heating a layer of sodium chloride in the container;

a gas supplying tube for supplying gas containing chlorosilanes produced by a reaction between metallurgical grade silicon and hydrogen chloride in the container; and

a gas recovery tube for exhausting the gas that had been passed through the layer of the sodium chloride in the container; wherein

a jacket for covering at least the outer surface of the bottom portion of the container is formed,

a heat medium is supplied to the jacket,

a double salt exhausting tube for exhausting generated double salt is connected to the bottom portion of the container to penetrate the jacket,

a cylindrical wall surrounding the double salt exhausting tube is formed at the penetration portion, and

the jacket is formed over the outside of the cylindrical wall.

2. The chlorosilanes purifying apparatus according to claim 1 , further comprising a net plate for partitioning the container into upper and lower sections in the container,

wherein the gas supplying tube is connected to a position lower than the net plate,

the gas recovery tube is connected to a position higher than the net plate, and

the sodium chloride is filled on the net plate.

3. The chlorosilanes purifying apparatus according to claim 1 , further comprising a filter for removing dust in the gas containing chlorosilanes which is provided in the upstream side of the gas supplying tube, wherein the filter has a filter using a polytetrafluoroethylene fabric or a membrane filter formed of a continuous porous body of polytetrafluoroethylene.

4. A method of manufacturing chlorosilanes, comprising:

providing the chlorosilanes purifying apparatus according to claim 1 ,

supplying the gas containing chlorosilanes to the container from the gas supplying tube, passing through the layer of sodium chloride filled in the container, and

exhausting the gas that had been passed through the layer of the sodium chloride by the gas recovery tube.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 5, 2023
From: MITSUBISHI MATERIALS CORPORATION
To: HIGH-PURITY SILICON CORPORATION
Reel/Frame 063858/0867 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 20, 2009
From: KITAGAWA, TERUHISA; NARUKAWA, MITSUTOSHI; INABA, CHIKARA
To: MITSUBISHI MATERIALS CORPORATION
Reel/Frame 022484/0858 →
Priority Claims (1)
JP 2008-076367 · Mar 24, 2008 · national
Continuity (1)
Related Publication 20090238748A1 · Sep 24, 2009