Method of making an electrostatic chuck with reduced plasma penetration and arcing
A method of making an electrostatic chuck comprising positioning a plate into a channel in a body to form a plenum and inserting a dielectric component into an opening in the plate, where the dielectric component defines a portion of a passage from the plenum. Thereafter, depositing a dielectric layer covering at least a portion of the body and at least a portion of the plate to form a support surface. The dielectric layer is polished to a specified thickness. In one embodiment, the polishing process forms an opening through the dielectric layer to enable the dielectric component to define a passage between the support surface and the plenum. In another embodiment, at least a portion of the dielectric layer is porous proximate the dielectric component such that the porous dielectric layer and the dielectric component form a passage between the support surface and the plenum. In a further embodiment, a hole is formed through the dielectric layer and the hole in the dielectric layer and the dielectric component form a passage between the support surface and the plenum.
1. A method of making an electrostatic chuck comprising:
positioning a plate into a channel in a body to form a plenum;
inserting a dielectric component into an opening in the plate, wherein the dielectric component comprises a dielectric tube comprising a first end, a second end and an axial through hole connecting the first end and the second end;
positioning a dielectric end cap within the channel and opposite the axial through hole of the dielectric tube, wherein the second end of the dielectric tube is disposed inside of the dielectric end cap and wherein a portion of the end cap extends transversely over the second end of the dielectric tube while being spaced apart therefrom to form a gap;
depositing a dielectric layer covering at least a portion of the body and at least a portion of the plate to form a support surface;
polishing the dielectric layer to a specified thickness; and
forming an opening through the dielectric layer and the dielectric component to define a passage between the support surface and the plenum, wherein the gap and the axial through hole form the passage.
2. The method of claim 1 wherein at least a portion of the dielectric layer is porous.
3. The method of claim 1 wherein the forming step comprises drilling a hole through the dielectric layer to the dielectric component.
4. The method of claim 1 wherein the dielectric component comprises alumina.
5. The method of claim 1 wherein the dielectric layer comprises alumina.
6. The method of claim 1 , wherein the dielectric end cap includes an opening disposed in an end of the dielectric end cap, wherein the dielectric tube is disposed within the opening, and wherein a bottom of the opening opposes the axial through hole.
7. The method of claim 1 , further comprising:
covering at least a portion of the first end with the dielectric layer, wherein at least a portion of the dielectric layer further forms the passage.
8. The method of claim 7 wherein the forming step comprises polishing the dielectric layer until the axial through hole of the dielectric tube is exposed at the support surface.
9. The method of claim 7 wherein at least a portion of the dielectric layer proximate the first end of the dielectric tube is porous.
10. The method of claim 1 wherein the body is conductive.
11. The method of claim 10 further comprising welding the plate into the channel.
12. A method of making an electrostatic chuck comprising:
positioning a plate into a channel in a body to form a plenum;
inserting a dielectric component into an opening in the plate, wherein the dielectric component comprises a dielectric tube comprising a first end, a second end and an axial through hole connecting the first end and the second end;
positioning a dielectric end cap within the channel and opposite the axial through hole of the dielectric tube, wherein the second end of the dielectric tube is disposed inside of the dielectric end cap and wherein a portion of the end cap extends traversely over the second end of the dielectric tube while being spaced apart therefrom to form a gap;
depositing a dielectric layer covering at least a portion of the body, at least a portion of the plate, and the dielectric component to form a support surface, where at least a portion of the dielectric layer proximate the dielectric component is porous; and
polishing the dielectric layer to a specified thickness, wherein the at least a portion of the dielectric layer proximate the dielectric component, the gap, and the axial through hole form a passage between the support surface and the plenum.
13. The method of claim 12 , further comprising:
covering at least a portion of the first end with the dielectric layer, wherein at least a portion of the dielectric layer further forms the passage.
14. The method of claim 12 wherein the dielectric component comprises alumina.
15. The method of claim 12 wherein the dielectric layer comprises alumina.
16. The method of claim 12 , wherein the dielectric end cap includes an opening disposed in an end of the dielectric end cap, wherein the dielectric tube is disposed within the opening, and wherein a bottom of the opening opposes the axial through hole.
17. The method of claim 12 wherein the body is conductive.
18. The method of claim 12 further comprising welding the plate into the channel.