Method for forming a shallow trench isolation
A method for forming a shallow trench isolation includes providing a substrate with a trench, a first liner layer and a second liner layer sequentially in the trench with a first oxide filling the trench, performing a first wet etching to remove part of the first oxide and part of the first liner layer to expose the substrate, performing a second wet etching to remove part of the second liner layer so that the second liner layer is lower than surface of the substrate, performing a third wet etching to remove part of the first oxide and part of the first liner layer, and filling the trench with a second oxide to form a shallow trench isolation.
1. A method for forming a shallow trench isolation, comprising:
providing a substrate with a trench in which a first liner layer and a second liner layer are sequentially formed with a first oxide filling said trench;
performing a first wet etching to simultaneously and partially remove said first oxide and said first liner layer to expose said substrate;
after performing the first wet etching, performing a second wet etching to remove part of said second liner layer so that said second liner layer is lower than the surface of said substrate;
after performing the second wet etching, performing a third wet etching to remove part of said first oxide and part of said first liner layer; and
filling said trench with a second oxide to form said shallow trench isolation.
2. The method for forming a shallow trench isolation of claim 1 , wherein said substrate comprises Si.
3. The method for forming a shallow trench isolation of claim 1 , wherein said first liner layer comprises silicon oxide.
4. The method for forming a shallow trench isolation of claim 1 , wherein said first liner layer is formed by a furnace oxidation.
5. The method for forming a shallow trench isolation of claim 1 , wherein said second liner layer comprises silicon nitride.
6. The method for forming a shallow trench isolation of claim 1 , wherein said second liner layer is formed by a furnace oxidation.
7. The method for forming a shallow trench isolation of claim 1 , wherein said first oxide comprises silicon oxide.
8. The method for forming a shallow trench isolation of claim 1 , wherein said first oxide is formed by a spin-on-glass method.
9. The method for forming a shallow trench isolation of claim 1 , wherein said first wet etching is carried out by a buffered oxide etching method.
10. The method for forming a shallow trench isolation of claim 1 , wherein said second wet etching is carried out by hot phosphoric acid.
11. The method for forming a shallow trench isolation of claim 1 , wherein said third wet etching is carried out by a buffered oxide etching method.
12. The method for forming a shallow trench isolation of claim 1 , wherein said second oxide comprises silicon oxide.
13. The method for forming a shallow trench isolation of claim 1 , wherein said second oxide is formed by a high-density plasma method.