Spectrographic monitoring of a substrate during processing using index values
Methods, systems, and apparatus for spectrographic monitoring of a substrate during chemical mechanical polishing are described. In one aspect, a computer-implemented method includes storing a library having a plurality of reference spectra, each reference spectrum of the plurality of reference spectra having a stored associated index value, measuring a sequence of spectra in-situ during polishing to obtain measured spectra, for each measured spectrum of the sequence of spectra, finding a best matching reference spectrum to generate a sequence of best matching reference spectra, determining the associated index value for each best matching spectrum from the sequence of best matching reference spectra to generate a sequence of index values, fitting a linear function to the sequence of index values, and halting the polishing either when the linear function matches or exceeds a target index or when the associated index value from the determining step matches or exceeds the target index.
1. A computer-implemented method, comprising:
storing a library having a plurality of reference spectra, each reference spectrum of the plurality of reference spectra having a stored associated index value, each index value representing a time during a polishing operation at which the reference spectrum of the plurality of reference spectra with the associated index value is expected to be observed;
measuring a sequence of spectra in-situ during polishing of a substrate to obtain measured spectra, wherein each stored associated index value was generated prior to polishing of the substrate;
binning spectra from the measured spectra into two or more radial zones;
for each measured spectrum of the sequence of spectra, finding a best matching reference spectrum from the plurality of reference spectra to generate a sequence of best matching reference spectra;
determining the associated index value for each best matching spectrum from the sequence of best matching reference spectra to generate a sequence of index values;
fitting a linear function to the sequence of index values; and
halting the polishing either when the linear function matches or exceeds a target index or when the associated index value from the determining step matches or exceeds the target index,
wherein the steps of finding a best matching reference spectrum to generate a sequence of best matching reference spectra, determining an associated index value for each best matching spectrum from the sequence of best matching reference spectra to generate a sequence of index values and fitting a linear function to the sequence of index values are performed for each of the two or more radial zones independently of one another.
2. The method of claim 1 , wherein a first of the two or more radial zones is an inner zone and a second of the two or more radial zones is an annular zone.
3. The method of claim 1 , further comprising adjusting a polishing rate in at least one radial zone of the two or more radial zones.
4. The method of claim 3 , wherein adjusting the polishing rate comprises causing an endpoint to occur when an entirety of the substrate has a flat surface.
5. The method of claim 1 , wherein determining the associated index value for each best matching spectrum from the sequence of best matching reference spectra to generate a sequence of index values includes determining associated index values from two different libraries of reference spectra to generate two corresponding sequences of index values.
6. The method of claim 5 , wherein fitting a linear function to the sequence of index values includes fitting a linear function to each sequence of index values that corresponds to each library to obtain two different linear functions, the method further comprising:
for each zone, determining which of the linear functions has a better goodness of fit to the corresponding sequence of index values.
7. The method of claim 6 , wherein halting polishing includes halting polishing when the linear function with the better goodness of fit to the index trace for each zone matches or exceeds the target index value.