Extreme ultraviolet light source apparatus
An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.
1. An extreme ultraviolet light source apparatus for generating extreme ultraviolet light from plasma by applying a laser beam to a target material and thereby turning said target material into said plasma, said apparatus comprising:
an extreme ultraviolet light generation chamber, in which the extreme ultraviolet light is generated;
a target material supply unit for injecting the target material into said extreme ultraviolet light generation chamber when the extreme ultraviolet light is generated;
a driver laser for emitting the laser beam;
a window provided to said extreme ultraviolet light
generation chamber, and for transmitting the laser beam into said extreme ultraviolet light generation chamber;
a laser beam focusing optics including at least one optical element disposed within said extreme ultraviolet light generation chamber, and for focusing the laser beam emitted from said driver laser onto a path of the target material injected into said extreme ultraviolet light generation chamber to generate said plasma;
temperature sensors for detecting temperature of said window and said at least one optical element disposed within said extreme ultraviolet light generation chamber; and
a processing unit for judging deterioration of said window and said optical element according to said temperature detected by said temperature sensors, when the extreme ultraviolet light is generated.
2. The extreme ultraviolet light source apparatus according to claim 1 , further comprising:
a cooling water path for supplying cooling water to each of said window and said at least one optical element disposed within said extreme ultraviolet light generation chamber, wherein
said processing unit judges the deterioration of said window and said at least one optical element according to waste heat amount dissipated by the cooling water.
3. The extreme ultraviolet light source apparatus according to claim 1 , wherein
said driver laser includes a pre-pulse laser and a main pulse laser, and said window and said laser beam focusing optics are provided for each of said pre-pulse laser and said main pulse laser.
4. The extreme ultraviolet light source apparatus according to claim 1 , further comprising:
a shielding means for protecting said window and said at least one optical element disposed within said extreme ultraviolet light generation chamber by shielding materials emitted from said extreme ultraviolet light generation chamber, when the extreme ultraviolet light is generated.
5. An extreme ultraviolet light source apparatus for generating extreme ultraviolet light from plasma by applying a laser beam to a target material and thereby turning said target material into said plasma, said apparatus comprising:
an extreme ultraviolet light generation chamber, in which the extreme ultraviolet light is generated;
a target material supply unit for injecting the target material into said extreme ultraviolet light generation chamber when the extreme ultraviolet light is generated;
a driver laser for emitting the laser beam;
a window provided to said extreme ultraviolet light generation chamber, and for transmitting the laser beam into said extreme ultraviolet light generation chamber;
a laser beam focusing optics including at least one optical element disposed within said extreme ultraviolet light generation chamber, and for focusing the laser beam emitted from said driver laser onto a path of the target material injected into said extreme ultraviolet light generation chamber to generate said plasma;
temperature sensors for detecting temperature of said window and said at least one optical element;
a cooling water path for supplying cooling water to 25 each of said window and said at least one optical element disposed within said extreme ultraviolet light generation chamber; and
a processing unit for judging deterioration of said window and said at least one optical element according to waste heat amount dissipated by said cooling water.
6. The extreme ultraviolet light source apparatus according to claim 5 , wherein
said driver laser includes a pre-pulse laser and a main pulse laser, and said window and said laser beam focusing optics are provided for each of said pre-pulse laser and said main pulse laser.
7. The extreme ultraviolet light source apparatus according to claim 5 , further comprising:
a shielding means for protecting said window and said at least one optical element disposed within said extreme ultraviolet light generation chamber by shielding materials emitted from said extreme ultraviolet light generation chamber, when the extreme ultraviolet light is generated.