IP Library Granted Patent US 8,362,871
Granted Patent B2
US 8,362,871 · App. 12/607,952 · Granted Jan 29, 2013

Geometric and electric field considerations for including transient protective material in substrate devices

Inventors: Lex Kosowsky (San Jose, CA); Robert Fleming (San Jose, CA); Ning Shi (San Jose, CA)
Assignee: Shocking Technologies, Inc.
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Quick Facts
Patent No.
US 8,362,871
App. No.
12/607,952
Granted
Jan 29, 2013
Kind
B2
Abstract

A substrate device includes a layer of non-linear resistive transient protective material and a plurality of conductive elements that form part of a conductive layer. The conductive elements include a pair of electrodes that are spaced by a gap, but which electrically interconnect when the transient protective material is conductive. The substrate includes features to linearize a transient electrical path that is formed across the gap.

Claims (13)

1. A substrate device comprising:

one or more layers of non-linear resistive transient protective material;

a plurality of conductive elements distributed as part of a conductive layer of the substrate device so as to be in contact with at least one layer of the one or more layers of non-linear resistive transient protective material, the plurality of conductive elements including a pair of conductive elements that are spaced apart to form a gap, but which electrically connect when the transient protective material is conductive; and

wherein at least one of the conductive elements of the pair of conductive elements includes one or more structural features that vary a thickness or topology of a portion of that conductive element, the portion contacting or extending into the at least one layer of the one or more layers of non-linear resistive transient protective material.

2. The substrate device of claim 1 , wherein the one or more layers of non-linear resistive transient protective material comprises voltage switchable dielectric material.

3. The substrate device of claim 1 , wherein at least one of the conductive elements of the pair of conductive elements includes one or more structural features that correspond to the at least one of the conductive elements of the pair of conductive elements having a raised portion.

4. The substrate device of claim 1 , wherein at least one of the conductive elements of the pair of conductive elements includes one or more structural features that correspond to the at least one of the conductive elements of the pair of conductive elements having a roughened surface on at least a portion of the at least one of the conductive elements of the pair of conductive elements.

5. The substrate of claim 4 , wherein the roughened surface is a result of a mechanical or chemical etching process performed on a portion of the conductive layer that includes at least one of the conductive elements of the pair of conductive elements.

6. The substrate device of claim 1 , wherein at least one of the conductive elements of the pair of conductive elements includes one or more structural features that correspond to the at least one of the conductive elements of the pair of conductive elements having an extension that extends (i) at least partially through the at least one layer of the one or more layers of non-linear resistive transient protective material, and (ii) at least partially across the gap.

7. The substrate device of claim 1 , further comprising one or more layers of dielectric material, including a layer of dielectric material that is in contact with conductive elements of the conductive layer.

8. The substrate device of claim 7 , further comprising a layer of resistive material that is positioned between the conductive layer and the layer of dielectric material.

9. The substrate device of claim 8 , wherein the layer of resistive material is comprised of a dielectric material.

10. The substrate device of claim 1 , wherein the pair of conductive elements electrically connect using a transient electrical path, and wherein at least one of the conductive elements of the pair of conductive elements include one or more structural features such that the transient electrical path is caused to become substantially more linear relative to a structural feature not having the thickness or surface topology.

Assignments (5)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 23, 2014
From: SHOCKING TECHNOLOGIES, INC.
To: LITTELFUSE, INC.
Reel/Frame 032123/0747 →
RELEASE OF SECURITY INTEREST Recorded Nov 20, 2012
From: SILICON VALLEY BANK
To: SHOCKING TECHNOLOGIES, INC.
Reel/Frame 029333/0469 →
SECURITY AGREEMENT Recorded Nov 20, 2012
From: SHOCKING TECHNOLOGIES, INC.
To: LITTELFUSE, INC.
Reel/Frame 029340/0806 →
SECURITY AGREEMENT Recorded Jul 23, 2010
From: SHOCKING TECHNOLOGIES, INC.
To: SILICON VALLEY BANK
Reel/Frame 024733/0299 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 29, 2009
From: KOSOWSKY, LEX; FLEMING, ROBERT; SHI, NING
To: SHOCKING TECHNOLOGIES, INC.
Reel/Frame 023715/0356 →
Continuity (3)
Provisional Application 61111673 · Nov 5, 2008
Provisional Application 61140060 · Dec 22, 2008
Related Publication 20100109834A1 · May 6, 2010